Fumihiro KOBA

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Kanagawa, JP

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Patents Grantslast 30 patents

Information Patent Grant
Electron beam projection mask
- Patent number 6,887,626
- Issue date May 3, 2005
- NEC Electronics Corporation
- Fumihiro Koba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Stencil mask and method of forming the same
- Patent number 6,468,701
- Issue date Oct 22, 2002
- NEC Corporation
- Fumihiro Koba
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Electron beam exposure mask and pattern designing method thereof
- Patent number 6,447,960
- Issue date Sep 10, 2002
- NEC Corporation
- Hiroshi Yamashita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
High contrast ratio membrane mask
- Patent number 6,351,515
- Issue date Feb 26, 2002
- NEC Corporation
- Fumihiro Koba
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for manufacturing thin gate silicon oxide layer
- Patent number 6,291,365
- Issue date Sep 18, 2001
- NEC Corporation
- Fumihiro Koba
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PATTERN FORMING METHOD AND SEMICONDUCTOR DEVICE MANUFACTURING METHO...
- Publication number 20080070406
- Publication date Mar 20, 2008
- NEC ELECTRONICS CORPORATION
- Fumihiro KOBA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Electron beam projection mask
- Publication number 20020098423
- Publication date Jul 25, 2002
- NEC Corporation
- Fumihiro Koba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Mask for electron beam projection lithography and method of fabrica...
- Publication number 20020066870
- Publication date Jun 6, 2002
- Fumihiro Koba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Stencil mask and method for manufacturing same
- Publication number 20010046646
- Publication date Nov 29, 2001
- NEC Corporation
- Fumihiro Koba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
High contrast ratio membrane mask
- Publication number 20010033634
- Publication date Oct 25, 2001
- Fumihiro Koba
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Electron beam exposure mask and pattern designing method thereof
- Publication number 20010028984
- Publication date Oct 11, 2001
- NEC Corporation
- Hiroshi Yamashita
- H01 - BASIC ELECTRIC ELEMENTS