Genya Matsuoka

Person

Oume, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Electron beam lithography apparatus having electron optics correcti...
- Patent number 5,396,077
- Issue date Mar 7, 1995
- Hitachi, Ltd.
- Yasunari Sohda
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Electron beam lithography method
- Patent number 5,285,075
- Issue date Feb 8, 1994
- Hitachi, Ltd.
- Yoshinori Minamide
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lithographic apparatus and method
- Patent number 5,209,813
- Issue date May 11, 1993
- Hitachi, Ltd.
- Yoshitada Oshida
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Electron beam lithography system
- Patent number 5,166,529
- Issue date Nov 24, 1992
- Hitachi, Ltd.
- Hiroyoshi Ando
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method and apparatus of fabricating electric circuit pattern on thi...
- Patent number 5,162,240
- Issue date Nov 10, 1992
- Hitachi, Ltd.
- Norio Saitou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mark position detection system for use in charged particle beam app...
- Patent number 4,808,829
- Issue date Feb 28, 1989
- Hitachi Ltd.
- Masahide Okumura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam exposure apparatus
- Patent number 4,701,620
- Issue date Oct 20, 1987
- Hitachi, Ltd.
- Masahide Okumura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for measuring the diameter of an electron beam
- Patent number 4,336,597
- Issue date Jun 22, 1982
- Nippon Telegraph and Telephone Public Corp.
- Tsuneo Okubo
- H01 - BASIC ELECTRIC ELEMENTS

Genya Matsuoka

Person

Patents Grantslast 30 patents

Electron beam lithography apparatus having electron optics correcti...

Electron beam lithography method

Lithographic apparatus and method

Electron beam lithography system

Method and apparatus of fabricating electric circuit pattern on thi...

Mark position detection system for use in charged particle beam app...

Electron beam exposure apparatus

Method and system for measuring the diameter of an electron beam