Gerard Lukpat

Person

Sunnyvale, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Detection and removal of self-aligned double patterning artifacts
- Patent number 8,826,193
- Issue date Sep 2, 2014
- Synopsys, Inc.
- Yuelin Du
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Fast lithography compliance check for place and route optimization
- Patent number 8,612,899
- Issue date Dec 17, 2013
- Synopsys, Inc.
- Alexander Miloslavsky
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Fast lithography compliance check for place and route optimization
- Patent number 8,347,239
- Issue date Jan 1, 2013
- Synopsys, Inc.
- Alexander Miloslavsky
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and system for performing lithography verification for a dou...
- Patent number 8,132,128
- Issue date Mar 6, 2012
- Synopsys, Inc.
- Hua Song
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for deblurring mask images
- Patent number 7,483,559
- Issue date Jan 27, 2009
- Synopsys, Inc.
- Gerard Terrence Luk-Pat
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Approximating wafer intensity change to provide fast mask defect sc...
- Patent number 7,478,360
- Issue date Jan 13, 2009
- Synopsys, Inc.
- Gerard T. Luk-Pat
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
DETECTION AND REMOVAL OF SELF-ALIGNED DOUBLE PATTERNING ARTIFACTS
- Publication number 20140245239
- Publication date Aug 28, 2014
- Synopsys, Inc.
- Yuelin Du
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
FAST LITHOGRAPHY COMPLIANCE CHECK FOR PLACE AND ROUTE OPTIMIZATION
- Publication number 20100131909
- Publication date May 27, 2010
- Synopsys, Inc.
- Alexander Miloslavsky
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND SYSTEM FOR PERFORMING LITHOGRAPHY VERIFICATION FOR A DOU...
- Publication number 20100115489
- Publication date May 6, 2010
- Synopsys, Inc.
- Hua Song
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Approximating Wafer Intensity Change To Provide Fast Mask Defect Sc...
- Publication number 20090046920
- Publication date Feb 19, 2009
- Synopsys, Inc.
- Gerard T. Luk-Pat
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Fast lithography compliance check for place and route optimization
- Publication number 20080005704
- Publication date Jan 3, 2008
- SYNOPSYS, INC.
- Alexander Miloslavsky
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Approximating wafer intensity change to provide fast mask defect sc...
- Publication number 20070130557
- Publication date Jun 7, 2007
- Synopsys, Inc.
- Gerard T. Luk-Pat
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and apparatus for deblurring mask images
- Publication number 20060034505
- Publication date Feb 16, 2006
- SYNOPSYS, INC.
- Gerard Terrence Luk-Pat
- G06 - COMPUTING CALCULATING COUNTING

Gerard Lukpat

Person

Patents Grantslast 30 patents

Detection and removal of self-aligned double patterning artifacts

Fast lithography compliance check for place and route optimization

Fast lithography compliance check for place and route optimization

Method and system for performing lithography verification for a dou...

Method and apparatus for deblurring mask images

Approximating wafer intensity change to provide fast mask defect sc...

Patents Applicationslast 30 patents

DETECTION AND REMOVAL OF SELF-ALIGNED DOUBLE PATTERNING ARTIFACTS

FAST LITHOGRAPHY COMPLIANCE CHECK FOR PLACE AND ROUTE OPTIMIZATION

METHOD AND SYSTEM FOR PERFORMING LITHOGRAPHY VERIFICATION FOR A DOU...

Approximating Wafer Intensity Change To Provide Fast Mask Defect Sc...

Fast lithography compliance check for place and route optimization

Approximating wafer intensity change to provide fast mask defect sc...

Method and apparatus for deblurring mask images