Frederik Bijkerk

Person

Amsterdam, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Mirror, in particular for a microlithographic projection exposure s...
- Patent number 11,360,393
- Issue date Jun 14, 2022
- Carl Zeiss SMT GmbH
- Ben Wylie-Van Eerd
- G02 - OPTICS
Information Patent Grant
Reflective optical element
- Patent number 10,916,356
- Issue date Feb 9, 2021
- Carl Zeiss SMT GmbH
- Dmitry Kuznetsov
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
EUV-mirror, optical system with EUV-mirror and associated operating...
- Patent number 9,997,268
- Issue date Jun 12, 2018
- Carl Zeiss SMT GmbH
- Udo Dinger
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method for producing a reflective optical element for EUV-lithography
- Patent number 9,733,580
- Issue date Aug 15, 2017
- Carl Zeiss SMT GmbH
- Alexey Kuznetzov
- B82 - NANO-TECHNOLOGY
Information Patent Grant
EUV-mirror arrangement, optical system with EUV-mirror arrangement...
- Patent number 9,442,383
- Issue date Sep 13, 2016
- Carl Zeiss SMT GmbH
- Udo Dinger
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Reflective optical element and method of manufacturing the same
- Patent number 8,638,494
- Issue date Jan 28, 2014
- Carl Zeiss SMT GmbH
- Tim Tsarfati
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Reflective optical element and method of manufacturing the same
- Patent number 8,411,355
- Issue date Apr 2, 2013
- Carl Zeiss SMT GmbH
- Tim Tsarfati
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Multilayer system with protecting layer system and production method
- Patent number 7,261,957
- Issue date Aug 28, 2007
- Carl Zeiss SMT AG
- Frederik Bijkerk
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Optical element and method for its manufacture as well as lithograp...
- Patent number 7,172,788
- Issue date Feb 6, 2007
- Carl Zeiss SMT AG
- Andrey E. Yakshin
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Radiation source, lithographic apparatus, device manufacturing meth...
- Patent number 6,818,912
- Issue date Nov 16, 2004
- ASML Netherlands B.V.
- Konstantin Nikolaevitch Koshelev
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Radiation source, lithographic apparatus, device manufacturing meth...
- Patent number 6,667,484
- Issue date Dec 23, 2003
- ASML Netherlands B.V.
- Konstantin Nikolaevitch Koshelev
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Multilayer system with protecting layer system and production method
- Patent number 6,656,575
- Issue date Dec 2, 2003
- Carl-Zeiss-Stiftung
- Frederik Bijkerk
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Method for the production of multi-layer systems
- Patent number 6,483,597
- Issue date Nov 19, 2002
- Carl-Zeiss-Stiftung
- Andrey E. Yakshin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Radiation source for extreme ultraviolet radiation, e.g. for use in...
- Patent number 6,469,310
- Issue date Oct 22, 2002
- ASML Netherlands B.V.
- Henryk Fiedorowicz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation source for use in lithographic projection apparatus
- Patent number 6,452,194
- Issue date Sep 17, 2002
- ASML Netherlands B.V.
- Frederik Bijkerk
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
MIRROR, IN PARTICULAR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE S...
- Publication number 20200174379
- Publication date Jun 4, 2020
- Carl Zeiss SMT GMBH
- Ben WYLIE-VAN EERD
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE OPTICAL ELEMENT
- Publication number 20200027623
- Publication date Jan 23, 2020
- Carl Zeiss SMT GMBH
- Dmitry Kuznetsov
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
METHOD, APPARATUS AND COMPUTER PROGRAM FOR MEASURING AND PROCESSING...
- Publication number 20190271586
- Publication date Sep 5, 2019
- Universiteit Twente
- Muharrem Bayraktar
- G01 - MEASURING TESTING
Information Patent Application
EUV MULTILAYER MIRROR, OPTICAL SYSTEM INCLUDING A MULTILAYER MIRROR...
- Publication number 20170365371
- Publication date Dec 21, 2017
- Carl Zeiss SMT GMBH
- Qiushi HUANG
- G02 - OPTICS
Information Patent Application
EUV-MIRROR, OPTICAL SYSTEM WITH EUV-MIRROR AND ASSOCIATED OPERATING...
- Publication number 20160379730
- Publication date Dec 29, 2016
- Carl Zeiss SMT GMBH
- Udo DINGER
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
OPTICAL ELEMENT COMPRISING A MULTILAYER COATING, AND OPTICAL ARRANG...
- Publication number 20160116648
- Publication date Apr 28, 2016
- Carl Zeiss SMT GMBH
- Robbert W. E. VAN DE KRUIJS
- G02 - OPTICS
Information Patent Application
EUV-MIRROR ARRANGEMENT, OPTICAL SYSTEM WITH EUV-MIRROR ARRANGEMENT...
- Publication number 20140285783
- Publication date Sep 25, 2014
- Carl Zeiss SMT GMBH
- Udo DINGER
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHOD FOR PRODUCING A REFLECTIVE OPTICAL ELEMENT FOR EUV-LITHOGRAPHY
- Publication number 20140193591
- Publication date Jul 10, 2014
- Carl Zeiss SMT GMBH
- Alexey KUZNETZOV
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHOD FOR MANUFACTURING A MULTILAYER STRUCTURE WITH A LATERAL PATT...
- Publication number 20130220971
- Publication date Aug 29, 2013
- PANALYTICAL B.V.
- Frederik Bijkerk
- B82 - NANO-TECHNOLOGY
Information Patent Application
REFLECTIVE OPTICAL ELEMENT AND METHOD OF MANUFACTURING THE SAME
- Publication number 20130188248
- Publication date Jul 25, 2013
- Tim TSARFATI
- B82 - NANO-TECHNOLOGY
Information Patent Application
REFLECTIVE OPTICAL ELEMENT AND METHOD OF MANUFACTURING THE SAME
- Publication number 20110194087
- Publication date Aug 11, 2011
- Carl Zeiss SMT GMBH
- Tim TSARFATI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR REGENERATING A SURFACE OF AN OPTICAL ELEMENT IN AN XUV R...
- Publication number 20100171050
- Publication date Jul 8, 2010
- STICHTING VOOR FUNDAMENTEEL ONDERZOEK DER MATERIE
- Frederik Bijkerk
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Multilayer system with protecting layer system and production method
- Publication number 20070281109
- Publication date Dec 6, 2007
- Carl Zeiss SMT AG
- Frederik Bijkerk
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Optical broad band element and process for its production
- Publication number 20050111083
- Publication date May 26, 2005
- Andrey E. Yakshin
- G02 - OPTICS
Information Patent Application
Process for manufacturing multilayer systems
- Publication number 20040245090
- Publication date Dec 9, 2004
- Andrey E. Yakshin
- G02 - OPTICS
Information Patent Application
Multi-layer mirror for radiation in the xuv wavelenght range and me...
- Publication number 20040233519
- Publication date Nov 25, 2004
- Frederik Bijkerk
- B82 - NANO-TECHNOLOGY
Information Patent Application
Multilayer system with protecting layer system and production method
- Publication number 20040121134
- Publication date Jun 24, 2004
- Frederik Bijkerk
- G02 - OPTICS
Information Patent Application
Radiation source, lithographic apparatus, device manufacturing meth...
- Publication number 20040089819
- Publication date May 13, 2004
- ASML NETHERLANDS B.V.
- Konstantin Nikolaevitch Koshelev
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Method for coating substrates and mask holder
- Publication number 20040052942
- Publication date Mar 18, 2004
- Frederik Bijkerk
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Photodiode, charged-coupled device and method for the production
- Publication number 20040021061
- Publication date Feb 5, 2004
- Frederik Bijkerk
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Radiation source, lithographic apparatus, device manufacturing meth...
- Publication number 20020021430
- Publication date Feb 21, 2002
- Konstantin Nikolaevitch Koshelev
- B82 - NANO-TECHNOLOGY
Information Patent Application
Multilayer system with protecting layer system and production method
- Publication number 20020012797
- Publication date Jan 31, 2002
- Frederik Bijkerk
- B82 - NANO-TECHNOLOGY
Information Patent Application
Method for the production of multi-layer systems
- Publication number 20010038456
- Publication date Nov 8, 2001
- Andrey E. Yakshin
- B82 - NANO-TECHNOLOGY
Information Patent Application
Radiation source for use in lithographic projection apparatus
- Publication number 20010004104
- Publication date Jun 21, 2001
- Frederik Bijkerk
- B82 - NANO-TECHNOLOGY

