Fred STANKE

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Inspecting high-resolution photolithography masks
- Patent number 9,619,878
- Issue date Apr 11, 2017
- KLA-Tencor Corporation
- Fred Stanke
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Diffraction order sorting filter for optical metrology
- Patent number 8,107,073
- Issue date Jan 31, 2012
- Tokyo Electron Limited
- Adam Norton
- G01 - MEASURING TESTING
Information Patent Grant
Calibration method for optical metrology
- Patent number 7,924,422
- Issue date Apr 12, 2011
- Tokyo Electron Limited
- Fred Stanke
- G01 - MEASURING TESTING
Information Patent Grant
Polarimetric scatterometry methods for critical dimension measureme...
- Patent number 7,471,392
- Issue date Dec 30, 2008
- Tokyo Electron Limited
- Adam E. Norton
- G01 - MEASURING TESTING
Information Patent Grant
Matching optical metrology tools using hypothetical profiles
- Patent number 7,446,887
- Issue date Nov 4, 2008
- Tokyo Electron Limited
- Fred Stanke
- G01 - MEASURING TESTING
Information Patent Grant
Matching optical metrology tools using diffraction signals
- Patent number 7,446,888
- Issue date Nov 4, 2008
- Tokyo Electron Limited
- Fred Stanke
- G01 - MEASURING TESTING
Information Patent Grant
Polarimetric scatterometry methods for critical dimension measureme...
- Patent number 7,289,219
- Issue date Oct 30, 2007
- Tokyo Electron Limited
- Adam E. Norton
- G01 - MEASURING TESTING
Information Patent Grant
Small-spot spectrometry instrument with reduced polarization and mu...
- Patent number 7,248,362
- Issue date Jul 24, 2007
- Tokyo Electron Limited
- Adam E. Norton
- G01 - MEASURING TESTING
Information Patent Grant
Apparatus for imaging metrology
- Patent number 7,177,019
- Issue date Feb 13, 2007
- Tokyo Electron Limited
- Fred E. Stanke
- B24 - GRINDING POLISHING
Information Patent Grant
Small-spot spectrometry instrument with reduced polarization and mu...
- Patent number 7,158,229
- Issue date Jan 2, 2007
- Tokyo Electron Limited
- Adam E. Norton
- G01 - MEASURING TESTING
Information Patent Grant
Small-spot spectrometry instrument with reduced polarization and mu...
- Patent number 7,099,081
- Issue date Aug 29, 2006
- Tokyo Electron Limited
- Adam E. Norton
- G01 - MEASURING TESTING
Information Patent Grant
Database interpolation method for optical measurement of diffractiv...
- Patent number 7,069,182
- Issue date Jun 27, 2006
- Tokyo Electron Limited
- Kenneth C. Johnson
- G01 - MEASURING TESTING
Information Patent Grant
Method of measuring meso-scale structures on wafers
- Patent number 7,049,633
- Issue date May 23, 2006
- Tokyo Electron Limited
- Kenneth C. Johnson
- G01 - MEASURING TESTING
Information Patent Grant
Overlay alignment metrology using diffraction gratings
- Patent number 7,042,569
- Issue date May 9, 2006
- Tokyo Electron Limited
- Abdurrahman Sezginer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for imaging metrology
- Patent number 7,042,580
- Issue date May 9, 2006
- Tokyo Electron Limited
- Fred E. Stanke
- B24 - GRINDING POLISHING
Information Patent Grant
Database interpolation method for optical measurement of diffractiv...
- Patent number 6,950,780
- Issue date Sep 27, 2005
- Tokyo Electron Limited
- Kenneth C. Johnson
- G01 - MEASURING TESTING
Information Patent Grant
Wafer metrology apparatus and method
- Patent number 6,919,958
- Issue date Jul 19, 2005
- Therma-Wave, Inc.
- Fred E. Stanke
- B24 - GRINDING POLISHING
Information Patent Grant
Polarimetric scatterometry methods for critical dimension measureme...
- Patent number 6,909,507
- Issue date Jun 21, 2005
- Therma-Wave, Inc.
- Adam E. Norton
- G01 - MEASURING TESTING
Information Patent Grant
Accurate small-spot spectrometry systems and methods
- Patent number 6,870,617
- Issue date Mar 22, 2005
- Therma-Wave, Inc.
- Adam Norton
- G01 - MEASURING TESTING
