George Liu

Person

Tao-Yuan, TW

People

Patents Grantslast 30 patents

Information Patent Grant
Contrast enhancing exposure system and method for use in semiconduc...
- Patent number 9,091,923
- Issue date Jul 28, 2015
- Taiwan Semiconductor Manufacturing Company, Ltd.
- George Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Controlling gate formation for high density cell layout
- Patent number 9,070,623
- Issue date Jun 30, 2015
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Harry-Hak-Lay Chuang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor structure and method and tool for forming the semicon...
- Patent number 8,846,302
- Issue date Sep 30, 2014
- Taiwan Semiconductor Manufacturing Company, Ltd.
- George Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for patterning a photosensitive layer
- Patent number 8,815,496
- Issue date Aug 26, 2014
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hsiao-Tzu Lu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of patterning a semiconductor device
- Patent number 8,716,139
- Issue date May 6, 2014
- Taiwan Semiconductor Manufacturing Company, Ltd.
- George Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Intensity selective exposure photomask
- Patent number 8,673,520
- Issue date Mar 18, 2014
- Taiwan Semiconductor Manufacturing Company, Ltd.
- George Liu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for etching an ultra thin film
- Patent number 8,623,231
- Issue date Jan 7, 2014
- Taiwan Semiconductor Manufacturing Company, Ltd.
- George Liu
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Methodology for implementing enhanced optical lithography for hole...
- Patent number 8,472,005
- Issue date Jun 25, 2013
- Taiwan Semiconductor Manufacturing Company, Ltd.
- George Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Intensity selective exposure photomask
- Patent number 8,431,291
- Issue date Apr 30, 2013
- Taiwan Semiconductor Manufacturing Company, Ltd.
- George Liu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for patterning a photosensitive layer
- Patent number 8,394,576
- Issue date Mar 12, 2013
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hsiao-Tzu Lu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method for providing alignment mark for high-k metal gat...
- Patent number 8,237,297
- Issue date Aug 7, 2012
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Kuei Shun Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for patterning a photosensitive layer
- Patent number 8,124,323
- Issue date Feb 28, 2012
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hsiao-Tzu Lu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern formation in semiconductor fabrication
- Patent number 8,119,533
- Issue date Feb 21, 2012
- Taiwan Semiconductor Manufacturing Company, Ltd.
- George Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Intensity selective exposure method and apparatus
- Patent number 8,003,303
- Issue date Aug 23, 2011
- Taiwan Semiconductor Manufacturing Company, Ltd.
- George Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Utilization of electric field with isotropic development in photoli...
- Patent number 7,838,205
- Issue date Nov 23, 2010
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Vincent Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of pattern formation in semiconductor fabrication
- Patent number 7,648,918
- Issue date Jan 19, 2010
- Taiwan Semiconductor Manufacturing Company, Ltd.
- George Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device having in-chip critical dimension and focus pa...
- Patent number 7,642,101
- Issue date Jan 5, 2010
- Taiwan Semiconductor Manufacturing Company, Ltd.
- George Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Immersion lithography process and mask layer structure applied in t...
- Patent number 7,432,042
- Issue date Oct 7, 2008
- United Microelectronics Corp.
- Vencent Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Top patterned hardmask and method for patterning
- Patent number 7,387,969
- Issue date Jun 17, 2008
- Taiwan Semiconductor Manufacturing Co., Ltd.
- George Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Profile improvement method for patterning
- Patent number 7,268,070
- Issue date Sep 11, 2007
- United Microelectronics Corp.
- Hui-Ling Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Sandwich photoresist structure in photolithographic process
- Patent number 6,844,143
- Issue date Jan 18, 2005
- United Microelectronics Corp.
- Benjamin Szu-Min Lin
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD OF DEFINING AN INTENSITY SELECTIVE EXPOSURE PHOTOMASK
- Publication number 20140170537
- Publication date Jun 19, 2014
- Taiwan Semiconductor Manufacturing Company, Ltd.
- George Liu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Methodology For Implementing Enhanced Optical Lithography For Hole...
- Publication number 20130286371
- Publication date Oct 31, 2013
- George Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST STRUCTURES HAVING RESISTANCE TO PEELING
- Publication number 20130230980
- Publication date Sep 5, 2013
- Taiwan Semiconductor Manufacturing Company, Ltd.
- George LIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR STRUCTURE AND METHOD AND TOOL FOR FORMING THE SEMICON...
- Publication number 20130193564
- Publication date Aug 1, 2013
