Frederik Blumrich

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Jena, DE

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Patents Grantslast 30 patents

Information Patent Grant
Critical dimension variation correction in extreme ultraviolet lith...
- Patent number 10,670,955
- Issue date Jun 2, 2020
- Carl Zeiss SMT GmbH
- Sergey Oshemkov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Critical dimension variation correction in extreme ultraviolet lith...
- Patent number 10,095,101
- Issue date Oct 9, 2018
- Carl Zeiss SMT GmbH
- Sergey Oshemkov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system for EUV mask blank buried defect analysis
- Patent number 10,055,833
- Issue date Aug 21, 2018
- Carl Zeiss SMT GmbH
- Jan Hendrik Peters
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
CRITICAL DIMENSION VARIATION CORRECTION IN EXTREME ULTRAVIOLET LITH...
- Publication number 20190004417
- Publication date Jan 3, 2019
- Carl Zeiss SMT GMBH
- Sergey OSHEMKOV
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CRITICAL DIMENSION VARIATION CORRECTION IN EXTREME ULTRAVIOLET LITH...
- Publication number 20160370697
- Publication date Dec 22, 2016
- Carl Zeiss SMT GMBH
- Sergey OSHEMKOV
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and System for EUV Mask Blank Buried Defect Analysis
- Publication number 20160169816
- Publication date Jun 16, 2016
- Carl Zeiss SMT GMBH
- Jan Hendrik Peters
- G01 - MEASURING TESTING