Information Patent Grant
Optimized aperture shape for optical CD/profile metrology
- Patent number 6,850,333
- Issue date Feb 1, 2005
- Therma-Wave, Inc.
- Kenneth C. Johnson
- G01 - MEASURING TESTING
Information Patent Grant
Integrated surface metrology
- Patent number 6,829,054
- Issue date Dec 7, 2004
- Sensys Instruments Corporation
- Fred E. Stanke
- B24 - GRINDING POLISHING
Information Patent Grant
Overlay alignment metrology using diffraction gratings
- Patent number 6,819,426
- Issue date Nov 16, 2004
- Therma-Wave, Inc.
- Abdurrahman Sezginer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of measuring meso-scale structures on wafers
- Patent number 6,806,105
- Issue date Oct 19, 2004
- Therma-Wave, Inc.
- Kenneth C. Johnson
- G01 - MEASURING TESTING
Information Patent Grant
Polarimetric scatterometer for critical dimension measurements of p...
- Patent number 6,778,273
- Issue date Aug 17, 2004
- Therma-Wave, Inc.
- Adam E. Norton
- G01 - MEASURING TESTING
Information Patent Grant
Database interpolation method for optical measurement of diffractiv...
- Patent number 6,768,967
- Issue date Jul 27, 2004
- Therma-Wave, Inc.
- Kenneth C. Johnson
- G01 - MEASURING TESTING
Information Patent Grant
Spectroscopic ellipsometer without rotating components
- Patent number 6,753,961
- Issue date Jun 22, 2004
- Therma-Wave, Inc.
- Adam E. Norton
- G01 - MEASURING TESTING
Information Patent Grant
Accurate small-spot spectrometry instrument
- Patent number 6,738,136
- Issue date May 18, 2004
- Therma-Wave, Inc.
- Adam Norton
- G01 - MEASURING TESTING
Information Patent Grant
Integrated surface metrology
- Patent number 6,690,473
- Issue date Feb 10, 2004
- Sensys Instruments Corporation
- Fred E. Stanke
- B24 - GRINDING POLISHING
Information Patent Grant
Small-spot spectrometry instrument with reduced polarization
- Patent number 6,667,805
- Issue date Dec 23, 2003
- Sensys Instruments Corporation
- Adam E. Norton
- G01 - MEASURING TESTING
Information Patent Grant
Method of measuring meso-scale structures on wafers
- Patent number 6,623,991
- Issue date Sep 23, 2003
- Therma-Wave, Inc.
- Kenneth C. Johnson
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
INSPECTING HIGH-RESOLUTION PHOTOLITHOGRAPHY MASKS
- Publication number 20140307943
- Publication date Oct 16, 2014
- KLA-Tencor Corporation
- Fred Stanke
- G01 - MEASURING TESTING
Information Patent Application
CALIBRATION METHOD FOR OPTICAL METROLOGY
- Publication number 20100201981
- Publication date Aug 12, 2010
- TOKYO ELECTRON LIMITED
- Fred STANKE
- G01 - MEASURING TESTING
Information Patent Application
DIFFRACTION ORDER SORTING FILTER FOR OPTICAL METROLOGY
- Publication number 20100202055
- Publication date Aug 12, 2010
- TOKYO ELECTRON LIMITED
- Adam Norton
- G02 - OPTICS
Information Patent Application
Polarimetric scatterometry methods for critical dimension measureme...
- Publication number 20080037015
- Publication date Feb 14, 2008
- Adam E. Norton
- G01 - MEASURING TESTING
Information Patent Application
Matching optical metrology tools using hypothetical profiles
- Publication number 20070268497
- Publication date Nov 22, 2007
- TOKYO ELECTRON LIMITED
- Fred Stanke
- G01 - MEASURING TESTING
Information Patent Application
Matching optical metrology tools using diffraction signals
- Publication number 20070268498
- Publication date Nov 22, 2007
- TOKYO ELECTRON LIMITED
- Fred Stanke
- G01 - MEASURING TESTING
Information Patent Application
Small-spot spectrometry instrument with reduced polarization and mu...
- Publication number 20070064229
- Publication date Mar 22, 2007
- Adam E. Norton
- G02 - OPTICS
Information Patent Application
Small-spot spectrometry instrument with reduced polarization and mu...
- Publication number 20060197948
- Publication date Sep 7, 2006
- Adam E. Norton
- G02 - OPTICS
Information Patent Application
