Gen Tamamushi

Person

Kurokawa-gun, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing apparatus and processing method
- Patent number 12,125,679
- Issue date Oct 22, 2024
- Tokyo Electron Limited
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and system
- Patent number 12,087,591
- Issue date Sep 10, 2024
- Tokyo Electron Limited
- Gen Tamamushi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,057,294
- Issue date Aug 6, 2024
- Tokyo Electron Limited
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Holding method of edge ring, plasma processing apparatus, and subst...
- Patent number 11,984,303
- Issue date May 14, 2024
- Tokyo Electron Limited
- Gen Tamamushi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Upper electrode and plasma processing apparatus
- Patent number 11,443,924
- Issue date Sep 13, 2022
- Tokyo Electron Limited
- Gen Tamamushi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method and plasma processing apparatus
- Patent number 11,315,793
- Issue date Apr 26, 2022
- Tokyo Electron Limited
- Gen Tamamushi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for controlling electrostatic chuck and plasma processing ap...
- Patent number 11,227,773
- Issue date Jan 18, 2022
- Tokyo Electron Limited
- Gen Tamamushi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Power feed member and substrate processing apparatus
- Patent number 10,943,766
- Issue date Mar 9, 2021
- Tokyo Electron Limited
- Shunichi Ito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 10,886,135
- Issue date Jan 5, 2021
- Tokyo Electron Limited
- Shinji Kubota
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20240355584
- Publication date Oct 24, 2024
- TOKYO ELECTRON LIMITED
- Chishio KOSHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS, POWER SUPPLY SYSTEM, CONTROL METHOD, P...
- Publication number 20240222078
- Publication date Jul 4, 2024
- TOKYO ELECTRON LIMITED
- Gen TAMAMUSHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING SYSTEM AND PLASMA PROCESSING METHOD
- Publication number 20240170258
- Publication date May 23, 2024
- TOKYO ELECTRON LIMITED
- Gen TAMAMUSHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20240153742
- Publication date May 9, 2024
- TOKYO ELECTRON LIMITED
- Gen TAMAMUSHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD FOR CONTROLLING SOURCE FREQU...
- Publication number 20230369019
- Publication date Nov 16, 2023
- TOKYO ELECTRON LIMITED
- Gen TAMAMUSHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PROCESSING METHOD
- Publication number 20230094655
- Publication date Mar 30, 2023
- TOKYO ELECTRON LIMITED
- Chishio KOSHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20220406568
- Publication date Dec 22, 2022
- TOKYO ELECTRON LIMITED
- Gen TAMAMUSHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND SYSTEM
- Publication number 20220223427
- Publication date Jul 14, 2022
- TOKYO ELECTRON LIMITED
- Gen TAMAMUSHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Controlling Electrostatic Attractor and Plasma Processin...
- Publication number 20220093407
- Publication date Mar 24, 2022
- TOKYO ELECTRON LIMITED
- Gen TAMAMUSHI
- B08 - CLEANING
Information Patent Application
HOLDING METHOD OF EDGE RING, PLASMA PROCESSING APPARATUS, AND SUBST...
- Publication number 20210287883
- Publication date Sep 16, 2021
- TOKYO ELECTRON LIMITED
- Gen TAMAMUSHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20210183622
- Publication date Jun 17, 2021
- TOKYO ELECTRON LIMITED
- Chishio KOSHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20200312623
- Publication date Oct 1, 2020
- TOKYO ELECTRON LIMITED
- Kazuki MOYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
UPPER ELECTRODE AND PLASMA PROCESSING APPARATUS
- Publication number 20200234930
- Publication date Jul 23, 2020
- TOKYO ELECTRON LIMITED
- Gen TAMAMUSHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Controlling Electrostatic Attractor and Plasma Processin...
- Publication number 20200234931
- Publication date Jul 23, 2020
- TOKYO ELECTRON LIMITED
- Gen TAMAMUSHI
- B08 - CLEANING
Information Patent Application
ETCHING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20200144031
- Publication date May 7, 2020
- TOKYO ELECTRON LIMITED
- Gen TAMAMUSHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20190164726
- Publication date May 30, 2019
- TOKYO ELECTRON LIMITED
- Gen TAMAMUSHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20190148155
- Publication date May 16, 2019
- TOKYO ELECTRON LIMITED
- Shinji KUBOTA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POWER FEED MEMBER AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20180374679
- Publication date Dec 27, 2018
- TOKYO ELECTRON LIMITED
- Shunichi Ito
- H01 - BASIC ELECTRIC ELEMENTS

Gen Tamamushi

Person

Patents Grantslast 30 patents

Plasma processing apparatus and processing method

Plasma processing apparatus and system

Plasma processing apparatus and plasma processing method

Holding method of edge ring, plasma processing apparatus, and subst...

Upper electrode and plasma processing apparatus

Etching method and plasma processing apparatus

Method for controlling electrostatic chuck and plasma processing ap...

Power feed member and substrate processing apparatus

Substrate processing method and substrate processing apparatus

Patents Applicationslast 30 patents

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS, POWER SUPPLY SYSTEM, CONTROL METHOD, P...

PLASMA PROCESSING SYSTEM AND PLASMA PROCESSING METHOD

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND METHOD FOR CONTROLLING SOURCE FREQU...

PLASMA PROCESSING APPARATUS AND PROCESSING METHOD

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND SYSTEM

Method for Controlling Electrostatic Attractor and Plasma Processin...

HOLDING METHOD OF EDGE RING, PLASMA PROCESSING APPARATUS, AND SUBST...

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

UPPER ELECTRODE AND PLASMA PROCESSING APPARATUS

Method for Controlling Electrostatic Attractor and Plasma Processin...

ETCHING METHOD AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

POWER FEED MEMBER AND SUBSTRATE PROCESSING APPARATUS