Fumio ARAMAKI

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method for acquiring image and ion beam apparatus
- Patent number 10,276,343
- Issue date Apr 30, 2019
- Tomokazu Kozakai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for acquiring image and ion beam apparatus
- Patent number 10,014,157
- Issue date Jul 3, 2018
- Hitachi High-Tech Science Corporation
- Tomokazu Kozakai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Focused ion beam apparatus
- Patent number 9,793,085
- Issue date Oct 17, 2017
- Hitachi High-Tech Science Corporation
- Anto Yasaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam apparatus and processing method
- Patent number 9,793,092
- Issue date Oct 17, 2017
- Hitachi High-Tech Science Corporation
- Masashi Muramatsu
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Iridium tip, gas field ion source, focused ion beam apparatus, elec...
- Patent number 9,773,634
- Issue date Sep 26, 2017
- Hitachi High-Tech Science Corporation
- Tomokazu Kozakai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Iridium tip, gas field ion source, focused ion beam apparatus, elec...
- Patent number 9,583,299
- Issue date Feb 28, 2017
- Hitachi High-Tech Science Corporation
- Tomokazu Kozakai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Focused ion beam apparatus and control method thereof
- Patent number 9,418,817
- Issue date Aug 16, 2016
- Hitachi High-Tech Science Corporation
- Fumio Aramaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Repair apparatus
- Patent number 9,378,858
- Issue date Jun 28, 2016
- Hitachi High-Tech Science Corporation
- Fumio Aramaki
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Focused ion beam apparatus with precious metal emitter surface
- Patent number 9,336,979
- Issue date May 10, 2016
- Hitachi High-Tech Science Corporation
- Anto Yasaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabricating emitter
- Patent number 8,999,178
- Issue date Apr 7, 2015
- Hitachi High-Tech Science Corporation
- Yasuhiko Sugiyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Nitrogen ions from a gas field ion source held at a pressure of 1.0...
- Patent number 8,963,100
- Issue date Feb 24, 2015
- Hitachi High-Tech Science Corporation
- Anto Yasaka
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Charged particle beam apparatus and method for forming observation...
- Patent number 8,890,093
- Issue date Nov 18, 2014
- Hitachi High-Tech Science Corporation
- Tomokazu Kozakai
- G01 - MEASURING TESTING
Information Patent Grant
Method for fabricating emitter
- Patent number 8,764,994
- Issue date Jul 1, 2014
- Hitachi High-Tech Science Corporation
- Yasuhiko Sugiyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Defect repair apparatus and method for EUV mask using a hydrogen io...
- Patent number 8,460,842
- Issue date Jun 11, 2013
- SII NanoTechnology Inc.
- Takashi Ogawa
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
MASK REPAIR APPARATUS AND METHOD FOR REPAIRING MASK
- Publication number 20200310245
- Publication date Oct 1, 2020
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Tomokazu KOZAKAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR ACQUIRING IMAGE AND ION BEAM APPARATUS
- Publication number 20180269029
- Publication date Sep 20, 2018
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Tomokazu KOZAKAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Iridium Tip, Gas Field Ion Source, Focused Ion Beam Apparatus, Elec...
- Publication number 20170148603
- Publication date May 25, 2017
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Tomokazu Kozakai
- G01 - MEASURING TESTING
Information Patent Application
METHOD FOR ACQUIRING IMAGE AND ION BEAM APPARATUS
- Publication number 20170092461
- Publication date Mar 30, 2017
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Tomokazu KOZAKAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Repair Apparatus
- Publication number 20160322123
- Publication date Nov 3, 2016
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Fumio Aramaki
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
FOCUSED ION BEAM APPARATUS
- Publication number 20160225574
- Publication date Aug 4, 2016
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Anto YASAKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM APPARATUS AND PROCESSING METHOD
- Publication number 20150206708
- Publication date Jul 23, 2015
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Masashi MURAMATSU
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
FOCUSED ION BEAM APPARATUS
- Publication number 20150162160
- Publication date Jun 11, 2015
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Anto YASAKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Repair Apparatus
- Publication number 20150053866
- Publication date Feb 26, 2015
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Fumio Aramaki
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
Iridium Tip, Gas Field Ion Source, Focused Ion Beam Apparatus, Elec...
- Publication number 20150047079
- Publication date Feb 12, 2015
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Tomokazu Kozakai
- G01 - MEASURING TESTING
Information Patent Application
FOCUSED ION BEAM APPARATUS AND CONTROL METHOD THEREOF
- Publication number 20140292189
- Publication date Oct 2, 2014
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Fumio ARAMAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM APPARATUS AND METHOD FOR FORMING OBSERVATION...
- Publication number 20140291509
- Publication date Oct 2, 2014
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Tomokazu KOZAKAI
- G01 - MEASURING TESTING
Information Patent Application
METHOD FOR FABRICATING EMITTER
- Publication number 20140246397
- Publication date Sep 4, 2014
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Yasuhiko SUGIYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FABRICATING EMITTER
- Publication number 20130248483
- Publication date Sep 26, 2013
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Yasuhiko SUGIYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FOCUSED ION BEAM APPARATUS
- Publication number 20130099133
- Publication date Apr 25, 2013
- Anto YASAKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Defect repair apparatus and method for EUV mask
- Publication number 20110189593
- Publication date Aug 4, 2011
- Takashi Ogawa
- B82 - NANO-TECHNOLOGY
Information Patent Application
Defect correction method for a photomask
- Publication number 20040209172
- Publication date Oct 21, 2004
- Osamu Takaoka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Fumio ARAMAKI

Person

Patents Grantslast 30 patents

Method for acquiring image and ion beam apparatus

Method for acquiring image and ion beam apparatus

Focused ion beam apparatus

Charged particle beam apparatus and processing method

Iridium tip, gas field ion source, focused ion beam apparatus, elec...

Iridium tip, gas field ion source, focused ion beam apparatus, elec...

Focused ion beam apparatus and control method thereof

Repair apparatus

Focused ion beam apparatus with precious metal emitter surface

Method for fabricating emitter

Nitrogen ions from a gas field ion source held at a pressure of 1.0...

Charged particle beam apparatus and method for forming observation...

Method for fabricating emitter

Defect repair apparatus and method for EUV mask using a hydrogen io...

Patents Applicationslast 30 patents

MASK REPAIR APPARATUS AND METHOD FOR REPAIRING MASK

METHOD FOR ACQUIRING IMAGE AND ION BEAM APPARATUS

Iridium Tip, Gas Field Ion Source, Focused Ion Beam Apparatus, Elec...

METHOD FOR ACQUIRING IMAGE AND ION BEAM APPARATUS

Repair Apparatus

FOCUSED ION BEAM APPARATUS

CHARGED PARTICLE BEAM APPARATUS AND PROCESSING METHOD

FOCUSED ION BEAM APPARATUS

Repair Apparatus

Iridium Tip, Gas Field Ion Source, Focused Ion Beam Apparatus, Elec...

FOCUSED ION BEAM APPARATUS AND CONTROL METHOD THEREOF

CHARGED PARTICLE BEAM APPARATUS AND METHOD FOR FORMING OBSERVATION...

METHOD FOR FABRICATING EMITTER

METHOD FOR FABRICATING EMITTER

FOCUSED ION BEAM APPARATUS

Defect repair apparatus and method for EUV mask

Defect correction method for a photomask