George C. Jacob

Person

Newark, DE, US

People

Patents Grantslast 30 patents

Information Patent Grant
Low-debris fluopolymer composite CMP polishing pad
- Patent number 11,638,978
- Issue date May 2, 2023
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Nan-Rong Chiou
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Methods of making chemical mechanical polishing layers having impro...
- Patent number 11,524,390
- Issue date Dec 13, 2022
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Bainian Qian
- B24 - GRINDING POLISHING
Information Patent Grant
Fluopolymer composite CMP polishing method
- Patent number 11,491,605
- Issue date Nov 8, 2022
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Matthew R. Gadinski
- B24 - GRINDING POLISHING
Information Patent Grant
Thin film fluoropolymer composite CMP polishing method
- Patent number 11,285,577
- Issue date Mar 29, 2022
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Mohammad T. Islam
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
High removal rate chemical mechanical polishing pads and methods of...
- Patent number 10,722,999
- Issue date Jul 28, 2020
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Thomas P. Willumstad
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Chemical mechanical polishing pad and polishing method
- Patent number 10,569,384
- Issue date Feb 25, 2020
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Matthew R. Gadinski
- B24 - GRINDING POLISHING
Information Patent Grant
High removal rate chemical mechanical polishing pads from amine ini...
- Patent number 10,464,187
- Issue date Nov 5, 2019
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Bainian Qian
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical mechanical polishing pad and polishing method
- Patent number 10,464,188
- Issue date Nov 5, 2019
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Matthew R. Gadinski
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical mechanical polishing pads for improved removal rate and pl...
- Patent number 10,391,606
- Issue date Aug 27, 2019
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Jonathan G. Weis
- B24 - GRINDING POLISHING
Information Patent Grant
Aliphatic polyurethane optical endpoint detection windows and CMP p...
- Patent number 10,293,456
- Issue date May 21, 2019
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Nan-Rong Chiou
- B24 - GRINDING POLISHING
Information Patent Grant
Tapering method for poromeric polishing pad
- Patent number 10,259,099
- Issue date Apr 16, 2019
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Koichi Yoshida
- B24 - GRINDING POLISHING
Information Patent Grant
Aliphatic polyurethane optical endpoint detection windows and CMP p...
- Patent number 10,207,388
- Issue date Feb 19, 2019
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Nan-Rong Chiou
- B24 - GRINDING POLISHING
Information Patent Grant
Method of making polishing layer for chemical mechanical polishing pad
- Patent number 10,144,115
- Issue date Dec 4, 2018
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- David Michael Veneziale
- B24 - GRINDING POLISHING
Information Patent Grant
Method of making polishing layer for chemical mechanical polishing pad
- Patent number 10,105,825
- Issue date Oct 23, 2018
- Rohm and Haas Electronics Materials CMP Holdings, Inc.
- David Michael Veneziale
- B24 - GRINDING POLISHING
Information Patent Grant
Thermoplastic poromeric polishing pad
- Patent number 10,106,662
- Issue date Oct 23, 2018
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Shuiyuan Luo
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method of making composite polishing layer for chemical mechanical...
- Patent number 10,092,998
- Issue date Oct 9, 2018
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Bainian Qian
- B24 - GRINDING POLISHING
Information Patent Grant
High planarization efficiency chemical mechanical polishing pads an...
- Patent number 10,086,494
- Issue date Oct 2, 2018
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Jonathan G. Weis
- B24 - GRINDING POLISHING
Information Patent Grant
Method of making composite polishing layer for chemical mechanical...
- Patent number 10,011,002
- Issue date Jul 3, 2018
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Bainian Qian
- B24 - GRINDING POLISHING
Information Patent Grant
Controlled-porosity method for forming polishing pad
- Patent number 10,005,172
- Issue date Jun 26, 2018
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Yuhua Tong
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Tapered poromeric polishing pad
- Patent number 9,925,637
- Issue date Mar 27, 2018
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Koichi Yoshida
