Gerald Yin

Person

Shanghai, CN

People

Patents Grantslast 30 patents

Information Patent Grant
Semiconductor processing system
- Patent number 12,080,570
- Issue date Sep 3, 2024
- ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA
- Heng Tao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma reactor for ultra-high aspect ratio etching and etching meth...
- Patent number 11,189,496
- Issue date Nov 30, 2021
- ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA
- Gerald Zheyao Yin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for processing semiconductor work pieces
- Patent number 9,947,562
- Issue date Apr 17, 2018
- Applied Materials, Inc.
- AiHua Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Capacitive-coupled plasma processing apparatus and method for proce...
- Patent number 9,230,781
- Issue date Jan 5, 2016
- ADVANCED MICRO-FABRICATION EQUIPMENT INC, SHANGHAI
- Zhongdu Liu
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Multi-station decoupled reactive ion etch chamber
- Patent number 9,208,998
- Issue date Dec 8, 2015
- ADVANCED MICRO-FABRICATION EQUIPMENT INC, SHANGHAI
- Gerald Yin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-station decoupled reactive ion etch chamber
- Patent number 8,366,829
- Issue date Feb 5, 2013
- Advanced Micro-Fabrication Equipment, Inc. Asia
- Gerald Yin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-station plasma reactor with multiple plasma regions
- Patent number 8,336,488
- Issue date Dec 25, 2012
- Advanced Micro-Fabrication Equipment, Inc. Asia
- Aihua Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Capacitive CVD reactor and methods for plasma CVD process
- Patent number 8,297,225
- Issue date Oct 30, 2012
- Advanced Micro-Fabrication Equipment, Inc. Asia
- Gerald Yin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas distribution assembly for use in a semiconductor work piece pro...
- Patent number 7,658,800
- Issue date Feb 9, 2010
- Advanced Micro-Fabrication Equipment, Inc. Asia
- AiHua Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Multiple frequency plasma chamber, switchable RF system, and proces...
- Patent number 7,503,996
- Issue date Mar 17, 2009
- Advanced Micro-Fabrication Equipment, Inc. Asia
- Jinyuan Chen
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SEMICONDUCTOR PROCESSING SYSTEM
- Publication number 20210358781
- Publication date Nov 18, 2021
- Advanced Micro-Fabrication Equipment Inc. China
- Heng TAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA REACTOR FOR ULTRA-HIGH ASPECT RATIO ETCHING AND ETCHING METH...
- Publication number 20200251345
- Publication date Aug 6, 2020
- Advanced Micro-Fabrication Equipment Inc. China
- Gerald Zheyao Yin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR IN SITU CLEANING OF MOCVD REACTION CHAMBER
- Publication number 20140083452
- Publication date Mar 27, 2014
- ADVANCED MICRO-FABRICATION EQUIPMENT INC, SHANGHAI
- Gerald Zheyao Yin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR IN SITU CLEANING OF MOCVD REACTION CHAMBER
- Publication number 20140083451
- Publication date Mar 27, 2014
- ADVANCED MICRO-FABRICATION EQUIPMENT INC, SHANGHAI
- Gerald Zheyao Yin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR IN SITU CLEANING OF MOCVD REACTION CHAMBER
- Publication number 20140083453
- Publication date Mar 27, 2014
- ADVANCED MICRO-FABRICATION EQUIPMENT INC, SHANGHAI
- Gerald Zheyao Yin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CHEMICAL VAPOR DEPOSITION OR EPITAXIAL-LAYER GROWTH REACTOR AND SUP...
- Publication number 20130125820
- Publication date May 23, 2013
- Gerald Zheyao YIN
- C30 - CRYSTAL GROWTH
Information Patent Application
CAPACITIVE CVD REACTOR AND METHODS FOR PLASMA CVD PROCESS
- Publication number 20130048216
- Publication date Feb 28, 2013
- Advanced Micro-Fabrication Equipment, Inc. Asia
- Gerald Yin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CAPACITIVE-COUPLED PLASMA PROCESSING APPARATUS AND METHOD FOR PROCE...
- Publication number 20130032574
- Publication date Feb 7, 2013
- Zhongdu Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-STATION DECOUPLED REACTIVE ION ETCH CHAMBER
- Publication number 20130008605
- Publication date Jan 10, 2013
- Gerald Yin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR PROCESSING SEMICONDUCTOR WORK PIECES
- Publication number 20110305544
- Publication date Dec 15, 2011
- AiHua Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA CHAMBER HAVING SWITCHABLE BIAS POWER AND A SWITCHABLE FREQUE...
- Publication number 20110030900
- Publication date Feb 10, 2011
- Advanced Micro-Fabrication Equipment, Inc. Asia
- Jinyuan CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCK AND BASE FOR PLASMA REACTOR HAVING IMPROVED WAF...
- Publication number 20100271745
- Publication date Oct 28, 2010
- Advanced Micro-Fabrication Equipment, Inc. Asia
- Jinyuan CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CAPACITIVE CVD REACTOR AND METHODS FOR PLASMA CVD PROCESS
- Publication number 20100126667
- Publication date May 27, 2010
- Advanced Micro-Fabrication Equipment, Inc. Asia
- Gerald Yin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MULTI-STATION PLASMA REACTOR WITH MULTIPLE PLASMA REGIONS
- Publication number 20090139453
- Publication date Jun 4, 2009
- AIHUA CHEN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MULTIPLE FREQUENCY PLASMA CHAMBER, SWITCHABLE RF SYSTEM, AND PROCES...
- Publication number 20080251207
- Publication date Oct 16, 2008
- ADVANCED MICRO-FABRICATION EQUIPMENT, INC. ASIA,
- Jinyuan Chen
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Application
Gas distribution assembly for use in a semiconductor work piece pro...
- Publication number 20080092815
- Publication date Apr 24, 2008
- Advanced Micro-Fabrication Equipment, Inc. Asia
- AiHua Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MULTI-STATION DECOUPLED REACTIVE ION ETCH CHAMBER
- Publication number 20080011424
- Publication date Jan 17, 2008
- Advanced Micro-Fabrication Equipment, Inc. Asia
- Gerald YIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for processing semiconductor work pieces
- Publication number 20070032097
- Publication date Feb 8, 2007
- Advanced Micro-Fabrication Equipment, Inc. Asia
- AiHua Chen
- H01 - BASIC ELECTRIC ELEMENTS

