George A. Kaplita

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Wappingers Falls, NY, US

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Patents Grantslast 30 patents

Information Patent Grant
Dual mask process for semiconductor devices
- Patent number 6,429,067
- Issue date Aug 6, 2002
- International Business Machines Corporation
- Joyce C. Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Universal cleaning wafer for a plasma chamber
- Patent number 6,328,041
- Issue date Dec 11, 2001
- International Business Machines Corporation
- Jeffrey J. Brown
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Mask using lithographic image size reduction
- Patent number 4,871,630
- Issue date Oct 3, 1989
- International Business Machines Corporation
- Nicholas J. Giammarco
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
RIE process for etching silicon isolation trenches and polycides wi...
- Patent number 4,726,879
- Issue date Feb 23, 1988
- International Business Machines Corporation
- James A. Bondur
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lithographic image size reduction
- Patent number 4,707,218
- Issue date Nov 17, 1987
- International Business Machines Corporation
- Nicholas J. Giammarco
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reactive ion etching apparatus
- Patent number 4,595,484
- Issue date Jun 17, 1986
- International Business Machines Corporation
- Nicholas J. Giammarco
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Process and system for etching doped silicon
- Publication number 20070056927
- Publication date Mar 15, 2007
- Len Y. Tsou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DUAL MASK PROCESS FOR SEMICONDUCTOR DEVICES
- Publication number 20020094637
- Publication date Jul 18, 2002
- International Business Machines Corporation
- Joyce C. Liu
- H01 - BASIC ELECTRIC ELEMENTS