Membership
Tour
Register
Log in
Gerardus J. J. Keijsers
Follow
Person
Venlo, NL
People
Overview
Industries
Organizations
People
Information
Impact
Patents Grants
last 30 patents
Information
Patent Grant
Lithographic apparatus and method
Patent number
8,610,878
Issue date
Dec 17, 2013
ASML Netherlands B.V.
Johannes Jacobus Matheus Baselmans
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Substrate holder for lithographic apparatus
Patent number
6,583,858
Issue date
Jun 24, 2003
ASML Netherlands B.V.
Frank van Schaik
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Patents Applications
last 30 patents
Information
Patent Application
Radiation exposure apparatus comprising a gas flushing system
Publication number
20060146300
Publication date
Jul 6, 2006
ASML NETHERLANDS B.V.
Klaus Simon
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Substrate, method of preparing a substrate, method of measurement,...
Publication number
20050118781
Publication date
Jun 2, 2005
Peter Ten Berge
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Substrate holder for lithographic apparatus
Publication number
20010022652
Publication date
Sep 20, 2001
Frank van Schaik
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY