George J. Hefferon

Person

Fishkill, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Top antireflective coating film
- Patent number 6,057,080
- Issue date May 2, 2000
- International Business Machines Corporation
- William R. Brunsvold
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Antireflective coating films
- Patent number 5,744,537
- Issue date Apr 28, 1998
- International Business Machines Corporation
- William R. Brunsvold
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Acid Scavengers for use in chemically amplified photoresists
- Patent number 5,733,705
- Issue date Mar 31, 1998
- International Business Machines Corporation
- Nageshwer Rao Bantu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Acid scavengers for use in chemically amplified photoresists
- Patent number 5,667,938
- Issue date Sep 16, 1997
- International Business Machines Corporation
- Nageshwer Rao Bantu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Acid scavengers for use in chemically amplified photoresists
- Patent number 5,609,989
- Issue date Mar 11, 1997
- International Business Machines, Corporation
- Nageshwer R. Bantu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Thermally stable photoresists with high sensitivity
- Patent number 4,939,070
- Issue date Jul 3, 1990
- William R. Brunsvold
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of creating patterned multilayer films for use in production...
- Patent number 4,908,298
- Issue date Mar 13, 1990
- International Business Machines Corporation
- George J. Hefferon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

George J. Hefferon

Person

Patents Grantslast 30 patents

Top antireflective coating film

Antireflective coating films

Acid Scavengers for use in chemically amplified photoresists

Acid scavengers for use in chemically amplified photoresists

Acid scavengers for use in chemically amplified photoresists

Thermally stable photoresists with high sensitivity

Method of creating patterned multilayer films for use in production...