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical mechanical polishing pad and method of making same
- Patent number 9,776,300
- Issue date Oct 3, 2017
- Rohm and Haas Electronic Materials CMP Holdings Inc.
- Bainian Qian
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical mechanical polishing pad composite polishing layer formula...
- Patent number 9,630,293
- Issue date Apr 25, 2017
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Bainian Qian
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Chemical mechanical polishing pad and method of making same
- Patent number 9,586,305
- Issue date Mar 7, 2017
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Bainian Qian
- B24 - GRINDING POLISHING
Information Patent Grant
Controlled-expansion CMP PAD casting method
- Patent number 9,586,304
- Issue date Mar 7, 2017
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Bainian Qian
- B24 - GRINDING POLISHING
Information Patent Grant
High-stability polyurethane polishing pad
- Patent number 9,481,070
- Issue date Nov 1, 2016
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Bainian Qian
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical mechanical polishing method
- Patent number 9,484,212
- Issue date Nov 1, 2016
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Bainian Qian
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad window
- Patent number 9,475,168
- Issue date Oct 25, 2016
- Bainian Qian
- B24 - GRINDING POLISHING
Information Patent Grant
Controlled-viscosity CMP casting method
- Patent number 9,452,507
- Issue date Sep 27, 2016
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Bainian Qian
- B24 - GRINDING POLISHING
Information Patent Grant
Amphiphilic block copolymers and inorganic nanofillers to enhance p...
- Patent number 9,388,311
- Issue date Jul 12, 2016
- Dow Global Technologies LLC
- Kandathil Eapen Verghese
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
High Tg epoxy systems for composite applications
- Patent number 9,315,664
- Issue date Apr 19, 2016
- Dow Global Technologies LLC
- Jeffery L. Reynolds
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
CHEMICAL MECHANICAL POLISHING PADS FOR IMPROVED REMOVAL RATE AND PL...
- Publication number 20230294240
- Publication date Sep 21, 2023
- Jonathan G. Weis
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THIN FILM FLUOROPOLYMER COMPOSITE CMP POLISHING PAD
- Publication number 20200384601
- Publication date Dec 10, 2020
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Mohammad T. Islam
- B24 - GRINDING POLISHING
Information Patent Application
LOW-DEBRIS FLUOPOLYMER COMPOSITE CMP POLISHING PAD
- Publication number 20200384603
- Publication date Dec 10, 2020
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Nan-Rong Chiou
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
THIN FILM FLUOPOLYMER COMPOSITE CMP POLISHING METHOD
- Publication number 20200384600
- Publication date Dec 10, 2020
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Mohammad T. Islam
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
FLUOPOLYMER COMPOSITE CMP POLISHING METHOD
- Publication number 20200384602
- Publication date Dec 10, 2020
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Matthew R. Gadinski
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
HIGH REMOVAL RATE CHEMICAL MECHANICAL POLISHING PADS FROM AMINE INI...
- Publication number 20190168356
- Publication date Jun 6, 2019
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Bainian Qian
- B24 - GRINDING POLISHING
Information Patent Application
CHEMICAL MECHANICAL POLISHING PADS FOR IMPROVED REMOVAL RATE AND PL...
- Publication number 20180345448
- Publication date Dec 6, 2018
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Jonathan G. Weis
- B24 - GRINDING POLISHING
Information Patent Application
CHEMICAL MECHANICAL POLISHING PADS FOR IMPROVED REMOVAL RATE AND PL...
- Publication number 20180345449
- Publication date Dec 6, 2018
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Jonathan G. Weis
- B24 - GRINDING POLISHING
Information Patent Application
METHODS OF MAKING CHEMICAL MECHANICAL POLISHING LAYERS HAVING IMPRO...
- Publication number 20180311792
- Publication date Nov 1, 2018
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Bainian Qian
- B24 - GRINDING POLISHING
Information Patent Application
ALIPHATIC POLYURETHANE OPTICAL ENDPOINT DETECTION WINDOWS AND CMP P...
- Publication number 20180304438
- Publication date Oct 25, 2018
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Nan-Rong Chiou
- B24 - GRINDING POLISHING
Information Patent Application
ALIPHATIC POLYURETHANE OPTICAL ENDPOINT DETECTION WINDOWS AND CMP P...
- Publication number 20180304439
