Geert Vandenberghe

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Wijgmaal, BE

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Patents Grantslast 30 patents

Information Patent Grant
Marker structure, mask pattern, alignment method and lithographic m...
- Patent number 7,466,413
- Issue date Dec 16, 2008
- ASML Netherlands B.V.
- Jozef Maria Finders
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
MARKER STRUCTURE, MASK PATTERN, ALIGNMENT METHOD, AND LITHOGRAPHIC...
- Publication number 20090073406
- Publication date Mar 19, 2009
- ASML NETHERLANDS B.V.
- Jozef Maria Finders
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Marker structure, mask pattern, alignment method and lithographic m...
- Publication number 20050031969
- Publication date Feb 10, 2005
- ASML NETHERLANDS B.V.
- Jozef Maria Finders
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY