Gerardus Johannes Joseph Keijsers

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Venlo, NL

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Patents Grantslast 30 patents

Information Patent Grant
Lithographic apparatus and method
- Patent number 7,675,606
- Issue date Mar 9, 2010
- ASML Netherlands B.V.
- Enno Van Den Brink
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation exposure apparatus comprising a gas flushing system
- Patent number 7,570,342
- Issue date Aug 4, 2009
- ASML Netherlands B.V.
- Klaus Simon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alignment method, method of measuring front to backside alignment e...
- Patent number 7,420,676
- Issue date Sep 2, 2008
- ASML Netherlands B.V.
- Joeri Lof
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate, method of preparing a substrate, method of measurement,...
- Patent number 7,253,077
- Issue date Aug 7, 2007
- ASML Netherlands B.V.
- Peter Ten Berge
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
Lithographic Apparatus and Method
- Publication number 20110216297
- Publication date Sep 8, 2011
- ASML NETHERLANDS B.V.
- Johannes Jacobus Matheus BASELMANS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus and device manufacturing method
- Publication number 20090075012
- Publication date Mar 19, 2009
- ASML NETHERLANDS B.V.
- Paulus Wilhelmus Van Dijk
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus and method
- Publication number 20070258080
- Publication date Nov 8, 2007
- ASML NETHERLANDS B.V.
- Enno Van Den Brink
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY