Fumitake Kikuchi

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Naka-shi, JP

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Patents Grantslast 30 patents

Information Patent Grant
High purity copper sputtering target material
- Patent number 10,889,889
- Issue date Jan 12, 2021
- Mitsubishi Materials Corporation
- Satoru Mori
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Silicon part for plasma etching apparatus and method of producing t...
- Patent number 9,472,380
- Issue date Oct 18, 2016
- Mitsubishi Materials Corporation
- Fumitake Kikuchi
- C01 - INORGANIC CHEMISTRY

Patents Applicationslast 30 patents

Information Patent Application
HIGH PURITY COPPER SPUTTERING TARGET MATERIAL
- Publication number 20180237901
- Publication date Aug 23, 2018
- MITSUBISHI MATERIALS CORPORATION
- Satoru Mori
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
SILICON PART FOR PLASMA ETCHING APPARATUS AND METHOD OF PRODUCING T...
- Publication number 20140187409
- Publication date Jul 3, 2014
- MITSUBISHI MATERIALS CORPORATION
- Fumitake Kikuchi
- H01 - BASIC ELECTRIC ELEMENTS