Gangadhara Raja MUTHINTI

Person

Albany, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Secure fingerprinting of a trusted photomask
- Patent number 12,086,528
- Issue date Sep 10, 2024
- International Business Machines Corporation
- Scott David Halle
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Semiconductor device with linerless contacts
- Patent number 11,688,632
- Issue date Jun 27, 2023
- International Business Machines Corporation
- Alex Joseph Varghese
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Determination of optical roughness in EUV structures
- Patent number 11,619,877
- Issue date Apr 4, 2023
- International Business Machines Corporation
- Ravi K. Bonam
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Determination of optical roughness in EUV structures
- Patent number 11,480,868
- Issue date Oct 25, 2022
- International Business Machines Corporation
- Ravi K. Bonam
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Single metallization scheme for gate, source, and drain contact int...
- Patent number 11,309,221
- Issue date Apr 19, 2022
- International Business Machines Corporation
- Andrew Greene
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hybridization for characterization and metrology
- Patent number 11,295,969
- Issue date Apr 5, 2022
- International Business Machines Corporation
- Gangadhara Raja Muthinti
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Adjustable via dimension and chamfer angle
- Patent number 11,276,636
- Issue date Mar 15, 2022
- International Business Machines Corporation
- Lawrence A. Clevenger
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dielectric damage-free dual damascene Cu interconnects without barr...
- Patent number 11,101,172
- Issue date Aug 24, 2021
- International Business Machines Corporation
- Koichi Motoyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-channel overlay metrology
- Patent number 11,054,250
- Issue date Jul 6, 2021
- International Business Machines Corporation
- Gangadhara Raja Muthinti
- G01 - MEASURING TESTING
Information Patent Grant
Single metallization scheme for gate, source, and drain contact int...
- Patent number 10,985,076
- Issue date Apr 20, 2021
- International Business Machines Corporation
- Andrew Greene
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hybrid BEOL metallization utilizing selective reflection mask
- Patent number 10,957,646
- Issue date Mar 23, 2021
- International Business Machines Corporation
- Benjamin D. Briggs
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gate contact over active enabled by alternative spacer scheme and c...
- Patent number 10,943,990
- Issue date Mar 9, 2021
- International Business Machines Corporation
- Andrew Greene
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gate cut critical dimension shrink and active gate defect healing u...
- Patent number 10,923,401
- Issue date Feb 16, 2021
- International Business Machines Corporation
- Andrew Greene
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device with linerless contacts
- Patent number 10,903,111
- Issue date Jan 26, 2021
- International Business Machines Corporation
- Alex Joseph Varghese
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pre-patterned etch stop for interconnect trench formation overlying...
- Patent number 10,741,609
- Issue date Aug 11, 2020
- International Business Machines Corporation
- Gangadhara Raja Muthinti
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dielectric damage-free dual damascene Cu interconnects without barr...
- Patent number 10,658,233
- Issue date May 19, 2020
- International Business Machines Corporation
- Koichi Motoyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hybrid BEOL metallization utilizing selective reflection mask
- Patent number 10,586,767
- Issue date Mar 10, 2020
- International Business Machines Corporation
- Benjamin D. Briggs
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for characterization of a layered structure
- Patent number 10,139,358
- Issue date Nov 27, 2018
- International Business Machines Corporation
- Lisa F. Edge
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
THREE-DIMENSIONAL ROUGHNESS EXTRACTION OF METAL
- Publication number 20230177247
- Publication date Jun 8, 2023
- International Business Machines Corporation
- GANGADHARA RAJA MUTHINTI
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SECURE FINGERPRINTING OF A TRUSTED PHOTOMASK
- Publication number 20230116390
- Publication date Apr 13, 2023
- International Business Machines Corporation
- Scott David HALLE
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
DETERMINATION OF OPTICAL ROUGHNESS IN EUV STRUCTURES
- Publication number 20220357648
- Publication date Nov 10, 2022
- International Business Machines Corporation
- RAVI K. BONAM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE WITH LINERLESS CONTACTS
- Publication number 20210151351
- Publication date May 20, 2021
- International Business Machines Corporation
- Alex Joseph Varghese
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Adjustable Via Dimension and Chamfer Angle
- Publication number 20210035904
- Publication date Feb 4, 2021
- International Business Machines Corporation
- Lawrence A. Clevenger
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DETERMINATION OF OPTICAL ROUGHNESS IN EUV STRUCTURES
- Publication number 20200301268
- Publication date Sep 24, 2020
- International Business Machines Corporation
- RAVI K. BONAM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE WITH LINERLESS CONTACTS
- Publication number 20200303246
- Publication date Sep 24, 2020
- International Business Machines Corporation
- Alex Joseph Varghese
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dielectric Damage-Free Dual Damascene Cu Interconnects Without Barr...
- Publication number 20200243379
- Publication date Jul 30, 2020
- International Business Machines Corporation
- Koichi Motoyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PRE-PATTERNED ETCH STOP FOR INTERCONNECT TRENCH FORMATION OVERLYING...
- Publication number 20200219932
- Publication date Jul 9, 2020
- International Business Machines Corporation
- GANGADHARA RAJA MUTHINTI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HYBRID BEOL METALLIZATION UTILIZING SELECTIVE REFLECTION MASK
- Publication number 20200176388
- Publication date Jun 4, 2020
- International Business Machines Corporation
- Benjamin D. BRIGGS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HYBRIDIZATION FOR CHARACTERIZATION AND METROLOGY
- Publication number 20200168489
- Publication date May 28, 2020
- International Business Machines Corporation
- GANGADHARA RAJA MUTHINTI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Gate Contact Over Active Enabled by Alternative Spacer Scheme and C...
- Publication number 20200135886
- Publication date Apr 30, 2020
- International Business Machines Corporation
- Andrew Greene
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GATE CUT CRITICAL DIMENSION SHRINK AND ACTIVE GATE DEFECT HEALING U...
- Publication number 20200135575
- Publication date Apr 30, 2020
- International Business Machines Corporation
- Andrew Greene
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dielectric Damage-Free Dual Damascene Cu Interconnects Without Barr...
- Publication number 20200126854
- Publication date Apr 23, 2020
- International Business Machines Corporation
- Koichi Motoyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SINGLE METALLIZATION SCHEME FOR GATE, SOURCE, AND DRAIN CONTACT INT...
- Publication number 20200083117
- Publication date Mar 12, 2020
- International Business Machines Corporation
- Andrew Greene
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SINGLE METALLIZATION SCHEME FOR GATE, SOURCE, AND DRAIN CONTACT INT...
- Publication number 20200066602
- Publication date Feb 27, 2020
- International Business Machines Corporation
- Andrew GREENE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HYBRID BEOL METALLIZATION UTILIZING SELECTIVE REFLECTION MASK
- Publication number 20200027840
- Publication date Jan 23, 2020
- International Business Machines Corporation
- Benjamin D. BRIGGS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-CHANNEL OVERLAY METROLOGY
- Publication number 20190316900
- Publication date Oct 17, 2019
- International Business Machines Corporation
- Gangadhara Raja Muthinti
- G01 - MEASURING TESTING
Information Patent Application
METHOD FOR CHARACTERIZATION OF A LAYERED STRUCTURE
- Publication number 20170199139
- Publication date Jul 13, 2017
- International Business Machines Corporation
- Lisa F. Edge
- G01 - MEASURING TESTING
Information Patent Application
INTERFACE PASSIVATION LAYERS AND METHODS OF FABRICATING
- Publication number 20160343806
- Publication date Nov 24, 2016
- GLOBALFOUNDRIES INC.
- Shariq SIDDIQUI
- H01 - BASIC ELECTRIC ELEMENTS