Frederik Bijkerk

Person

Patents Grantslast 30 patents

Mirror, in particular for a microlithographic projection exposure s...

Reflective optical element

EUV-mirror, optical system with EUV-mirror and associated operating...

Method for producing a reflective optical element for EUV-lithography

EUV-mirror arrangement, optical system with EUV-mirror arrangement...

Reflective optical element and method of manufacturing the same

Reflective optical element and method of manufacturing the same

Multilayer system with protecting layer system and production method

Optical element and method for its manufacture as well as lithograp...

Radiation source, lithographic apparatus, device manufacturing meth...

Radiation source, lithographic apparatus, device manufacturing meth...

Multilayer system with protecting layer system and production method

Method for the production of multi-layer systems

Radiation source for extreme ultraviolet radiation, e.g. for use in...

Radiation source for use in lithographic projection apparatus

Patents Applicationslast 30 patents

MIRROR, IN PARTICULAR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE S...

REFLECTIVE OPTICAL ELEMENT

METHOD, APPARATUS AND COMPUTER PROGRAM FOR MEASURING AND PROCESSING...

EUV MULTILAYER MIRROR, OPTICAL SYSTEM INCLUDING A MULTILAYER MIRROR...

EUV-MIRROR, OPTICAL SYSTEM WITH EUV-MIRROR AND ASSOCIATED OPERATING...

OPTICAL ELEMENT COMPRISING A MULTILAYER COATING, AND OPTICAL ARRANG...

EUV-MIRROR ARRANGEMENT, OPTICAL SYSTEM WITH EUV-MIRROR ARRANGEMENT...

METHOD FOR PRODUCING A REFLECTIVE OPTICAL ELEMENT FOR EUV-LITHOGRAPHY

METHOD FOR MANUFACTURING A MULTILAYER STRUCTURE WITH A LATERAL PATT...

REFLECTIVE OPTICAL ELEMENT AND METHOD OF MANUFACTURING THE SAME

REFLECTIVE OPTICAL ELEMENT AND METHOD OF MANUFACTURING THE SAME

METHOD FOR REGENERATING A SURFACE OF AN OPTICAL ELEMENT IN AN XUV R...

Multilayer system with protecting layer system and production method

Optical broad band element and process for its production

Process for manufacturing multilayer systems

Multi-layer mirror for radiation in the xuv wavelenght range and me...

Multilayer system with protecting layer system and production method

Radiation source, lithographic apparatus, device manufacturing meth...

Method for coating substrates and mask holder

Photodiode, charged-coupled device and method for the production

Radiation source, lithographic apparatus, device manufacturing meth...

Multilayer system with protecting layer system and production method

Method for the production of multi-layer systems

Radiation source for use in lithographic projection apparatus