Fumihiro Kamimura

Person

Tosu-Shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 11,869,777
- Issue date Jan 9, 2024
- Tokyo Electron Limited
- Fumihiro Kamimura
- B08 - CLEANING
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 11,712,710
- Issue date Aug 1, 2023
- Tokyo Electron Limited
- Fumihiro Kamimura
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Substrate liquid processing apparatus and method, and computer-read...
- Patent number 10,811,266
- Issue date Oct 20, 2020
- Tokyo Electron Limited
- Fumihiro Kamimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method, substrate processing apparatus, and co...
- Patent number 9,627,192
- Issue date Apr 18, 2017
- Tokyo Electron Limited
- Naoyuki Okamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical-liquid mixing method and chemical-liquid mixing apparatus
- Patent number 9,415,356
- Issue date Aug 16, 2016
- Tokyo Electron Limited
- Hiroshi Tanaka
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Chemical-liquid mixing method and chemical-liquid mixing apparatus
- Patent number 9,339,775
- Issue date May 17, 2016
- Tokyo Electron Limited
- Hiroshi Tanaka
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Chemical-liquid mixing method and chemical-liquid mixing apparatus
- Patent number 9,099,502
- Issue date Aug 4, 2015
- Tokyo Electron Limited
- Hiroshi Tanaka
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Substrate liquid processing apparatus, substrate liquid processing...
- Patent number 8,475,668
- Issue date Jul 2, 2013
- Tokyo Electron Limited
- Hiroshi Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Liquid processing apparatus, liquid processing method, and storage...
- Patent number 8,303,723
- Issue date Nov 6, 2012
- Tokyo Electron Limited
- Teruomi Minami
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20240096654
- Publication date Mar 21, 2024
- TOKYO ELECTRON LIMITED
- Fumihiro KAMIMURA
- B08 - CLEANING
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20220230893
- Publication date Jul 21, 2022
- TOKYO ELECTRON LIMITED
- Fumihiro KAMIMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20210098271
- Publication date Apr 1, 2021
- TOKYO ELECTRON LIMITED
- Fumihiro KAMIMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND ST...
- Publication number 20200070196
- Publication date Mar 5, 2020
- TOKYO ELECTRON LIMITED
- Fumihiro KAMIMURA
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
Substrate Processing Apparatus and Substrate Processing Method
- Publication number 20200038897
- Publication date Feb 6, 2020
- TOKYO ELECTRON LIMITED
- Fumihiro KAMIMURA
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
CHEMICAL-LIQUID MIXING METHOD AND CHEMICAL-LIQUID MIXING APPARATUS
- Publication number 20160228832
- Publication date Aug 11, 2016
- TOKYO ELECTRON LIMITED
- Hiroshi TANAKA
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
SUBSTRATE LIQUID PROCESSING APPARATUS AND METHOD, AND COMPUTER-READ...
- Publication number 20160184859
- Publication date Jun 30, 2016
- TOKYO ELECTRON LIMITED
- Fumihiro Kamimura
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING APPARATUS, AND CO...
- Publication number 20160027635
- Publication date Jan 28, 2016
- TOKYO ELECTRON LIMITED
- Naoyuki Okamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHEMICAL-LIQUID MIXING METHOD AND CHEMICAL-LIQUID MIXING APPARATUS
- Publication number 20150290599
- Publication date Oct 15, 2015
- TOKYO ELECTRON LIMITED
- Hiroshi TANAKA
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
SUBSTRATE LIQUID PROCESSING APPARATUS, SUBSTRATE LIQUID PROCESSING...
- Publication number 20110089137
- Publication date Apr 21, 2011
- TOKYO ELECTRON LIMITED
- Hiroshi TANAKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LIQUID PROCESSING APPARATUS, LIQUID PROCESSING METHOD, AND STORAGE...
- Publication number 20100319734
- Publication date Dec 23, 2010
- TOKYO ELECTRON LIMITED
- Teruomi MINAMI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Chemical-liquid mixing method and chemical-liquid mixing apparatus
- Publication number 20080031083
- Publication date Feb 7, 2008
- TOKYO ELECTRON LIMITED
- Hiroshi Tanaka
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL

Fumihiro Kamimura

Person

Patents Grantslast 30 patents

Substrate processing method and substrate processing apparatus

Substrate processing apparatus and substrate processing method

Substrate liquid processing apparatus and method, and computer-read...

Substrate processing method, substrate processing apparatus, and co...

Chemical-liquid mixing method and chemical-liquid mixing apparatus

Chemical-liquid mixing method and chemical-liquid mixing apparatus

Chemical-liquid mixing method and chemical-liquid mixing apparatus

Substrate liquid processing apparatus, substrate liquid processing...

Liquid processing apparatus, liquid processing method, and storage...

Patents Applicationslast 30 patents

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND ST...

Substrate Processing Apparatus and Substrate Processing Method

CHEMICAL-LIQUID MIXING METHOD AND CHEMICAL-LIQUID MIXING APPARATUS

SUBSTRATE LIQUID PROCESSING APPARATUS AND METHOD, AND COMPUTER-READ...

SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING APPARATUS, AND CO...

CHEMICAL-LIQUID MIXING METHOD AND CHEMICAL-LIQUID MIXING APPARATUS

SUBSTRATE LIQUID PROCESSING APPARATUS, SUBSTRATE LIQUID PROCESSING...

LIQUID PROCESSING APPARATUS, LIQUID PROCESSING METHOD, AND STORAGE...

Chemical-liquid mixing method and chemical-liquid mixing apparatus