Fumiko Iwao

Person

Koshi-Machi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Film forming method, computer storage medium, and film forming system
- Patent number 9,741,559
- Issue date Aug 22, 2017
- Tokyo Electron Limited
- Satoru Shimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate treatment method, non-transitory computer storage medium...
- Patent number 9,341,952
- Issue date May 17, 2016
- Tokyo Electron Limited
- Fumiko Iwao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Film forming method, non-transitory computer storage medium and fil...
- Patent number 9,329,483
- Issue date May 3, 2016
- Tokyo Electron Limited
- Fumiko Iwao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate treatment method, non-transitory computer storage medium...
- Patent number 9,280,052
- Issue date Mar 8, 2016
- Tokyo Electron Limited
- Fumiko Iwao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate treatment method, substrate treatment apparatus, and non-...
- Patent number 8,842,257
- Issue date Sep 23, 2014
- Tokyo Electron Limited
- Shinji Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Coating treatment method and coating treatment apparatus
- Patent number 8,791,030
- Issue date Jul 29, 2014
- Tokyo Electron Limited
- Fumiko Iwao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing semiconductor device and apparatus for man...
- Patent number 8,530,357
- Issue date Sep 10, 2013
- Tokyo Electron Limited
- Fumiko Iwao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing semiconductor device, and resist coating an...
- Patent number 8,202,682
- Issue date Jun 19, 2012
- Tokyo Electron Limited
- Fumiko Iwao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate cleaning method and developing apparatus
- Patent number 7,901,514
- Issue date Mar 8, 2011
- Tokyo Electron Limited
- Junji Nakamura
- B08 - CLEANING
Information Patent Grant
Substrate cleaning method and developing apparatus
- Patent number 7,604,013
- Issue date Oct 20, 2009
- Tokyo Electron Limited
- Junji Nakamura
- B08 - CLEANING

Patents Applicationslast 30 patents

Information Patent Application
FILM FORMING METHOD, COMPUTER STORAGE MEDIUM, AND FILM FORMING SYSTEM
- Publication number 20150357188
- Publication date Dec 10, 2015
- TOKYO ELECTRON LIMITED
- Satoru SHIMURA
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
SUBSTRATE TREATMENT METHOD, NON-TRANSITORY COMPUTER STORAGE MEDIUM...
- Publication number 20140255852
- Publication date Sep 11, 2014
- TOKYO ELECTRON LIMITED
- Fumiko IWAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE TREATMENT METHOD, NON-TRANSITORY COMPUTER STORAGE MEDIUM...
- Publication number 20140255844
- Publication date Sep 11, 2014
- TOKYO ELECTRON LIMITED
- Fumiko IWAO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FILM FORMING METHOD, NON-TRANSITORY COMPUTER STORAGE MEDIUM AND FIL...
- Publication number 20140170332
- Publication date Jun 19, 2014
- TOKYO ELECTRON LIMITED
- Fumiko IWAO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COATING TREATMENT METHOD AND COATING TREATMENT APPARATUS
- Publication number 20140038423
- Publication date Feb 6, 2014
- TOKYO ELECTRON LIMITED
- Fumiko IWAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE AND APPARATUS FOR MAN...
- Publication number 20120302066
- Publication date Nov 29, 2012
- TOKYO ELECTRON LIMITED
- Fumiko Iwao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE TREATMENT METHOD, SUBSTRATE TREATMENT APPARATUS, AND NON-...
- Publication number 20120225390
- Publication date Sep 6, 2012
- TOKYO ELECTRON LIMITED
- Shinji KOBAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE CLEANING METHOD AND DEVELOPING APPARATUS
- Publication number 20090272407
- Publication date Nov 5, 2009
- TOKYO ELECTRON LIMITED
- Junji Nakamura
- B08 - CLEANING
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND RESIST COATING AN...
- Publication number 20090220892
- Publication date Sep 3, 2009
- TOKYO ELECTRON LIMITED
- Fumiko IWAO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Substrate cleaning method and developing apparatus
- Publication number 20060048792
- Publication date Mar 9, 2006
- TOKYO ELECTRON LIMITED
- Junji Nakamura
- B08 - CLEANING

Fumiko Iwao

Person

Patents Grantslast 30 patents

Film forming method, computer storage medium, and film forming system

Substrate treatment method, non-transitory computer storage medium...

Film forming method, non-transitory computer storage medium and fil...

Substrate treatment method, non-transitory computer storage medium...

Substrate treatment method, substrate treatment apparatus, and non-...

Coating treatment method and coating treatment apparatus

Method for manufacturing semiconductor device and apparatus for man...

Method of manufacturing semiconductor device, and resist coating an...

Substrate cleaning method and developing apparatus

Substrate cleaning method and developing apparatus

Patents Applicationslast 30 patents

FILM FORMING METHOD, COMPUTER STORAGE MEDIUM, AND FILM FORMING SYSTEM

SUBSTRATE TREATMENT METHOD, NON-TRANSITORY COMPUTER STORAGE MEDIUM...

SUBSTRATE TREATMENT METHOD, NON-TRANSITORY COMPUTER STORAGE MEDIUM...

FILM FORMING METHOD, NON-TRANSITORY COMPUTER STORAGE MEDIUM AND FIL...

COATING TREATMENT METHOD AND COATING TREATMENT APPARATUS

METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE AND APPARATUS FOR MAN...

SUBSTRATE TREATMENT METHOD, SUBSTRATE TREATMENT APPARATUS, AND NON-...

SUBSTRATE CLEANING METHOD AND DEVELOPING APPARATUS

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND RESIST COATING AN...

Substrate cleaning method and developing apparatus