Franz Zach

Person

Los Gatos, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Systems and methods for controlling an etch process
- Patent number 10,386,829
- Issue date Aug 20, 2019
- KLA-Tencor Corporation
- Franz Zach
- G05 - CONTROLLING REGULATING
Information Patent Grant
Optical lithography correction process
- Patent number 8,141,008
- Issue date Mar 20, 2012
- Cadence Design Systems, Inc.
- Franz Xaver Zach
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Optical lithography correction process
- Patent number 7,882,456
- Issue date Feb 1, 2011
- Cadence Design Systems, Inc.
- Franz Xaver Zach
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Yield based retargeting for semiconductor design flow
- Patent number 7,784,019
- Issue date Aug 24, 2010
- Cadence Design Systems, Inc.
- Franz Zach
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method of compensating photomask data for the effects of etch and l...
- Patent number 7,600,212
- Issue date Oct 6, 2009
- Cadence Design Systems, Inc.
- Franz X. Zach
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system for reducing the impact of across-wafer variation...
- Patent number 7,588,868
- Issue date Sep 15, 2009
- Cadence Design Systems, Inc.
- Franz X. Zach
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for verifying and choosing lithography model
- Patent number 7,536,670
- Issue date May 19, 2009
- Cadence Design Systems, Inc.
- Gökhan Perçin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Calibration on wafer sweet spots
- Patent number 7,444,615
- Issue date Oct 28, 2008
- Invarium, Inc.
- Gokhan Percin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for real time monitoring and verifying optical proximity cor...
- Patent number 7,392,502
- Issue date Jun 24, 2008
- Invarium, Inc.
- Gökhan Percin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for correcting position-dependent distortions in patterning...
- Patent number 7,246,343
- Issue date Jul 17, 2007
- Invarium, Inc.
- Devendra Joshi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for measuring and verifying stepper illumination
- Patent number 7,224,437
- Issue date May 29, 2007
- Invarium, Inc.
- Gökhan Perçin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Characterizing flare of a projection lens
- Patent number 7,189,481
- Issue date Mar 13, 2007
- Invarium, Inc.
- Bo Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
SYSTEM AND METHOD FOR MITIGATING OVERLAY DISTORTION PATTERNS CAUSED...
- Publication number 20230035201
- Publication date Feb 2, 2023
- Franz Zach
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD FOR OPTIMIZING THROUGH SILICON VIA OVERLAY
- Publication number 20230030116
- Publication date Feb 2, 2023
- Franz Zach
- G05 - CONTROLLING REGULATING
Information Patent Application
SYSTEM AND METHOD FOR DETECTING PARTICLE CONTAMINATION ON A BONDING...
- Publication number 20230032406
- Publication date Feb 2, 2023
- Franz Zach
- G01 - MEASURING TESTING
Information Patent Application
SYSTEM AND METHOD FOR DETERMINING POST BONDING OVERLAY
- Publication number 20220187718
- Publication date Jun 16, 2022
- KLA Corporation
- Franz Zach
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Systems and Methods for Controlling an Etch Process
- Publication number 20170084473
- Publication date Mar 23, 2017
- KLA-Tencor Corporation
- Franz Zach
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OPTICAL LITHOGRAPHY CORRECTION PROCESS
- Publication number 20110154281
- Publication date Jun 23, 2011
- Invarium, Inc.
- Franz Xaver Zach
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SYSTEMS AND METHODS FOR ELECTRICAL CHARACTERIZATION OF INTER-LAYER...
- Publication number 20090033353
- Publication date Feb 5, 2009
- PDF SOLUTIONS
- Kaung Shia Yu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Method of compensating photomask data for the effects of etch and l...
- Publication number 20070143733
- Publication date Jun 21, 2007
- Invarium, Inc.
- Franz X. Zach
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for real time monitoring and verifying optical proximity cor...
- Publication number 20070006116
- Publication date Jan 4, 2007
- Invarium Inc.
- Gokhan Percin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for verifying and choosing lithography model
- Publication number 20060282814
- Publication date Dec 14, 2006
- Invarium, Inc.
- Gokhan Percin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Calibration on wafer sweet spots
- Publication number 20060266243
- Publication date Nov 30, 2006
- Invarium Inc.
- Gokhan Percin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for measuring and verifying stepper illumination
- Publication number 20060268254
- Publication date Nov 30, 2006
- Invarium, Inc.
- Gokhan Percin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Optical lithography correction process
- Publication number 20060236271
- Publication date Oct 19, 2006
- Invarium, Inc.
- Franz Xaver Zach
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Method and system for reducing the impact of across-wafer variation...
- Publication number 20060073686
- Publication date Apr 6, 2006
- Franz X. Zach
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for characterization of the illuminator in a lithographic sy...
- Publication number 20060072097
- Publication date Apr 6, 2006
- Franz X. Zach
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Characterizing flare of a projection lens
- Publication number 20060046167
- Publication date Mar 2, 2006
- Bo Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for correcting position-dependent distortions in patterning...
- Publication number 20060048091
- Publication date Mar 2, 2006
- Invarium, Inc.
- Devendra Joshi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Person

Patents Grantslast 30 patents

Systems and methods for controlling an etch process

Optical lithography correction process

Optical lithography correction process

Yield based retargeting for semiconductor design flow

Method of compensating photomask data for the effects of etch and l...

Method and system for reducing the impact of across-wafer variation...

Method for verifying and choosing lithography model

Calibration on wafer sweet spots

Method for real time monitoring and verifying optical proximity cor...

Method for correcting position-dependent distortions in patterning...

Method for measuring and verifying stepper illumination

Characterizing flare of a projection lens

Patents Applicationslast 30 patents

SYSTEM AND METHOD FOR MITIGATING OVERLAY DISTORTION PATTERNS CAUSED...

SYSTEM AND METHOD FOR OPTIMIZING THROUGH SILICON VIA OVERLAY

SYSTEM AND METHOD FOR DETECTING PARTICLE CONTAMINATION ON A BONDING...

SYSTEM AND METHOD FOR DETERMINING POST BONDING OVERLAY

Systems and Methods for Controlling an Etch Process

OPTICAL LITHOGRAPHY CORRECTION PROCESS

SYSTEMS AND METHODS FOR ELECTRICAL CHARACTERIZATION OF INTER-LAYER...

Method of compensating photomask data for the effects of etch and l...

Method for real time monitoring and verifying optical proximity cor...

Method for verifying and choosing lithography model

Calibration on wafer sweet spots

Method for measuring and verifying stepper illumination

Optical lithography correction process

Method and system for reducing the impact of across-wafer variation...

Method for characterization of the illuminator in a lithographic sy...

Characterizing flare of a projection lens

Method for correcting position-dependent distortions in patterning...