- Publication date Oct 25, 2018
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Nan-Rong Chiou
- B24 - GRINDING POLISHING
Information Patent Application
HIGH PLANARIZATION EFFICIENCY CHEMICAL MECHANICAL POLISHING PADS AN...
- Publication number 20180071888
- Publication date Mar 15, 2018
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Jonathan G. Weis
- B24 - GRINDING POLISHING
Information Patent Application
TAPERING METHOD FOR POROMERIC POLISHING PAD
- Publication number 20180036860
- Publication date Feb 8, 2018
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Koichi Yoshida
- B24 - GRINDING POLISHING
Information Patent Application
TAPERED POROMERIC POLISHING PAD
- Publication number 20180036862
- Publication date Feb 8, 2018
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Koichi Yoshida
- B24 - GRINDING POLISHING
Information Patent Application
THERMOPLASTIC POROMERIC POLISHING PAD
- Publication number 20180037706
- Publication date Feb 8, 2018
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Shuiyuan Luo
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
HIGH REMOVAL RATE CHEMICAL MECHANICAL POLISHING PADS AND METHODS OF...
- Publication number 20170361421
- Publication date Dec 21, 2017
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Thomas P. Willumstad
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CHEMICAL MECHANICAL POLISHING PAD AND METHOD OF MAKING SAME
- Publication number 20160379840
- Publication date Dec 29, 2016
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Bainian Qian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHEMICAL MECHANICAL POLISHING PAD AND METHOD OF MAKING SAME
- Publication number 20160375543
- Publication date Dec 29, 2016
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Bainian Qian
- G02 - OPTICS
Information Patent Application
CONTROLLED-POROSITY METHOD FOR FORMING POLISHING PAD
- Publication number 20160375550
- Publication date Dec 29, 2016
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Yuhua Tong
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
METHOD OF MAKING POLISHING LAYER FOR CHEMICAL MECHANICAL POLISHING PAD
- Publication number 20160375553
- Publication date Dec 29, 2016
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- David Michael Veneziale
- B24 - GRINDING POLISHING
Information Patent Application
METHOD OF MAKING COMPOSITE POLISHING LAYER FOR CHEMICAL MECHANICAL...
- Publication number 20160375552
- Publication date Dec 29, 2016
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Bainian Qian
- B24 - GRINDING POLISHING
Information Patent Application
CHEMICAL MECHANICAL POLISHING PAD COMPOSITE POLISHING LAYER FORMULA...
- Publication number 20160375545
- Publication date Dec 29, 2016
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Bainian Qian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MAKING COMPOSITE POLISHING LAYER FOR CHEMICAL MECHANICAL...
- Publication number 20160375554
- Publication date Dec 29, 2016
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Bainian Qian
- B24 - GRINDING POLISHING
Information Patent Application
METHOD OF MAKING POLISHING LAYER FOR CHEMICAL MECHANICAL POLISHING PAD
- Publication number 20160375555
- Publication date Dec 29, 2016
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- David Michael Veneziale
- B24 - GRINDING POLISHING
Information Patent Application
AMPHIPHILIC BLOCK COPOLYMERS AND INORGANIC NANOFILLERS TO ENHANCE P...
- Publication number 20160289444
- Publication date Oct 6, 2016
- DOW GLOBAL TECHNOLOGIES LLC
- Kandathil Eapen Verghese
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POLISHING PAD WINDOW
- Publication number 20160279757
- Publication date Sep 29, 2016
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Bainian Qian
- B24 - GRINDING POLISHING
Information Patent Application
HIGH-STABILITY POLYURETHANE POLISHING PAD
- Publication number 20160176012
- Publication date Jun 23, 2016
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Bainian Qian
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
CONTROLLED-VISCOSITY CMP CASTING METHOD
- Publication number 20160176022
- Publication date Jun 23, 2016
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Bainian Qian
- B24 - GRINDING POLISHING
Information Patent Application
BIMODAL TOUGHENING AGENTS FOR THERMOSETTABLE EPOXY RESIN COMPOSITIONS
- Publication number 20140316068
- Publication date Oct 23, 2014
- DOW GLOBAL TECHNOLOGIES LLC
- George C. Jacob
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
HIGH TG EPOXY SYSTEMS FOR COMPOSITE APPLICATIONS
- Publication number 20140235792
- Publication date Aug 21, 2014
- Jeffery L. Reynolds
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

