Fumihiro YOSHINO

Person

Shizuoka, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method for producing radiation-sensitive resin composition and patt...
- Patent number 12,061,415
- Issue date Aug 13, 2024
- FUJIFILM Corporation
- Takumi Tanaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, pat...
- Patent number 11,181,820
- Issue date Nov 23, 2021
- FUJIFILM Corporation
- Fumihiro Yoshino
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, act...
- Patent number 11,009,791
- Issue date May 18, 2021
- FUJIFILM Corporation
- Takamitsu Tomiga
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Active-light-sensitive or radiation-sensitive resin composition, ac...
- Patent number 10,261,417
- Issue date Apr 16, 2019
- FUJIFILM Corporation
- Akiyoshi Goto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming pattern, actinic-ray- or radiation-sensitive resi...
- Patent number 9,551,931
- Issue date Jan 24, 2017
- FUJIFILM Corporation
- Junichi Ito
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method, actinic ray-sensitive or radiation-sensitiv...
- Patent number 9,523,913
- Issue date Dec 20, 2016
- FUJIFILM Corporation
- Keita Kato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Actinic-ray- or radiation-sensitive resin composition, actinic-ray-...
- Patent number 9,519,214
- Issue date Dec 13, 2016
- FUJIFILM Corporation
- Fumihiro Yoshino
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method, actinic ray-sensitive or radiation-sensitiv...
- Patent number 9,482,947
- Issue date Nov 1, 2016
- FUJIFILM Corporation
- Shuhei Yamaguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method, actinic ray-sensitive or radiation-sensitiv...
- Patent number 9,423,689
- Issue date Aug 23, 2016
- FUJIFILM Corporation
- Shuhei Yamaguchi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Pattern forming method, actinic ray-sensitive or radiation-sensitiv...
- Patent number 9,383,645
- Issue date Jul 5, 2016
- FUJIFILM Corporation
- Shuhei Yamaguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method, actinic-ray-sensitive or radiation-sensitiv...
- Patent number 9,316,910
- Issue date Apr 19, 2016
- FUJIFILM Corporation
- Shohei Kataoka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method, actinic ray-sensitive or radiation-sensitiv...
- Patent number 9,120,288
- Issue date Sep 1, 2015
- FUJIFILM Corporation
- Hidenori Takahashi
- B32 - LAYERED PRODUCTS