Gangadhara Raja MUTHINTI

Person

Patents Grantslast 30 patents

Secure fingerprinting of a trusted photomask

Semiconductor device with linerless contacts

Determination of optical roughness in EUV structures

Determination of optical roughness in EUV structures

Single metallization scheme for gate, source, and drain contact int...

Hybridization for characterization and metrology

Adjustable via dimension and chamfer angle

Dielectric damage-free dual damascene Cu interconnects without barr...

Multi-channel overlay metrology

Single metallization scheme for gate, source, and drain contact int...

Hybrid BEOL metallization utilizing selective reflection mask

Gate contact over active enabled by alternative spacer scheme and c...

Gate cut critical dimension shrink and active gate defect healing u...

Semiconductor device with linerless contacts

Pre-patterned etch stop for interconnect trench formation overlying...

Dielectric damage-free dual damascene Cu interconnects without barr...

Hybrid BEOL metallization utilizing selective reflection mask

Method for characterization of a layered structure

Patents Applicationslast 30 patents

THREE-DIMENSIONAL ROUGHNESS EXTRACTION OF METAL

SECURE FINGERPRINTING OF A TRUSTED PHOTOMASK

DETERMINATION OF OPTICAL ROUGHNESS IN EUV STRUCTURES

SEMICONDUCTOR DEVICE WITH LINERLESS CONTACTS

Adjustable Via Dimension and Chamfer Angle

DETERMINATION OF OPTICAL ROUGHNESS IN EUV STRUCTURES

SEMICONDUCTOR DEVICE WITH LINERLESS CONTACTS

Dielectric Damage-Free Dual Damascene Cu Interconnects Without Barr...

PRE-PATTERNED ETCH STOP FOR INTERCONNECT TRENCH FORMATION OVERLYING...

HYBRID BEOL METALLIZATION UTILIZING SELECTIVE REFLECTION MASK

HYBRIDIZATION FOR CHARACTERIZATION AND METROLOGY

Gate Contact Over Active Enabled by Alternative Spacer Scheme and C...

GATE CUT CRITICAL DIMENSION SHRINK AND ACTIVE GATE DEFECT HEALING U...

Dielectric Damage-Free Dual Damascene Cu Interconnects Without Barr...

SINGLE METALLIZATION SCHEME FOR GATE, SOURCE, AND DRAIN CONTACT INT...

SINGLE METALLIZATION SCHEME FOR GATE, SOURCE, AND DRAIN CONTACT INT...

HYBRID BEOL METALLIZATION UTILIZING SELECTIVE REFLECTION MASK

MULTI-CHANNEL OVERLAY METROLOGY

METHOD FOR CHARACTERIZATION OF A LAYERED STRUCTURE

INTERFACE PASSIVATION LAYERS AND METHODS OF FABRICATING