Georgios Vellianitis

Person

Hsinchu, TW

People

Patents Grantslast 30 patents

Information Patent Grant
Semiconductor device and method for manufacturing the same
- Patent number 12,159,942
- Issue date Dec 3, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Marcus Johannes Henricus Van Dal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Crystalline semiconductor layer formed in BEOL processes
- Patent number 12,051,702
- Issue date Jul 30, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Matthias Passlack
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor structure with barrier and method for manufacturing t...
- Patent number 12,027,632
- Issue date Jul 2, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Gerben Doornbos
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Thin-film transistors and method for manufacturing the same
- Patent number 11,869,975
- Issue date Jan 9, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Georgios Vellianitis
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Localized protection layer for laser annealing process
- Patent number 11,848,385
- Issue date Dec 19, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Blandine Duriez
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method for manufacturing the same
- Patent number 11,791,420
- Issue date Oct 17, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Marcus Johannes Henricus Van Dal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Crystalline semiconductor layer formed in BEOL processes
- Patent number 11,587,786
- Issue date Feb 21, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Matthias Passlack
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor devices and method for manufacturing the same
- Patent number 11,574,927
- Issue date Feb 7, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Marcus Johannes Henricus Van Dal
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
- Publication number 20240379871
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Marcus Johannes Henricus VAN DAL
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR STRUCTURE WITH BARRIER AND METHOD FOR MANUFACTURING T...
- Publication number 20240313124
- Publication date Sep 19, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Gerben DOORNBOS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
- Publication number 20230387327
- Publication date Nov 30, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Marcus Johannes Henricus VAN DAL
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CRYSTALLINE SEMICONDUCTOR LAYER FORMED IN BEOL PROCESSES
- Publication number 20230197445
- Publication date Jun 22, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Matthias Passlack
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FABRICATING SEMICONDUCTOR DEVICE
- Publication number 20230170419
- Publication date Jun 1, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Georgios Vellianitis
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICES AND METHOD FOR MANUFACTURING THE SAME
- Publication number 20220336477
- Publication date Oct 20, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Marcus Johannes Henricus VAN DAL
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THIN-FILM TRANSISTORS AND METHOD FOR MANUFACTURING THE SAME
- Publication number 20220336675
- Publication date Oct 20, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Georgios VELLIANITIS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR STRUCTURE WITH BARRIER AND METHOD FOR MANUFACTURING T...
- Publication number 20220336679
- Publication date Oct 20, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Gerben DOORNBOS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
- Publication number 20220336678
- Publication date Oct 20, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Marcus Johannes Henricus VAN DAL
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOCALIZED PROTECTION LAYER FOR LASER ANNEALING PROCESS
- Publication number 20220223744
- Publication date Jul 14, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Blandine Duriez
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CRYSTALLINE SEMICONDUCTOR LAYER FORMED IN BEOL PROCESSES
- Publication number 20210225647
- Publication date Jul 22, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Matthias Passlack
- H01 - BASIC ELECTRIC ELEMENTS

Georgios Vellianitis

Person

Patents Grantslast 30 patents

Semiconductor device and method for manufacturing the same

Crystalline semiconductor layer formed in BEOL processes

Semiconductor structure with barrier and method for manufacturing t...

Thin-film transistors and method for manufacturing the same

Localized protection layer for laser annealing process

Semiconductor device and method for manufacturing the same

Crystalline semiconductor layer formed in BEOL processes

Semiconductor devices and method for manufacturing the same

Patents Applicationslast 30 patents

SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME

SEMICONDUCTOR STRUCTURE WITH BARRIER AND METHOD FOR MANUFACTURING T...

SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME

CRYSTALLINE SEMICONDUCTOR LAYER FORMED IN BEOL PROCESSES

METHOD OF FABRICATING SEMICONDUCTOR DEVICE

SEMICONDUCTOR DEVICES AND METHOD FOR MANUFACTURING THE SAME

THIN-FILM TRANSISTORS AND METHOD FOR MANUFACTURING THE SAME

SEMICONDUCTOR STRUCTURE WITH BARRIER AND METHOD FOR MANUFACTURING T...

SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME

LOCALIZED PROTECTION LAYER FOR LASER ANNEALING PROCESS

CRYSTALLINE SEMICONDUCTOR LAYER FORMED IN BEOL PROCESSES