Patents Applicationslast 30 patents

Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20240027908
- Publication date Jan 25, 2024
- FUJIFILM CORPORATION
- Kotaro TAKAHASHI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
METHOD FOR PRODUCING ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE R...
- Publication number 20230213861
- Publication date Jul 6, 2023
- FUJIFILM CORPORATION
- Takamitsu TOMIGA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20230161253
- Publication date May 25, 2023
- FUJIFILM CORPORATION
- Fumihiro YOSHINO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
METHOD FOR PRODUCING RADIATION-SENSITIVE RESIN COMPOSITION AND PATT...
- Publication number 20230099422
- Publication date Mar 30, 2023
- FUJIFILM CORPORATION
- Takumi TANAKA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR PRODUCING ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE R...
- Publication number 20230028463
- Publication date Jan 26, 2023
- FUJIFILM CORPORATION
- Takamitsu Tomiga
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...
- Publication number 20220146937
- Publication date May 12, 2022
- FUJIFILM CORPORATION
- Naoya HATAKEYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...
- Publication number 20220137512
- Publication date May 5, 2022
- FUJIFILM CORPORATION
- Naoya HATAKEYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE,...
- Publication number 20190196328
- Publication date Jun 27, 2019
- FUJIFILM CORPORATION
- Fumihiro YOSHINO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...
- Publication number 20190137875
- Publication date May 9, 2019
- FUJIFILM CORPORATION
- Naoya HATAKEYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...
- Publication number 20180299777
- Publication date Oct 18, 2018
- FUJIFILM CORPORATION
- Takamitsu TOMIGA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PAT...
- Publication number 20180246406
- Publication date Aug 30, 2018
- FUJIFILM CORPORATION
- Fumihiro YOSHINO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD AND ACTINIC RAY-SENSITIVE OR RADIATION-SENSI...
- Publication number 20180217497
- Publication date Aug 2, 2018
- FUJIFILM CORPORATION
- Fumihiro YOSHINO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTIVE-LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AC...
- Publication number 20170038685
- Publication date Feb 9, 2017
- FUJIFILM CORPORATION
- Akiyoshi GOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMATION METHOD, ACTIVE-LIGHT-SENSITIVE OR RADIATION-SENSI...
- Publication number 20160147156
- Publication date May 26, 2016
- FUJIFILM CORPORATION
- Fumihiro YOSHINO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF FORMING PATTERN, ACTINIC-RAY- OR RADIATION-SENSITIVE RESI...
- Publication number 20160004157
- Publication date Jan 7, 2016
- FUJIFILM CORPORATION
- Junichi ITO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY-...
- Publication number 20150338732
- Publication date Nov 26, 2015
- FUJIFILM CORPORATION
- FUMIHIRO YOSHINO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD, COMPOUND USED THEREIN, ACTINIC RAY-SENSITIV...
- Publication number 20150331314
- Publication date Nov 19, 2015
- FUJIFILM CORPORATION
- Shuhei YAMAGUCHI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, MET...
- Publication number 20150253662
- Publication date Sep 10, 2015
- FUJIFILM CORPORATION
- Keita KATO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIV...
- Publication number 20140242505
- Publication date Aug 28, 2014
- FUJIFILM CORPORATION
- Shuhei YAMAGUCHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIV...
- Publication number 20140234762
- Publication date Aug 21, 2014
- FUJIFILM CORPORATION
- Shuhei YAMAGUCHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIV...
- Publication number 20140141360
- Publication date May 22, 2014
- FUJIFILM CORPORATION
- Shuhei YAMAGUCHI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIV...
- Publication number 20140087310
- Publication date Mar 27, 2014
- FUJIFILM CORPORATION
- Keita KATO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIV...
- Publication number 20140045117
- Publication date Feb 13, 2014
- FUJIFILM CORPORATION
- Shuhei YAMAGUCHI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIV...
- Publication number 20140011134
- Publication date Jan 9, 2014
- FUJIFILM CORPORATION
- Hidenori TAKAHASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIV...
- Publication number 20130078432
- Publication date Mar 28, 2013
- FUJIFILM CORPORATION
- Hidenori TAKAHASHI
- B32 - LAYERED PRODUCTS
Information Patent Application
PATTERN FORMING METHOD, ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIV...
- Publication number 20120219913
- Publication date Aug 30, 2012
- FUJIFILM CORPORATION
- Shohei KATAOKA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Fumihiro YOSHINO

Person

Patents Grantslast 30 patents

Method for producing radiation-sensitive resin composition and patt...

Actinic ray-sensitive or radiation-sensitive resin composition, pat...

Actinic ray-sensitive or radiation-sensitive resin composition, act...

Active-light-sensitive or radiation-sensitive resin composition, ac...

Method of forming pattern, actinic-ray- or radiation-sensitive resi...

Pattern forming method, actinic ray-sensitive or radiation-sensitiv...

Actinic-ray- or radiation-sensitive resin composition, actinic-ray-...

Pattern forming method, actinic ray-sensitive or radiation-sensitiv...

Pattern forming method, actinic ray-sensitive or radiation-sensitiv...

Pattern forming method, actinic ray-sensitive or radiation-sensitiv...

Pattern forming method, actinic-ray-sensitive or radiation-sensitiv...

Pattern forming method, actinic ray-sensitive or radiation-sensitiv...

Patents Applicationslast 30 patents

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...

METHOD FOR PRODUCING ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE R...

ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...

METHOD FOR PRODUCING RADIATION-SENSITIVE RESIN COMPOSITION AND PATT...

METHOD FOR PRODUCING ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE R...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...

PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE,...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PAT...

PATTERN FORMING METHOD AND ACTINIC RAY-SENSITIVE OR RADIATION-SENSI...

ACTIVE-LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AC...

PATTERN FORMATION METHOD, ACTIVE-LIGHT-SENSITIVE OR RADIATION-SENSI...

METHOD OF FORMING PATTERN, ACTINIC-RAY- OR RADIATION-SENSITIVE RESI...

ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY-...

PATTERN FORMING METHOD, COMPOUND USED THEREIN, ACTINIC RAY-SENSITIV...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, MET...

PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIV...

PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIV...

PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIV...

PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIV...

PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIV...

PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIV...

PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIV...

PATTERN FORMING METHOD, ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIV...