Gang Liu

Person

Fremont, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Ex situ coating of chamber components for semiconductor processing
- Patent number 12,163,219
- Issue date Dec 10, 2024
- Lam Research Corporation
- Damodar Rajaram Shanbhag
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ex situ coating of chamber components for semiconductor processing
- Patent number 11,365,479
- Issue date Jun 21, 2022
- Lam Research Corporation
- Damodar Shanbhag
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ex situ coating of chamber components for semiconductor processing
- Patent number 10,760,158
- Issue date Sep 1, 2020
- Lam Research Corporation
- Damodar Shanbhag
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chamber conditioning for remote plasma process
- Patent number 10,211,099
- Issue date Feb 19, 2019
- Lam Research Corporation
- Deqi Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
System and method for tuning a receiver by iteratively dividing a f...
- Patent number 9,148,188
- Issue date Sep 29, 2015
- Marvell International Ltd.
- Songping Wu
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Grant
System and method for non-crystal-based communications
- Patent number 8,571,142
- Issue date Oct 29, 2013
- Marvell International Ltd.
- Songping Wu
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Grant
RF-AGC scheme insensitive to channel interference and deep fading
- Patent number 8,050,643
- Issue date Nov 1, 2011
- Marvell International Ltd.
- Songping Wu
- H04 - ELECTRIC COMMUNICATION TECHNIQUE

Patents Applicationslast 30 patents

Information Patent Application
EDGE RINGS FOR IMPROVED EDGED UNIFORMITY IN SEMICONDUCTOR PROCESSIN...
- Publication number 20250014938
- Publication date Jan 9, 2025
- LAM RESEARCH CORPORATION
- Anand Chandrashekar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS GAS RAMP DURING SEMICONDUCTOR PROCESSING
- Publication number 20240376598
- Publication date Nov 14, 2024
- LAM RESEARCH CORPORATION
- Jasmine LIN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
REDUCING LINE BENDING DURING METAL FILL PROCESS
- Publication number 20240158913
- Publication date May 16, 2024
- LAM RESEARCH CORPORATION
- Anand Chandrashekar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FEATURE FILL WITH NUCLEATION INHIBITION
- Publication number 20230122846
- Publication date Apr 20, 2023
- LAM RESEARCH CORPORATION
- Rohit KHARE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EX SITU COATING OF CHAMBER COMPONENTS FOR SEMICONDUCTOR PROCESSING
- Publication number 20230002891
- Publication date Jan 5, 2023
- LAM RESEARCH CORPORATION
- Damodar Rajaram SHANBHAG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
BACKSIDE REACTIVE INHIBITION GAS
- Publication number 20220415711
- Publication date Dec 29, 2022
- LAM RESEARCH CORPORATION
- Gang LIU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
EX SITU COATING OF CHAMBER COMPONENTS FOR SEMICONDUCTOR PROCESSING
- Publication number 20220275504
- Publication date Sep 1, 2022
- LAM RESEARCH CORPORATION
- Damodar Rajaram SHANBHAG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TUNGSTEN FEATURE FILL WITH INHIBITION CONTROL
- Publication number 20220172987
- Publication date Jun 2, 2022
- LAM RESEARCH CORPORATION
- Tsung-Han Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CLEANING SYSTEM FOR REMOVING DEPOSITS FROM PUMP IN AN EXHAUST OF A...
- Publication number 20210257194
- Publication date Aug 19, 2021
- LAM RESEARCH CORPORATION
- Krishna BIRRU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EX SITU COATING OF CHAMBER COMPONENTS FOR SEMICONDUCTOR PROCESSING
- Publication number 20200347497
- Publication date Nov 5, 2020
- LAM RESEARCH CORPORATION
- Damodar Shanbhag
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TUNGSTEN FEATURE FILL WITH NUCLEATION INHIBITION
- Publication number 20190326168
- Publication date Oct 24, 2019
- Novellus Systems, Inc.
- Tsung-Han Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
EX SITU COATING OF CHAMBER COMPONENTS FOR SEMICONDUCTOR PROCESSING
- Publication number 20190185999
- Publication date Jun 20, 2019
- LAM RESEARCH CORPORATION
- Damodar Shanbhag
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CHAMBER CONDITIONING FOR REMOTE PLASMA PROCESS
- Publication number 20180174901
- Publication date Jun 21, 2018
- LAM RESEARCH CORPORATION
- Deqi Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TUNGSTEN FEATURE FILL WITH NUCLEATION INHIBITION
- Publication number 20170365513
- Publication date Dec 21, 2017
- LAM RESEARCH CORPORATION
- Tsung-Han Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Low-voltage memory having flexible gate charging element
- Publication number 20090121273
- Publication date May 14, 2009
- Tsu-Jae King
- H01 - BASIC ELECTRIC ELEMENTS

Person

Patents Grantslast 30 patents

Ex situ coating of chamber components for semiconductor processing

Ex situ coating of chamber components for semiconductor processing

Ex situ coating of chamber components for semiconductor processing

Chamber conditioning for remote plasma process

System and method for tuning a receiver by iteratively dividing a f...

System and method for non-crystal-based communications

RF-AGC scheme insensitive to channel interference and deep fading

Patents Applicationslast 30 patents

EDGE RINGS FOR IMPROVED EDGED UNIFORMITY IN SEMICONDUCTOR PROCESSIN...

PROCESS GAS RAMP DURING SEMICONDUCTOR PROCESSING

REDUCING LINE BENDING DURING METAL FILL PROCESS

FEATURE FILL WITH NUCLEATION INHIBITION

EX SITU COATING OF CHAMBER COMPONENTS FOR SEMICONDUCTOR PROCESSING

BACKSIDE REACTIVE INHIBITION GAS

EX SITU COATING OF CHAMBER COMPONENTS FOR SEMICONDUCTOR PROCESSING

TUNGSTEN FEATURE FILL WITH INHIBITION CONTROL

CLEANING SYSTEM FOR REMOVING DEPOSITS FROM PUMP IN AN EXHAUST OF A...

EX SITU COATING OF CHAMBER COMPONENTS FOR SEMICONDUCTOR PROCESSING

TUNGSTEN FEATURE FILL WITH NUCLEATION INHIBITION

EX SITU COATING OF CHAMBER COMPONENTS FOR SEMICONDUCTOR PROCESSING

CHAMBER CONDITIONING FOR REMOTE PLASMA PROCESS

TUNGSTEN FEATURE FILL WITH NUCLEATION INHIBITION

Low-voltage memory having flexible gate charging element