TREA

George G. Barclay

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  • Ithaca, NY, US
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Patents Grantslast 30 patents

Patents Applicationslast 30 patents

  • Information Patent Application

    COMPOSITIONS COMPRISING HETERO-SUBSTITUTED CARBOCYCLIC ARYL COMPONE...
    • Publication number 20190346763
    • Publication date Nov 14, 2019
    • Rohm and Haas Electronic Materials L.L.C.
    • Deyan Wang
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING SAME
    • Publication number 20160124304
    • Publication date May 5, 2016
    • Rohm and Haas Electronic Materials, L.L.C.
    • Mingqi Li
    • C07 - ORGANIC CHEMISTRY
  • Information Patent Application

    COMPOSITIONS COMPRISING SULFONAMIDE MATERIAL AND PROCESSES FOR PHOT...
    • Publication number 20160070172
    • Publication date Mar 10, 2016
    • Rohm and Haas Electronic Materials, L.L.C.
    • Deyan Wang
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    COMPOSITIONS COMPRISING CARBOXY COMPONENT AND PROCESSES FOR PHOTOLI...
    • Publication number 20150378255
    • Publication date Dec 31, 2015
    • Rohm and Haas Electronic Materials, L.L.C.
    • Deyan Wang
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    ION IMPLANTATION METHODS
    • Publication number 20150214056
    • Publication date Jul 30, 2015
    • Rohm and Haas Electronic Materials L.L.C.
    • Cheng-Bai XU
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    COMPOSITIONS AND PROCESSES FOR IMMERSION LITHOGRAPHY
    • Publication number 20150044609
    • Publication date Feb 12, 2015
    • Rohm and Haas Electronic Materials L.L.C.
    • Deyan WANG
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    PHOTORESIST AND COATED SUBSTRATE COMPRISING SAME
    • Publication number 20140065540
    • Publication date Mar 6, 2014
    • ROHM AND HAAS ELECTRONIC MATERIALS
    • Deyan Wang
    • C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
  • Information Patent Application

    SURFACE ACTIVE ADDITIVE AND PHOTORESIST COMPOSITION COMPRISING SAME
    • Publication number 20130137035
    • Publication date May 30, 2013
    • DOW GLOBAL TECHNOLOGIES LLC
    • Deyan Wang
    • C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
  • Information Patent Application

    COMPOSITIONS AND PROCESSES FOR IMMERSION LITHOGRAPHY
    • Publication number 20130065178
    • Publication date Mar 14, 2013
    • Rohm and Haas Electronic Materials L.L.C.
    • Deyan WANG
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    LEVELER COMPOUNDS
    • Publication number 20130001088
    • Publication date Jan 3, 2013
    • Rohm and Haas Electronic Materials L.L.C.
    • Deyan Wang
    • C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
  • Information Patent Application

    PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING SAME
    • Publication number 20110250538
    • Publication date Oct 13, 2011
    • Rohm and Haas Electronic Materials LLC
    • Mingqi LI
    • C07 - ORGANIC CHEMISTRY
  • Information Patent Application

    PROCESSES FOR PHOTOLITHOGRAPHY
    • Publication number 20110003257
    • Publication date Jan 6, 2011
    • Rohm and Haas Electronic Materials L.L.C.
    • Deyan Wang
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    Compositions and processes for photolithography
    • Publication number 20100304290
    • Publication date Dec 2, 2010
    • Rohm and Haas Electronic Materials L.L.C.
    • Deyan Wang
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    Compositions comprising hetero-substituted carbocyclic aryl compone...
    • Publication number 20100297549
    • Publication date Nov 25, 2010
    • Rohm and Haas Electronic Materials L.L.C.
    • Deyan Wang
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    Compositions comprising sulfonamide material and processes for phot...
    • Publication number 20100297550
    • Publication date Nov 25, 2010
    • Rohm and Haas Electronic Materials L.L.C.
    • Deyan Wang
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    Compositions comprising carboxy component and processes for photoli...
    • Publication number 20100173245
    • Publication date Jul 8, 2010
    • Rohm and Haas Electronic Materials L.L.C.
    • Deyan Wang
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    Leveler compounds
    • Publication number 20090139873
    • Publication date Jun 4, 2009
    • Rohm and Haas Electronic Materials L.L.C.
    • Deyan Wang
    • C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
  • Information Patent Application

    Compositons and processes for immersion lithography
    • Publication number 20090117489
    • Publication date May 7, 2009
    • Rohm and Haas Electronics Materials LLC
    • Deyan Wang
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    Photoresists and methods for use thereof
    • Publication number 20080220597
    • Publication date Sep 11, 2008
    • Rohm and Haas Electronic Materials L.L.C.
    • James F. Cameron
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    Compositions and processes for immersion lithography
    • Publication number 20080193872
    • Publication date Aug 14, 2008
    • Rohm and Haas Electronic Materials L.L.C.
    • Stefan J. Caporale
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    Novel resins and photoresist compositions comprising same
    • Publication number 20080032232
    • Publication date Feb 7, 2008
    • Shipley Company, L.L.C.
    • Young C. Bae
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    Leveler compounds
    • Publication number 20070084732
    • Publication date Apr 19, 2007
    • Rohm and Haas Electronic Materials L.L.C.
    • Deyan Wang
    • C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
  • Information Patent Application

    Leveler compounds
    • Publication number 20060016693
    • Publication date Jan 26, 2006
    • Rohm and Haas Electronic Materials L.L.C.
    • Deyan Wang
    • C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
  • Information Patent Application

    Polymers and photoresists comprising same
    • Publication number 20050196699
    • Publication date Sep 8, 2005
    • Rohm and Haas Electronic Materials L.L.C.
    • Subbareddy Kanagasabapathy
    • C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
  • Information Patent Application

    Polymer and photoresist compositions
    • Publication number 20050170278
    • Publication date Aug 4, 2005
    • Charles R. Szmanda
    • C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
  • Information Patent Application

    Polymers and photoresist compositions comprising same
    • Publication number 20050142486
    • Publication date Jun 30, 2005
    • Rohm and Haas Electronic Materials LLC
    • Dong Won Chung
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    Photoresists and methods for use thereof
    • Publication number 20050032373
    • Publication date Feb 10, 2005
    • James F. Cameron
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    Photoimageable composition
    • Publication number 20050026077
    • Publication date Feb 3, 2005
    • Shipley Company, L.L.C.
    • Dana A. Gronbeck
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    Multilayer photoresist system
    • Publication number 20040265754
    • Publication date Dec 30, 2004
    • Shipley Company, L.L.C.
    • George G. Barclay
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    Novel polymers, processes for polymer synthesis and photoresist com...
    • Publication number 20040259025
    • Publication date Dec 23, 2004
    • Shipley Company, L.L.C.
    • George G. Barclay
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY