George M. Gammel

Person

Marblehead, MA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Systems and methods for optimizing full horizontal scanned beam dis...
- Patent number 12,191,113
- Issue date Jan 7, 2025
- Applied Materials, Inc.
- Tyler Wills
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Techniques for determining and correcting for expected dose variati...
- Patent number 11,264,205
- Issue date Mar 1, 2022
- Applied Materials, Inc.
- Eric Donald Wilson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and techniques for beam mapping in ion beam system
- Patent number 10,431,421
- Issue date Oct 1, 2019
- Varian Semiconductor Equipment Associates, Inc.
- Eric D. Wilson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for controlling implant process
- Patent number 9,738,968
- Issue date Aug 22, 2017
- Varian Semiconductor Equipment Associates, Inc.
- George M. Gammel
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Reducing glitching in an ion implanter
- Patent number 9,062,377
- Issue date Jun 23, 2015
- Varian Semiconductor Equipment Associates, Inc.
- William T. Levay
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and techniques for controlling ion implantation uniformity
- Patent number 9,006,692
- Issue date Apr 14, 2015
- Varian Semiconductor Equipment Associates, Inc.
- Stanislav S. Todorov
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and techniques for controlling ion implantation uniformity
- Patent number 8,853,653
- Issue date Oct 7, 2014
- Varian Semiconductor Equipment Associates, Inc.
- Stanislav S. Todorov
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Fixed mask design improvements
- Patent number 8,378,318
- Issue date Feb 19, 2013
- Varian Semiconductor Equipment Associates, Inc.
- George Gammel
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Horizontal and vertical beam angle measurement technique
- Patent number 7,723,706
- Issue date May 25, 2010
- Varian Semiconductor Equipment Associates, Inc.
- George Michael Gammel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam current uniformity monitor, ion implanter and related method
- Patent number 7,663,125
- Issue date Feb 16, 2010
- Varian Semiconductor Equipment Associates, Inc.
- William G. Callahan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer charge monitoring
- Patent number 7,476,877
- Issue date Jan 13, 2009
- Varian Semiconductor Equipment Associates, Inc.
- Russell J. Low
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implantation systems and methods utilizing a downstream gas source
- Patent number 6,891,173
- Issue date May 10, 2005
- Varian Semiconductor Equipment Associates, Inc.
- George Gammel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Faraday system for ion implanters
- Patent number 6,723,998
- Issue date Apr 20, 2004
- Varian Semiconductor Equipment Associates, Inc.
- Jack Bisson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for low energy ion implantation
- Patent number 6,528,804
- Issue date Mar 4, 2003
- Varian Semiconductor Equipment Associate, Inc.
- Philip Sullivan
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SYSTEMS AND METHODS FOR OPTIMIZING FULL HORIZONTAL SCANNED BEAM DIS...
- Publication number 20230386785
- Publication date Nov 30, 2023
- Applied Materials, Inc.
- Tyler Wills
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FAST BEAM CALIBRATION PROCEDURE FOR BEAMLINE ION IMPLANTER
- Publication number 20230057995
- Publication date Feb 23, 2023
- Applied Materials, Inc.
- George M. Gammel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TECHNIQUES FOR DETERMINING AND CORRECTING FOR EXPECTED DOSE VARIATI...
- Publication number 20210175048
- Publication date Jun 10, 2021
- Applied Materials, Inc.
- Eric Donald Wilson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND TECHNIQUES FOR BEAM MAPPING IN ION BEAM SYSTEM
- Publication number 20200027698
- Publication date Jan 23, 2020
- Varian Semiconductor Equipment Associates, Inc.
- Eric D. Wilson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND TECHNIQUES FOR BEAM MAPPING IN ION BEAM SYSTEM
- Publication number 20190139740
- Publication date May 9, 2019
- Varian Semiconductor Equipment Associates, Inc.
- Eric D. Wilson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR CONTROLLING IMPLANT PROCESS
- Publication number 20160312357
- Publication date Oct 27, 2016
- George M. Gammel
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS AND TECHNIQUES FOR CONTROLLING ION IMPLANTATION UNIFORMITY
- Publication number 20140326179
- Publication date Nov 6, 2014
- Varian Semiconductor Equipment Associates, Inc.
- Stanislav S. Todorov
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Reducing Glitching In An Ion Implanter
- Publication number 20140127394
- Publication date May 8, 2014
- George M. Gammel
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Reducing Glitching In An Ion Implanter
- Publication number 20140099430
- Publication date Apr 10, 2014
- William T. Levay
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYSTEM AND METHOD FOR CONTROLLING PLASMA DEPOSITION UNIFORMITY
- Publication number 20120021136
- Publication date Jan 26, 2012
- Varian Semiconductor Equipment Associates, Inc.
- Joseph P. Dzengeleski
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ION PROCESS UNIFORMITY MONITOR
- Publication number 20100159120
- Publication date Jun 24, 2010
- Varian Semiconductor Equipment Associates, Inc.
- Joseph P. Dzengeleski
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HORIZONTAL AND VERTICAL BEAM ANGLE MEASUREMENT TECHNIQUE
- Publication number 20090314959
- Publication date Dec 24, 2009
- George Michael Gammel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION BEAM CURRENT UNIFORMITY MONITOR, ION IMPLANTER AND RELATED METHOD
- Publication number 20080073584
- Publication date Mar 27, 2008
- William G. Callahan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Wafer charge monitoring
- Publication number 20070187615
- Publication date Aug 16, 2007
- Varian Semiconductor Equipment Associates, Inc.
- Russell J. Low
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ion implantation systems and methods utilizing a downstream gas source
- Publication number 20030080301
- Publication date May 1, 2003
- George Gammel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Faraday system for ion implanters
- Publication number 20020070347
- Publication date Jun 13, 2002
- Varian Semiconductor Equipment Associates, Inc.
- Jack Bisson
- H01 - BASIC ELECTRIC ELEMENTS

