Fumihide Ikeda

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Substrate processing apparatus and semiconductor device producing m...
- Patent number 6,864,463
- Issue date Mar 8, 2005
- Hitachi Kokusai Electric Inc.
- Fumihide Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor wafer processing apparatus for transferring a wafer m...
- Patent number 6,462,411
- Issue date Oct 8, 2002
- Kokusai Electric Co., Ltd.
- Tomoji Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus
- Patent number 6,332,927
- Issue date Dec 25, 2001
- Kokusai Electric Co., Ltd.
- Yasuhiro Inokuchi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Wet-oxidation apparatus and wet-oxidation method
- Patent number 6,270,581
- Issue date Aug 7, 2001
- Kokusai Electric Co., Ltd.
- Yasuhiro Inokuchi
- C30 - CRYSTAL GROWTH
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 6,217,663
- Issue date Apr 17, 2001
- Kokusai Electric Co., Ltd.
- Yasuhiro Inokuchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus having a gas heating tube
- Patent number 6,139,641
- Issue date Oct 31, 2000
- Kokusai Electric Co., Ltd.
- Yasuhiro Inokuchi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus
- Patent number 6,132,553
- Issue date Oct 17, 2000
- Kokasai Electric Co., Ltd.
- Fumihide Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Heat treatment of semiconductor wafers where upper heater directly...
- Patent number 5,960,159
- Issue date Sep 28, 1999
- Kokusai Electric Co., Ltd.
- Fumihide Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vapor depositing method
- Patent number 5,705,224
- Issue date Jan 6, 1998
- Kokusai Electric Co., Ltd.
- Junichi Murota
- C30 - CRYSTAL GROWTH
Information Patent Grant
Semiconductor wafer reaction furnace with wafer transfer means
- Patent number 5,387,265
- Issue date Feb 7, 1995
- Kokusai Electric Co., Ltd.
- Satoshi Kakizaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20100154711
- Publication date Jun 24, 2010
- Hitachi Kokusai Electric Inc.
- Kiyohisa ISHIBASHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Substrate processing apparatus and semiconductor device producing m...
- Publication number 20030027364
- Publication date Feb 6, 2003
- Hitachi Kokusai Electric Inc.
- Fumihide Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Wet-oxidation apparatus and wet-oxidation method
- Publication number 20010019902
- Publication date Sep 6, 2001
- Kokusai Electric co., Ltd.
- Yasuhiro Inokuchi
- C30 - CRYSTAL GROWTH

Fumihide Ikeda

Person

Patents Grantslast 30 patents

Substrate processing apparatus and semiconductor device producing m...

Semiconductor wafer processing apparatus for transferring a wafer m...

Substrate processing apparatus

Wet-oxidation apparatus and wet-oxidation method

Substrate processing apparatus and substrate processing method

Substrate processing apparatus having a gas heating tube

Substrate processing apparatus

Heat treatment of semiconductor wafers where upper heater directly...

Vapor depositing method

Semiconductor wafer reaction furnace with wafer transfer means

Patents Applicationslast 30 patents

SUBSTRATE PROCESSING APPARATUS

Substrate processing apparatus and semiconductor device producing m...

Wet-oxidation apparatus and wet-oxidation method