Person

Patents Grantslast 30 patents

Semiconductor processing system

Plasma reactor for ultra-high aspect ratio etching and etching meth...

Method and apparatus for processing semiconductor work pieces

Capacitive-coupled plasma processing apparatus and method for proce...

Multi-station decoupled reactive ion etch chamber

Multi-station decoupled reactive ion etch chamber

Multi-station plasma reactor with multiple plasma regions

Capacitive CVD reactor and methods for plasma CVD process

Gas distribution assembly for use in a semiconductor work piece pro...

Multiple frequency plasma chamber, switchable RF system, and proces...

Patents Applicationslast 30 patents

SEMICONDUCTOR PROCESSING SYSTEM

PLASMA REACTOR FOR ULTRA-HIGH ASPECT RATIO ETCHING AND ETCHING METH...

METHOD FOR IN SITU CLEANING OF MOCVD REACTION CHAMBER

METHOD FOR IN SITU CLEANING OF MOCVD REACTION CHAMBER

METHOD FOR IN SITU CLEANING OF MOCVD REACTION CHAMBER

CHEMICAL VAPOR DEPOSITION OR EPITAXIAL-LAYER GROWTH REACTOR AND SUP...

CAPACITIVE CVD REACTOR AND METHODS FOR PLASMA CVD PROCESS

CAPACITIVE-COUPLED PLASMA PROCESSING APPARATUS AND METHOD FOR PROCE...

MULTI-STATION DECOUPLED REACTIVE ION ETCH CHAMBER

METHOD AND APPARATUS FOR PROCESSING SEMICONDUCTOR WORK PIECES

PLASMA CHAMBER HAVING SWITCHABLE BIAS POWER AND A SWITCHABLE FREQUE...

ELECTROSTATIC CHUCK AND BASE FOR PLASMA REACTOR HAVING IMPROVED WAF...

CAPACITIVE CVD REACTOR AND METHODS FOR PLASMA CVD PROCESS

MULTI-STATION PLASMA REACTOR WITH MULTIPLE PLASMA REGIONS

MULTIPLE FREQUENCY PLASMA CHAMBER, SWITCHABLE RF SYSTEM, AND PROCES...

Gas distribution assembly for use in a semiconductor work piece pro...

MULTI-STATION DECOUPLED REACTIVE ION ETCH CHAMBER

Method and apparatus for processing semiconductor work pieces