Fu-Jye Liang

Person

Kaohsiung, TW

People

Patents Grantslast 30 patents

Information Patent Grant
Layout modification method for exposure manufacturing process
- Patent number 11,594,528
- Issue date Feb 28, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Hung-Wen Cho
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and apparatus for collecting information used in image-error...
- Patent number 11,150,561
- Issue date Oct 19, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hung-Wen Cho
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Layout modification method for exposure manufacturing process
- Patent number 11,024,623
- Issue date Jun 1, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hung-Wen Cho
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method of controlling reticle masking blade positioning to minimize...
- Patent number 10,871,713
- Issue date Dec 22, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hung-Wen Cho
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Layout modification method for exposure manufacturing process
- Patent number 10,720,419
- Issue date Jul 21, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hung-Wen Cho
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and apparatus for collecting information used in image-error...
- Patent number 10,712,651
- Issue date Jul 14, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hung-Wen Cho
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method of controlling reticle masking blade positioning to minimize...
- Patent number 10,642,158
- Issue date May 5, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hung-Wen Cho
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Layout modification method for exposure manufacturing process
- Patent number 10,366,973
- Issue date Jul 30, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hung-Wen Cho
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Lithography process and system with enhanced overlay quality
- Patent number 10,146,141
- Issue date Dec 4, 2018
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chi-Cheng Hung
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for maintaining depth of focus
- Patent number 9,360,767
- Issue date Jun 7, 2016
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chang-Tsun Hsieh
- G02 - OPTICS
Information Patent Grant
System and method for lithography patterning
- Patent number 9,360,778
- Issue date Jun 7, 2016
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Li-Jui Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of overlay prediction
- Patent number 9,158,209
- Issue date Oct 13, 2015
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Li-Jui Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for maintaining depth of focus
- Patent number 9,025,130
- Issue date May 5, 2015
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chang-Tsun Hsieh
- G02 - OPTICS
Information Patent Grant
Method and apparatus of providing overlay
- Patent number 8,592,107
- Issue date Nov 26, 2013
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Guo-Tsai Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for maintaining depth of focus
- Patent number 8,520,189
- Issue date Aug 27, 2013
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chang-Tsun Hsieh
- G02 - OPTICS
Information Patent Grant
Method and apparatus of providing overlay
- Patent number 8,329,360
- Issue date Dec 11, 2012
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Guo-Tsai Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system for improving printing accuracy of a contact layout
- Patent number 7,939,222
- Issue date May 10, 2011
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jhun-Hua Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method for photolithography in semiconductor manufacturing
- Patent number 7,723,014
- Issue date May 25, 2010
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Kuei Shun Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Hood for immersion lithography
- Patent number 7,675,604
- Issue date Mar 9, 2010
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Li-Jui Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure scan and step direction optimization
- Patent number 7,666,576
- Issue date Feb 23, 2010
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Fu-Jye Liang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern compensation for stitching
- Patent number 6,982,135
- Issue date Jan 3, 2006
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chung-Hsing Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
LAYOUT MODIFICATION METHOD FOR EXPOSURE MANUFACTURING PROCESS
- Publication number 20210296303
- Publication date Sep 23, 2021
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hung-Wen CHO
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND APPARATUS FOR COLLECTING INFORMATION USED IN IMAGE-ERROR...
- Publication number 20200348586
- Publication date Nov 5, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hung-Wen CHO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LAYOUT MODIFICATION METHOD FOR EXPOSURE MANUFACTURING PROCESS
- Publication number 20200350306
- Publication date Nov 5, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hung-Wen CHO
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD OF CONTROLLING RETICLE MASKING BLADE POSITIONING TO MINIMIZE...
- Publication number 20200264515
- Publication date Aug 20, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hung-Wen CHO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LAYOUT MODIFICATION METHOD FOR EXPOSURE MANUFACTURING PROCESS
- Publication number 20190348409
- Publication date Nov 14, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hung-Wen CHO
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD OF CONTROLLING RETICLE MASKING BLADE POSITIONING TO MINIMIZE...
- Publication number 20190163046
- Publication date May 30, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hung-Wen CHO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR COLLECTING INFORMATION USED IN IMAGE-ERROR...
- Publication number 20190137866
- Publication date May 9, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hung-Wen CHO
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
LAYOUT MODIFICATION METHOD FOR EXPOSURE MANUFACTURING PROCESS
- Publication number 20190131290
- Publication date May 2, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hung-Wen CHO
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Lithography Process and System with Enhanced Overlay Quality
- Publication number 20160062250
- Publication date Mar 3, 2016
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chi-Cheng Hung
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and Apparatus For Maintaining Depth of Focus
- Publication number 20150220006
- Publication date Aug 6, 2015
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chang-Tsun Hsieh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF OVERLAY PREDICTION
- Publication number 20140111779
- Publication date Apr 24, 2014
- TAIWAN SEMECONDUCTOR MANUFACTURING COMPANY, LTD.
- Li-Jui Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and Apparatus for Maintaining Depth of Focus
- Publication number 20130314708
- Publication date Nov 28, 2013
- Chang-Tsun Hsieh
- G02 - OPTICS
Information Patent Application
SYSTEM AND METHOD FOR LITHOGRAPHY PATTERNING
- Publication number 20130229638
- Publication date Sep 5, 2013
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Li-Jui Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and Apparatus of Providing Overlay
- Publication number 20130056886
- Publication date Mar 7, 2013
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Guo-Tsai Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR MAINTAINING DEPTH OF FOCUS
- Publication number 20110267593
- Publication date Nov 3, 2011
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chang-Tsun Hsieh
- G02 - OPTICS
Information Patent Application
METHOD AND APPARATUS OF PROVIDING OVERLAY
- Publication number 20110133347
- Publication date Jun 9, 2011
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Guo-Tsai Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and System for Improving Printing Accuracy of a Contact Layout
- Publication number 20080226996
- Publication date Sep 18, 2008
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jhun-Hua Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IMMERSION LITHOGRAPHY DEFECT REDUCTION WITH TOP COATER REMOVAL
- Publication number 20080020324
- Publication date Jan 24, 2008
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Lin-Hung SHIU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE SCAN AND STEP DIRECTION OPTIMIZATION
- Publication number 20070285639
- Publication date Dec 13, 2007
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Fu-Jye LIANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
HOOD FOR IMMERSION LITHOGRAPHY
- Publication number 20070258060
- Publication date Nov 8, 2007
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Li-Jui CHEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
System and method for photolithography in semiconductor manufacturing
- Publication number 20070092840
- Publication date Apr 26, 2007
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Kuei Shun Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Pattern compensation for stitching
- Publication number 20040191643
- Publication date Sep 30, 2004
- Chung-Hsing Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Fu-Jye Liang