George C. Jacob

Person

Patents Grantslast 30 patents

Low-debris fluopolymer composite CMP polishing pad

Methods of making chemical mechanical polishing layers having impro...

Fluopolymer composite CMP polishing method

Thin film fluoropolymer composite CMP polishing method

High removal rate chemical mechanical polishing pads and methods of...

Chemical mechanical polishing pad and polishing method

High removal rate chemical mechanical polishing pads from amine ini...

Chemical mechanical polishing pad and polishing method

Chemical mechanical polishing pads for improved removal rate and pl...

Aliphatic polyurethane optical endpoint detection windows and CMP p...

Tapering method for poromeric polishing pad

Aliphatic polyurethane optical endpoint detection windows and CMP p...

Method of making polishing layer for chemical mechanical polishing pad

Method of making polishing layer for chemical mechanical polishing pad

Thermoplastic poromeric polishing pad

Method of making composite polishing layer for chemical mechanical...

High planarization efficiency chemical mechanical polishing pads an...

Method of making composite polishing layer for chemical mechanical...

Controlled-porosity method for forming polishing pad

Tapered poromeric polishing pad

Chemical mechanical polishing pad and method of making same

Chemical mechanical polishing pad composite polishing layer formula...

Chemical mechanical polishing pad and method of making same

Controlled-expansion CMP PAD casting method

High-stability polyurethane polishing pad

Chemical mechanical polishing method

Polishing pad window

Controlled-viscosity CMP casting method

Amphiphilic block copolymers and inorganic nanofillers to enhance p...

High Tg epoxy systems for composite applications

Patents Applicationslast 30 patents

CHEMICAL MECHANICAL POLISHING PADS FOR IMPROVED REMOVAL RATE AND PL...

THIN FILM FLUOROPOLYMER COMPOSITE CMP POLISHING PAD

LOW-DEBRIS FLUOPOLYMER COMPOSITE CMP POLISHING PAD

THIN FILM FLUOPOLYMER COMPOSITE CMP POLISHING METHOD

FLUOPOLYMER COMPOSITE CMP POLISHING METHOD

HIGH REMOVAL RATE CHEMICAL MECHANICAL POLISHING PADS FROM AMINE INI...

CHEMICAL MECHANICAL POLISHING PADS FOR IMPROVED REMOVAL RATE AND PL...

CHEMICAL MECHANICAL POLISHING PADS FOR IMPROVED REMOVAL RATE AND PL...

METHODS OF MAKING CHEMICAL MECHANICAL POLISHING LAYERS HAVING IMPRO...

ALIPHATIC POLYURETHANE OPTICAL ENDPOINT DETECTION WINDOWS AND CMP P...

ALIPHATIC POLYURETHANE OPTICAL ENDPOINT DETECTION WINDOWS AND CMP P...

HIGH PLANARIZATION EFFICIENCY CHEMICAL MECHANICAL POLISHING PADS AN...

TAPERING METHOD FOR POROMERIC POLISHING PAD

TAPERED POROMERIC POLISHING PAD

THERMOPLASTIC POROMERIC POLISHING PAD

HIGH REMOVAL RATE CHEMICAL MECHANICAL POLISHING PADS AND METHODS OF...

CHEMICAL MECHANICAL POLISHING PAD AND METHOD OF MAKING SAME

CHEMICAL MECHANICAL POLISHING PAD AND METHOD OF MAKING SAME

CONTROLLED-POROSITY METHOD FOR FORMING POLISHING PAD

METHOD OF MAKING POLISHING LAYER FOR CHEMICAL MECHANICAL POLISHING PAD

METHOD OF MAKING COMPOSITE POLISHING LAYER FOR CHEMICAL MECHANICAL...

CHEMICAL MECHANICAL POLISHING PAD COMPOSITE POLISHING LAYER FORMULA...

METHOD OF MAKING COMPOSITE POLISHING LAYER FOR CHEMICAL MECHANICAL...

METHOD OF MAKING POLISHING LAYER FOR CHEMICAL MECHANICAL POLISHING PAD

AMPHIPHILIC BLOCK COPOLYMERS AND INORGANIC NANOFILLERS TO ENHANCE P...

POLISHING PAD WINDOW

HIGH-STABILITY POLYURETHANE POLISHING PAD

CONTROLLED-VISCOSITY CMP CASTING METHOD

BIMODAL TOUGHENING AGENTS FOR THERMOSETTABLE EPOXY RESIN COMPOSITIONS

HIGH TG EPOXY SYSTEMS FOR COMPOSITE APPLICATIONS