- Taiwan Semiconductor Manufacturing Company, Ltd.
- George Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Patterning a Photosensitive Layer
- Publication number 20130164686
- Publication date Jun 27, 2013
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hsiao-Tzu Lu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR PATTERNING A PHOTOSENSITIVE LAYER
- Publication number 20120114872
- Publication date May 10, 2012
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hsiao-Tzu Lu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INTENSITY SELECTIVE EXPOSURE PHOTOMASK
- Publication number 20120040278
- Publication date Feb 16, 2012
- Taiwan Semiconductor Manufacturing Company, Ltd., ("TSMC")
- George Liu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SYSTEM AND METHOD FOR PROVIDING ALIGNMENT MARK FOR HIGH-K METAL GAT...
- Publication number 20110241119
- Publication date Oct 6, 2011
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Kuei Shun Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INTENSITY SELECTIVE EXPOSURE PHOTOMASK
- Publication number 20110217630
- Publication date Sep 8, 2011
- Taiwan Semiconductor Manufacturing Company, Ltd., ("TSMC")
- George Liu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
CONTROLLING GATE FORMATION FOR HIGH DENSITY CELL LAYOUT
- Publication number 20110042750
- Publication date Feb 24, 2011
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Harry-Hak-Lay Chuang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Intensity Selective Exposure Method And Apparatus
- Publication number 20100261118
- Publication date Oct 14, 2010
- Taiwan Semiconductor Manufacturing Company, Ltd.
- George Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMATION IN SEMICONDUCTOR FABRICATION
- Publication number 20100109054
- Publication date May 6, 2010
- Taiwan Semiconductor Manufacturing Company, Ltd.
- George Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR ETCHING AN ULTRA THIN FILM
- Publication number 20090311628
- Publication date Dec 17, 2009
- Taiwan Semiconductor Manufacturing Company, Ltd.
- George Liu
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
METHOD FOR PATTERNING A PHOTOSENSITIVE LAYER
- Publication number 20090081591
- Publication date Mar 26, 2009
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hsiao-Tzu Lu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF PATTERN FORMATION IN SEMICONDUCTOR FABRICATION
- Publication number 20090053899
- Publication date Feb 26, 2009
- Taiwan Semiconductor Manufacturing Company, Ltd.
- George Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Methodology For Implementing Enhanced Optical Lithography For Hole...
- Publication number 20080204688
- Publication date Aug 28, 2008
- Taiwan Semiconductor Manufacturing Company, Ltd.
- George Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Contrast Enhancing Exposure System and Method For Use In Semiconduc...
- Publication number 20080206679
- Publication date Aug 28, 2008
- Taiwan Semiconductor Manufacturing Company, Ltd.
- George Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of measuring the overlay accuracy of a multi-exposure process
- Publication number 20080153012
- Publication date Jun 26, 2008
- UNITED MICROELECTRONICS CORP.
- George Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Semiconductor Device Having In-Chip Critical Dimension and Focus Pa...
- Publication number 20080128924
- Publication date Jun 5, 2008
- Taiwan Semiconductor Manufacturing Company, Ltd.
- George Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
UTILIZATION OF ELECTRIC FIELD WITH ISOTROPIC DEVELOPMENT IN PHOTOLI...
- Publication number 20080008967
- Publication date Jan 10, 2008
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Vincent CHANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Top patterned hardmask and method for patterning
- Publication number 20060211254
- Publication date Sep 21, 2006
- Taiwan Semiconductor Manufacturing Co., Ltd.
- George Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of measuring the overlay accuracy of a multi-exposure process
- Publication number 20050244729
- Publication date Nov 3, 2005
- UNITED MICROELECTRONICS CORP.
- George Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Immersion lithography process and mask layer structure applied in t...
- Publication number 20050123863
- Publication date Jun 9, 2005
- Vencent Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Profile improvement method for patterning
- Publication number 20040241587
- Publication date Dec 2, 2004
- Hui-Ling Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for shrinking the image of photoresist
- Publication number 20040166448
- Publication date Aug 26, 2004
- United Microelectronics Corp.
- Vencent Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for shrinking pattern photoresist
- Publication number 20040166447
- Publication date Aug 26, 2004
- Vencent Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Structural design of alignment mark
- Publication number 20040075179
- Publication date Apr 22, 2004
- United Microelectronics Corp.
- George Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Sandwich photoresist structure in phtotlithographic process
- Publication number 20040009434
- Publication date Jan 15, 2004
- United Microelectronics Corp.
- Benjamin Szu-Min Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Person