Person

Patents Grantslast 30 patents

Layout modification method for exposure manufacturing process

Method and apparatus for collecting information used in image-error...

Layout modification method for exposure manufacturing process

Method of controlling reticle masking blade positioning to minimize...

Layout modification method for exposure manufacturing process

Method and apparatus for collecting information used in image-error...

Method of controlling reticle masking blade positioning to minimize...

Layout modification method for exposure manufacturing process

Lithography process and system with enhanced overlay quality

Method and apparatus for maintaining depth of focus

System and method for lithography patterning

Method of overlay prediction

Method and apparatus for maintaining depth of focus

Method and apparatus of providing overlay

Method and apparatus for maintaining depth of focus

Method and apparatus of providing overlay

Method and system for improving printing accuracy of a contact layout

System and method for photolithography in semiconductor manufacturing

Hood for immersion lithography

Exposure scan and step direction optimization

Pattern compensation for stitching

Patents Applicationslast 30 patents

LAYOUT MODIFICATION METHOD FOR EXPOSURE MANUFACTURING PROCESS

METHOD AND APPARATUS FOR COLLECTING INFORMATION USED IN IMAGE-ERROR...

LAYOUT MODIFICATION METHOD FOR EXPOSURE MANUFACTURING PROCESS

METHOD OF CONTROLLING RETICLE MASKING BLADE POSITIONING TO MINIMIZE...

LAYOUT MODIFICATION METHOD FOR EXPOSURE MANUFACTURING PROCESS

METHOD OF CONTROLLING RETICLE MASKING BLADE POSITIONING TO MINIMIZE...

METHOD AND APPARATUS FOR COLLECTING INFORMATION USED IN IMAGE-ERROR...

LAYOUT MODIFICATION METHOD FOR EXPOSURE MANUFACTURING PROCESS

Lithography Process and System with Enhanced Overlay Quality

Method and Apparatus For Maintaining Depth of Focus

METHOD OF OVERLAY PREDICTION

Method and Apparatus for Maintaining Depth of Focus

SYSTEM AND METHOD FOR LITHOGRAPHY PATTERNING

Method and Apparatus of Providing Overlay

METHOD AND APPARATUS FOR MAINTAINING DEPTH OF FOCUS

METHOD AND APPARATUS OF PROVIDING OVERLAY

Method and System for Improving Printing Accuracy of a Contact Layout

IMMERSION LITHOGRAPHY DEFECT REDUCTION WITH TOP COATER REMOVAL

EXPOSURE SCAN AND STEP DIRECTION OPTIMIZATION

HOOD FOR IMMERSION LITHOGRAPHY

System and method for photolithography in semiconductor manufacturing

Pattern compensation for stitching