Frederick W. Buehrer

Person

Poughquag, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Reduction of boron diffusivity in pFETs
- Patent number 7,737,014
- Issue date Jun 15, 2010
- International Business Machines Corporation
- Frederick William Buehrer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Nitridation of STI fill oxide to prevent the loss of STI fill oxide...
- Patent number 7,491,964
- Issue date Feb 17, 2009
- International Business Machines Corporation
- Fred Buehrer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Nitridation of STI fill oxide to prevent the loss of STI fill oxide...
- Patent number 7,491,563
- Issue date Feb 17, 2009
- International Business Machines Corporation
- Fred Buehrer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Formation of ultra-thin oxide layers by self-limiting interfacial o...
- Patent number 7,235,440
- Issue date Jun 26, 2007
- Tokyo Electron Limited
- David L O'Meara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming uniform ultra-thin oxynitride layers
- Patent number 7,202,186
- Issue date Apr 10, 2007
- Tokyo Electron Limited
- David L O'Meara
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Vapor phase etch trim structure with top etch blocking layer
- Patent number 6,884,734
- Issue date Apr 26, 2005
- International Business Machines Corporation
- Frederick W. Buehrer
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Nitridation of STI Fill Oxide to Prevent the Loss of STI Fill Oxide...
- Publication number 20080090379
- Publication date Apr 17, 2008
- International Business Machines Corporation
- Fred Buehrer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Reduction of boron diffusivity in pfets
- Publication number 20070093030
- Publication date Apr 26, 2007
- Frederick William Buehrer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NITRIDATION OF STI FILL OXIDE TO PREVENT THE LOSS OF STI FILL OXIDE...
- Publication number 20060160322
- Publication date Jul 20, 2006
- International Business Machines Corporation
- Fred Buehrer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Formation of ultra-thin oxide layers by self-limiting interfacial o...
- Publication number 20050026453
- Publication date Feb 3, 2005
- TOKYO ELECTRON LIMITED
- David L. O'Meara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of forming uniform ultra-thin oxynitride layers
- Publication number 20050026459
- Publication date Feb 3, 2005
- TOKYO ELECTRON LIMITED
- David L. O'Meara
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Vapor phase etch trim structure with top etch blocking layer
- Publication number 20040198030
- Publication date Oct 7, 2004
- International Business Machines Corporation
- Frederick W. Buehrer
- H01 - BASIC ELECTRIC ELEMENTS

Frederick W. Buehrer

Person

Patents Grantslast 30 patents

Reduction of boron diffusivity in pFETs

Nitridation of STI fill oxide to prevent the loss of STI fill oxide...

Nitridation of STI fill oxide to prevent the loss of STI fill oxide...

Formation of ultra-thin oxide layers by self-limiting interfacial o...

Method of forming uniform ultra-thin oxynitride layers

Vapor phase etch trim structure with top etch blocking layer

Patents Applicationslast 30 patents

Nitridation of STI Fill Oxide to Prevent the Loss of STI Fill Oxide...

Reduction of boron diffusivity in pfets

NITRIDATION OF STI FILL OXIDE TO PREVENT THE LOSS OF STI FILL OXIDE...

Formation of ultra-thin oxide layers by self-limiting interfacial o...

Method of forming uniform ultra-thin oxynitride layers

Vapor phase etch trim structure with top etch blocking layer