Patents Grantslast 30 patents

Contrast enhancing exposure system and method for use in semiconduc...

Controlling gate formation for high density cell layout

Semiconductor structure and method and tool for forming the semicon...

Method for patterning a photosensitive layer

Method of patterning a semiconductor device

Intensity selective exposure photomask

Method for etching an ultra thin film

Methodology for implementing enhanced optical lithography for hole...

Intensity selective exposure photomask

Method for patterning a photosensitive layer

System and method for providing alignment mark for high-k metal gat...

Method for patterning a photosensitive layer

Pattern formation in semiconductor fabrication

Intensity selective exposure method and apparatus

Utilization of electric field with isotropic development in photoli...

Method of pattern formation in semiconductor fabrication

Semiconductor device having in-chip critical dimension and focus pa...

Immersion lithography process and mask layer structure applied in t...

Top patterned hardmask and method for patterning

Profile improvement method for patterning

Sandwich photoresist structure in photolithographic process

Patents Applicationslast 30 patents

METHOD OF DEFINING AN INTENSITY SELECTIVE EXPOSURE PHOTOMASK

Methodology For Implementing Enhanced Optical Lithography For Hole...

PHOTORESIST STRUCTURES HAVING RESISTANCE TO PEELING

SEMICONDUCTOR STRUCTURE AND METHOD AND TOOL FOR FORMING THE SEMICON...

Method for Patterning a Photosensitive Layer

METHOD FOR PATTERNING A PHOTOSENSITIVE LAYER

INTENSITY SELECTIVE EXPOSURE PHOTOMASK

SYSTEM AND METHOD FOR PROVIDING ALIGNMENT MARK FOR HIGH-K METAL GAT...

INTENSITY SELECTIVE EXPOSURE PHOTOMASK

CONTROLLING GATE FORMATION FOR HIGH DENSITY CELL LAYOUT

Intensity Selective Exposure Method And Apparatus

PATTERN FORMATION IN SEMICONDUCTOR FABRICATION

METHOD FOR ETCHING AN ULTRA THIN FILM

METHOD FOR PATTERNING A PHOTOSENSITIVE LAYER

METHOD OF PATTERN FORMATION IN SEMICONDUCTOR FABRICATION

Methodology For Implementing Enhanced Optical Lithography For Hole...

Contrast Enhancing Exposure System and Method For Use In Semiconduc...

Method of measuring the overlay accuracy of a multi-exposure process

Semiconductor Device Having In-Chip Critical Dimension and Focus Pa...

UTILIZATION OF ELECTRIC FIELD WITH ISOTROPIC DEVELOPMENT IN PHOTOLI...

Top patterned hardmask and method for patterning

Method of measuring the overlay accuracy of a multi-exposure process

Immersion lithography process and mask layer structure applied in t...

Profile improvement method for patterning

Method for shrinking the image of photoresist

Method for shrinking pattern photoresist

Structural design of alignment mark

Sandwich photoresist structure in phtotlithographic process