Database interpolation method for optical measurement of diffractiv...
- Publication number 20050280832
- Publication date Dec 22, 2005
- Kenneth C. Johnson
- G02 - OPTICS
Information Patent Application
Polarimetric scatterometry methods for critical dimension measureme...
- Publication number 20050174575
- Publication date Aug 11, 2005
- Adam E. Norton
- G01 - MEASURING TESTING
Information Patent Application
Apparatus for imaging metrology
- Publication number 20050128490
- Publication date Jun 16, 2005
- Fred E. Stanke
- B24 - GRINDING POLISHING
Information Patent Application
Method of measuring meso-scale structures on wafers
- Publication number 20050057755
- Publication date Mar 17, 2005
- Kenneth C. Johnson
- G01 - MEASURING TESTING
Information Patent Application
Overlay alignment metrology using diffraction gratings
- Publication number 20050018190
- Publication date Jan 27, 2005
- Abdurrahman Sezginer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Polarimetric scatterometry methods for critical dimension measureme...
- Publication number 20040218179
- Publication date Nov 4, 2004
- Adam E. Norton
- G01 - MEASURING TESTING
Information Patent Application
Accurate small-spot spectrometry systems and methods
- Publication number 20040174524
- Publication date Sep 9, 2004
- Adam Norton
- G01 - MEASURING TESTING
Information Patent Application
Database interpolation method for optical measurement of diffractiv...
- Publication number 20040167722
- Publication date Aug 26, 2004
- Kenneth C. Johnson
- G02 - OPTICS
Information Patent Application
Integrated surface metrology
- Publication number 20040080757
- Publication date Apr 29, 2004
- Fred E. Stanke
- B24 - GRINDING POLISHING
Information Patent Application
Method of measuring meso-scale structures on wafers
- Publication number 20040018653
- Publication date Jan 29, 2004
- Kenneth C. Johnson
- G01 - MEASURING TESTING
Information Patent Application
Wafer metrology apparatus and method
- Publication number 20030184742
- Publication date Oct 2, 2003
- Fred E. Stanke
- B24 - GRINDING POLISHING
Information Patent Application
Accurate small-spot spectrometry instrument
- Publication number 20030090655
- Publication date May 15, 2003
- Adam Norton
- G01 - MEASURING TESTING
Information Patent Application
Polarimetric scatterometer for critical dimension measurements of p...
- Publication number 20030020912
- Publication date Jan 30, 2003
- Adam E. Norton
- G01 - MEASURING TESTING
Information Patent Application
Overlay alignment metrology using diffraction gratings
- Publication number 20020158193
- Publication date Oct 31, 2002
- Abdurrahman Sezginer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of measuring meso-scale structures on wafers
- Publication number 20020090743
- Publication date Jul 11, 2002
- Kenneth Johnson
- G01 - MEASURING TESTING
Information Patent Application
Bathless wafer measurement apparatus and method
- Publication number 20020065028
- Publication date May 30, 2002
- Michael Weber-Grabau
- B24 - GRINDING POLISHING
Information Patent Application
Database interpolation method for optical measurement of diffractiv...
- Publication number 20020038196
- Publication date Mar 28, 2002
- Kenneth C. Johnson
- G01 - MEASURING TESTING
Information Patent Application
Method of detecting residue on a polished wafer
- Publication number 20020022936
- Publication date Feb 21, 2002
- Fred E. Stanke
- G01 - MEASURING TESTING
Information Patent Application
Small-spot spectrometry instrument with reduced polarization
- Publication number 20020021441
- Publication date Feb 21, 2002
- Adam E. Norton
- G01 - MEASURING TESTING
Information Patent Application
Optical critical dimension metrology system integrated into semicon...
- Publication number 20020018217
- Publication date Feb 14, 2002
- Michael Weber-Grabau
- G01 - MEASURING TESTING

