Fuyuhiko Inoue

Person

San Mateo, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Interferometer system
- Patent number 6,813,022
- Issue date Nov 2, 2004
- Nikon Corporation
- Fuyuhiko Inoue
- G01 - MEASURING TESTING
Information Patent Grant
Switching type dual wafer stage
- Patent number 6,785,005
- Issue date Aug 31, 2004
- Nikon Corporation
- Fuyuhiko Inoue
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Position detecting method and unit, optical characteristic measurin...
- Patent number 6,724,464
- Issue date Apr 20, 2004
- Nikon Corporation
- Juping Yang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Position detecting method optical characteristic measuring method a...
- Patent number 6,714,282
- Issue date Mar 30, 2004
- Nikon Corporation
- Fuyuhiko Inoue
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Interferometer system for a semiconductor exposure system
- Patent number 6,674,512
- Issue date Jan 6, 2004
- Nikon Corporation
- W. Thomas Novak
- G01 - MEASURING TESTING
Information Patent Grant
Two stage method
- Patent number 6,665,054
- Issue date Dec 16, 2003
- Nikon Corporation
- Fuyuhiko Inoue
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Autofocus system using common path interferometry
- Patent number H1972
- Issue date Jul 3, 2001
- Nikon Corporation
- Fuyuhiko Inoue
- 356 - Optics: measuring and testing
Information Patent Grant
Interferometer system and method for lens column alignment
- Patent number 6,160,628
- Issue date Dec 12, 2000
- Nikon Corporation
- Fuyuhiko Inoue
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Two stage method
- Publication number 20030076482
- Publication date Apr 24, 2003
- Fuyuhiko Inoue
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Interferometer system for a semiconductor exposure system
- Publication number 20030063267
- Publication date Apr 3, 2003
- W. Thomas Novak
- G01 - MEASURING TESTING
Information Patent Application
Switching type dual wafer stage
- Publication number 20030063289
- Publication date Apr 3, 2003
- Fuyuhiko Inoue
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Interferometer system
- Publication number 20030035116
- Publication date Feb 20, 2003
- Fuyuhiko Inoue
- G01 - MEASURING TESTING
Information Patent Application
Position Detecting method optical characteristic measuring method a...
- Publication number 20020122163
- Publication date Sep 5, 2002
- Nikon Corporation
- Fuyuhiko Inoue
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Position detecting method and unit, optical characteristic measurin...
- Publication number 20020118349
- Publication date Aug 29, 2002
- Nikon Corporation
- Juping Yang
- G06 - COMPUTING CALCULATING COUNTING

Fuyuhiko Inoue

Person

Patents Grantslast 30 patents

Interferometer system

Switching type dual wafer stage

Position detecting method and unit, optical characteristic measurin...

Position detecting method optical characteristic measuring method a...

Interferometer system for a semiconductor exposure system

Two stage method

Autofocus system using common path interferometry

Interferometer system and method for lens column alignment

Patents Applicationslast 30 patents

Two stage method

Interferometer system for a semiconductor exposure system

Switching type dual wafer stage

Interferometer system

Position Detecting method optical characteristic measuring method a...

Position detecting method and unit, optical characteristic measurin...