George M. Gammel

Person

Patents Grantslast 30 patents

Systems and methods for optimizing full horizontal scanned beam dis...

Techniques for determining and correcting for expected dose variati...

Apparatus and techniques for beam mapping in ion beam system

Apparatus and method for controlling implant process

Reducing glitching in an ion implanter

Apparatus and techniques for controlling ion implantation uniformity

Apparatus and techniques for controlling ion implantation uniformity

Fixed mask design improvements

Horizontal and vertical beam angle measurement technique

Ion beam current uniformity monitor, ion implanter and related method

Wafer charge monitoring

Ion implantation systems and methods utilizing a downstream gas source

Faraday system for ion implanters

Method and apparatus for low energy ion implantation

Patents Applicationslast 30 patents

SYSTEMS AND METHODS FOR OPTIMIZING FULL HORIZONTAL SCANNED BEAM DIS...

FAST BEAM CALIBRATION PROCEDURE FOR BEAMLINE ION IMPLANTER

TECHNIQUES FOR DETERMINING AND CORRECTING FOR EXPECTED DOSE VARIATI...

APPARATUS AND TECHNIQUES FOR BEAM MAPPING IN ION BEAM SYSTEM

APPARATUS AND TECHNIQUES FOR BEAM MAPPING IN ION BEAM SYSTEM

APPARATUS AND METHOD FOR CONTROLLING IMPLANT PROCESS

APPARATUS AND TECHNIQUES FOR CONTROLLING ION IMPLANTATION UNIFORMITY

Reducing Glitching In An Ion Implanter

Reducing Glitching In An Ion Implanter

SYSTEM AND METHOD FOR CONTROLLING PLASMA DEPOSITION UNIFORMITY

PLASMA ION PROCESS UNIFORMITY MONITOR

HORIZONTAL AND VERTICAL BEAM ANGLE MEASUREMENT TECHNIQUE

ION BEAM CURRENT UNIFORMITY MONITOR, ION IMPLANTER AND RELATED METHOD

Wafer charge monitoring

Ion implantation systems and methods utilizing a downstream gas source

Faraday system for ion implanters