Fred STANKE

Person

Patents Grantslast 30 patents

Inspecting high-resolution photolithography masks

Diffraction order sorting filter for optical metrology

Calibration method for optical metrology

Polarimetric scatterometry methods for critical dimension measureme...

Matching optical metrology tools using hypothetical profiles

Matching optical metrology tools using diffraction signals

Polarimetric scatterometry methods for critical dimension measureme...

Small-spot spectrometry instrument with reduced polarization and mu...

Apparatus for imaging metrology

Small-spot spectrometry instrument with reduced polarization and mu...

Small-spot spectrometry instrument with reduced polarization and mu...

Database interpolation method for optical measurement of diffractiv...

Method of measuring meso-scale structures on wafers

Overlay alignment metrology using diffraction gratings

Apparatus for imaging metrology

Database interpolation method for optical measurement of diffractiv...

Wafer metrology apparatus and method

Polarimetric scatterometry methods for critical dimension measureme...

Accurate small-spot spectrometry systems and methods

Optimized aperture shape for optical CD/profile metrology

Integrated surface metrology

Overlay alignment metrology using diffraction gratings

Method of measuring meso-scale structures on wafers

Polarimetric scatterometer for critical dimension measurements of p...

Database interpolation method for optical measurement of diffractiv...

Spectroscopic ellipsometer without rotating components

Accurate small-spot spectrometry instrument

Integrated surface metrology

Small-spot spectrometry instrument with reduced polarization

Method of measuring meso-scale structures on wafers

Patents Applicationslast 30 patents

INSPECTING HIGH-RESOLUTION PHOTOLITHOGRAPHY MASKS

CALIBRATION METHOD FOR OPTICAL METROLOGY

DIFFRACTION ORDER SORTING FILTER FOR OPTICAL METROLOGY

Polarimetric scatterometry methods for critical dimension measureme...

Matching optical metrology tools using hypothetical profiles

Matching optical metrology tools using diffraction signals

Small-spot spectrometry instrument with reduced polarization and mu...

Small-spot spectrometry instrument with reduced polarization and mu...

Database interpolation method for optical measurement of diffractiv...

Polarimetric scatterometry methods for critical dimension measureme...

Apparatus for imaging metrology

Method of measuring meso-scale structures on wafers

Overlay alignment metrology using diffraction gratings

Polarimetric scatterometry methods for critical dimension measureme...

Accurate small-spot spectrometry systems and methods

Database interpolation method for optical measurement of diffractiv...

Integrated surface metrology

Method of measuring meso-scale structures on wafers

Wafer metrology apparatus and method

Accurate small-spot spectrometry instrument

Polarimetric scatterometer for critical dimension measurements of p...

Overlay alignment metrology using diffraction gratings

Method of measuring meso-scale structures on wafers

Bathless wafer measurement apparatus and method

Database interpolation method for optical measurement of diffractiv...

Method of detecting residue on a polished wafer

Small-spot spectrometry instrument with reduced polarization

Optical critical dimension metrology system integrated into semicon...