Fumihiko Uesugi

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method of manufacturing semiconductor devices and semiconductor man...
- Patent number 8,202,394
- Issue date Jun 19, 2012
- Renesas Electronics Corporation
- Tsuyoshi Moriya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Object-processing apparatus controlling production of particles in...
- Patent number 8,051,799
- Issue date Nov 8, 2011
- Renesas Electronics Corporation
- Yousuke Itagaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus and method of suppressing abnormal disc...
- Patent number 7,974,067
- Issue date Jul 5, 2011
- Renesas Electronics Corporation
- Natsuko Ito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Particle-removing method for a semiconductor device manufacturing a...
- Patent number 7,045,465
- Issue date May 16, 2006
- NEC Electronics Corporation
- Natsuko Ito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for monitoring particles and method of doing the same
- Patent number 7,006,682
- Issue date Feb 28, 2006
- NEC Corporation
- Tsuyoshi Moriya
- G01 - MEASURING TESTING
Information Patent Grant
Apparatus and method for detecting an end point of a cleaning process
- Patent number 6,737,666
- Issue date May 18, 2004
- NEC Electronics Corporation
- Natsuko Ito
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Particle-removing apparatus for a semiconductor device manufacturin...
- Patent number 6,423,176
- Issue date Jul 23, 2002
- NEC Corporation
- Natsuko Ito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vapor-phase processing method capable of eliminating particle forma...
- Patent number 6,346,425
- Issue date Feb 12, 2002
- Tokyo Electron Limited
- Natsuko Ito
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for plasma etching
- Patent number 6,306,770
- Issue date Oct 23, 2001
- NEC Corporation
- Natsuko Ito
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Processing apparatus for fabricating LSI devices
- Patent number 6,284,049
- Issue date Sep 4, 2001
- NEC Corporation
- Fumihiko Uesugi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Particle-removing apparatus for a semiconductor device manufacturin...
- Patent number 6,184,489
- Issue date Feb 6, 2001
- NEC Corporation
- Natsuko Ito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for detecting particles produced in a process cha...
- Patent number 6,115,120
- Issue date Sep 5, 2000
- NEC Corporation
- Tsuyoshi Moriya
- G01 - MEASURING TESTING
Information Patent Grant
Processing apparatus for fabricating LSI with protected beam damper
- Patent number 6,042,650
- Issue date Mar 28, 2000
- NEC Corporation
- Fumihiko Uesugi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Particle monitor and particle-free recessing system with particle m...
- Patent number 5,870,189
- Issue date Feb 9, 1999
- NEC Corporation
- Fumihiko Uesugi
- G01 - MEASURING TESTING
Information Patent Grant
Particle monitoring instrument
- Patent number 5,861,951
- Issue date Jan 19, 1999
- NEC Corporation
- Fumihiko Uesugi
- G01 - MEASURING TESTING
Information Patent Grant
Method for forming a patterned layer by selective chemical vapor de...
- Patent number 5,393,577
- Issue date Feb 28, 1995
- NEC Corporation
- Fumihiko Uesugi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for writing a line on a patterned substrate
- Patent number 4,873,413
- Issue date Oct 10, 1989
- NEC Corporation
- Fumihiko Uesugi
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Particle-removing apparatus for a semiconductor device manufacturin...
- Publication number 20080233756
- Publication date Sep 25, 2008
- Natsuko Ito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OBJECT-PROCESSING APPARATUS CONTROLLING PRODUCTION OF PARTICLES IN...
- Publication number 20080041306
- Publication date Feb 21, 2008
- NEC Electronics Corporation
- Yousuke ITAGAKI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma processing apparatus and method of suppressing abnormal disc...
- Publication number 20070058322
- Publication date Mar 15, 2007
- NEC Electronics Corporation
- Natsuko Ito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Particle-removing apparatus for a semiconductor device manufacturin...
- Publication number 20060131272
- Publication date Jun 22, 2006
- Natsuko Ito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of manufacturing semiconductor devices and semiconductor man...
- Publication number 20030003758
- Publication date Jan 2, 2003
- Tsuyoshi Moriya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device manufacturing apparatus and method for manufac...
- Publication number 20020037652
- Publication date Mar 28, 2002
- Tsuyoshi Moriya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor fabrication device and method for preventing the atta...
- Publication number 20020036343
- Publication date Mar 28, 2002
- NEC Corporation
- Tsuyoshi Moriya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Particle-removing apparatus for a semiconductor device manufacturin...
- Publication number 20020019141
- Publication date Feb 14, 2002
- Natsuko Ito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR PLASMA ETCHING
- Publication number 20010041449
- Publication date Nov 15, 2001
- NATSUKO ITO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Fumihiko Uesugi

Person

Patents Grantslast 30 patents

Method of manufacturing semiconductor devices and semiconductor man...

Object-processing apparatus controlling production of particles in...

Plasma processing apparatus and method of suppressing abnormal disc...

Particle-removing method for a semiconductor device manufacturing a...

Apparatus for monitoring particles and method of doing the same

Apparatus and method for detecting an end point of a cleaning process

Particle-removing apparatus for a semiconductor device manufacturin...

Vapor-phase processing method capable of eliminating particle forma...

Method and apparatus for plasma etching

Processing apparatus for fabricating LSI devices

Particle-removing apparatus for a semiconductor device manufacturin...

System and method for detecting particles produced in a process cha...

Processing apparatus for fabricating LSI with protected beam damper

Particle monitor and particle-free recessing system with particle m...

Particle monitoring instrument

Method for forming a patterned layer by selective chemical vapor de...

Method and apparatus for writing a line on a patterned substrate

Patents Applicationslast 30 patents

Particle-removing apparatus for a semiconductor device manufacturin...

OBJECT-PROCESSING APPARATUS CONTROLLING PRODUCTION OF PARTICLES IN...

Plasma processing apparatus and method of suppressing abnormal disc...

Particle-removing apparatus for a semiconductor device manufacturin...

Method of manufacturing semiconductor devices and semiconductor man...

Semiconductor device manufacturing apparatus and method for manufac...

Semiconductor fabrication device and method for preventing the atta...

Particle-removing apparatus for a semiconductor device manufacturin...

METHOD AND APPARATUS FOR PLASMA ETCHING