Franz Xaver Zach

Person

Wappingers Falls, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Selective silicon-on-insulator isolation structure and method
- Patent number 7,923,786
- Issue date Apr 12, 2011
- International Business Machines Corporation
- An L. Steegen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for interlayer and yield based optical proximity correction
- Patent number 7,861,209
- Issue date Dec 28, 2010
- International Business Machines Corporation
- Franz Xaver Zach
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for interlayer and yield based optical proximity correction
- Patent number 7,712,069
- Issue date May 4, 2010
- International Business Machines Corporation
- Franz Xaver Zach
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for interlayer and yield based optical proximity correction
- Patent number 7,334,212
- Issue date Feb 19, 2008
- International Business Machines Corporation
- Franz Xaver Zach
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Selective silicon-on-insulator isolation structure and method
- Patent number 7,326,983
- Issue date Feb 5, 2008
- International Business Machines Corporation
- An L. Steegen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Alternating phase-shift mask rule compliant IC design
- Patent number 7,124,396
- Issue date Oct 17, 2006
- International Business Machines Corporation
- Franz X. Zach
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for interlayer and yield based optical proximity correction
- Patent number 6,961,920
- Issue date Nov 1, 2005
- International Business Machines Corporation
- Franz Xaver Zach
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Selective silicon-on-insulator isolation structure and method
- Patent number 6,936,522
- Issue date Aug 30, 2005
- International Business Machines Corporation
- An L. Steegen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process to suppress lithography at a wafer edge
- Patent number 6,927,172
- Issue date Aug 9, 2005
- International Business Machines Corporation
- Wolfgang Bergner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to self-align a lithographic pattern to a workpiece
- Patent number 6,485,894
- Issue date Nov 26, 2002
- International Business Machines Corporation
- Hiroyuki Akatsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for reducing non-uniformity area effects in th...
- Patent number 6,270,947
- Issue date Aug 7, 2001
- Infineon Technologies AG
- Steffen Schulze
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Contact and deep trench patterning
- Patent number 6,204,187
- Issue date Mar 20, 2001
- Infineon Technologies North America, Corp.
- Thomas S. Rupp
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for producing constant profile sidewalls
- Patent number 6,132,940
- Issue date Oct 17, 2000
- International Business Machines Corporation
- Rebecca D. Mih
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR INTERLAYER AND YIELD BASED OPTICAL PROXIMITY CORRECTION
- Publication number 20080086715
- Publication date Apr 10, 2008
- Franz Xaver Zach
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SELECTIVE SILICON-ON-INSULATOR ISOLATION STRUCTURE AND METHOD
- Publication number 20080029818
- Publication date Feb 7, 2008
- An L. Steegen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR INTERLAYER AND YIELD BASED OPTICAL PROXIMITY CORRECTION
- Publication number 20080022255
- Publication date Jan 24, 2008
- Franz Xaver Zach
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for interlayer and yield based optical proximity correction
- Publication number 20060031809
- Publication date Feb 9, 2006
- Franz Xaver Zach
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ALTERNATING PHASE-SHIFT MASK RULE COMPLIANT IC DESIGN
- Publication number 20050210436
- Publication date Sep 22, 2005
- International Business Machines Corporation
- Franz X. Zach
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Selective silicon-on-insulator isolation structure and method
- Publication number 20050164468
- Publication date Jul 28, 2005
- An L. Steegen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for interlayer and yield based optical proximity correction
- Publication number 20050066300
- Publication date Mar 24, 2005
- International Business Machines Corporation
- Franz Xaver Zach
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SELECTIVE SILICON-ON-INSULATOR ISOLATION STRUCTURE AND METHOD
- Publication number 20040262695
- Publication date Dec 30, 2004
- International Business Machines Corporation
- An L. Steegan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Process to suppress lithography at a wafer edge
- Publication number 20040166677
- Publication date Aug 26, 2004
- International Business Machines Corporation
- Wolfgang Bergner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR REDUCING NON-UNIFORMITY AREA EFFECTS IN TH...
- Publication number 20010003033
- Publication date Jun 7, 2001
- STEFFEN SCHULZE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Franz Xaver Zach

Person

Patents Grantslast 30 patents

Selective silicon-on-insulator isolation structure and method

Method for interlayer and yield based optical proximity correction

Method for interlayer and yield based optical proximity correction

Method for interlayer and yield based optical proximity correction

Selective silicon-on-insulator isolation structure and method

Alternating phase-shift mask rule compliant IC design

Method for interlayer and yield based optical proximity correction

Selective silicon-on-insulator isolation structure and method

Process to suppress lithography at a wafer edge

Method to self-align a lithographic pattern to a workpiece

Method and apparatus for reducing non-uniformity area effects in th...

Contact and deep trench patterning

Method for producing constant profile sidewalls

Patents Applicationslast 30 patents

METHOD FOR INTERLAYER AND YIELD BASED OPTICAL PROXIMITY CORRECTION

SELECTIVE SILICON-ON-INSULATOR ISOLATION STRUCTURE AND METHOD

METHOD FOR INTERLAYER AND YIELD BASED OPTICAL PROXIMITY CORRECTION

Method for interlayer and yield based optical proximity correction

ALTERNATING PHASE-SHIFT MASK RULE COMPLIANT IC DESIGN

Selective silicon-on-insulator isolation structure and method

Method for interlayer and yield based optical proximity correction

SELECTIVE SILICON-ON-INSULATOR ISOLATION STRUCTURE AND METHOD

Process to suppress lithography at a wafer edge

METHOD AND APPARATUS FOR REDUCING NON-UNIFORMITY AREA EFFECTS IN TH...