Geraud Jean-Michel Dubois

Person

Los Gatos, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Homogeneous porous low dielectric constant materials
- Patent number 8,314,005
- Issue date Nov 20, 2012
- International Business Machines Corporation
- Sampath Purushothaman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Nanoporous media templated from unsymmetrical amphiphilic porogens
- Patent number 8,268,903
- Issue date Sep 18, 2012
- International Business Machines Corporation
- Geraud Jean-Michel Dubois
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polyhedral oligomeric silsesquioxane based imprint materials and im...
- Patent number 8,026,293
- Issue date Sep 27, 2011
- International Business Machines Corporation
- Robert David Allen
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Nanoporous media templated from unsymmetrical amphiphilic porogens
- Patent number 7,960,442
- Issue date Jun 14, 2011
- International Business Machines Corporation
- Jennifer Nam Cha
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Low-K interlevel dielectric materials and method of forming low-K i...
- Patent number 7,931,829
- Issue date Apr 26, 2011
- International Business Machines Corporation
- Geraud Jean-Michel Dubois
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method of step-and-flash imprint lithography
- Patent number 7,927,664
- Issue date Apr 19, 2011
- International Business Machines Corporation
- Richard Anthony Dipietro
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Photopatternable dielectric materials for BEOL applications and met...
- Patent number 7,919,225
- Issue date Apr 5, 2011
- International Business Machines Corporation
- Robert D. Allen
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Low-K interlevel dielectric materials and method of forming low-K i...
- Patent number 7,820,242
- Issue date Oct 26, 2010
- International Business Machines Corporation
- Geraud Jean-Michel Dubois
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Nanoporous media with lamellar structures
- Patent number 7,482,389
- Issue date Jan 27, 2009
- International Business Machines Corporation
- Jennifer Nam Cha
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Imprint process using polyhedral oligomeric silsesquioxane based im...
- Patent number 7,468,330
- Issue date Dec 23, 2008
- International Business Machines Corporation
- Robert David Allen
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Method of forming low-K interlevel dielectric layers and structures
- Patent number 7,459,183
- Issue date Dec 2, 2008
- International Business Machines Corporation
- Geraud Jean-Michel Dubois
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
HOMOGENEOUS POROUS LOW DIELECTRIC CONSTANT MATERIALS
- Publication number 20120329273
- Publication date Dec 27, 2012
- International Business Machines Corporation
- Robert L. Bruce
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HOMOGENEOUS POROUS LOW DIELECTRIC CONSTANT MATERIALS
- Publication number 20120282784
- Publication date Nov 8, 2012
- International Business Machines Corporation
- Sampath Purushothaman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POLYHEDRAL OLIGOMERIC SILSESQUIOXANE BASED IMPRINT MATERIALS AND IM...
- Publication number 20110256713
- Publication date Oct 20, 2011
- International Business Machines Corporation
- Robert David Allen
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Nanoporous Media Templated from Unsymmetrical Amphiphilic Porogens
- Publication number 20110245418
- Publication date Oct 6, 2011
- Geraud Jean-Michel Dubois
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Homogeneous Porous Low Dielectric Constant Materials
- Publication number 20110183525
- Publication date Jul 28, 2011
- International Business Machines Corporation
- Sampath Purushothaman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POLY-OXYCARBOSILANE COMPOSITIONS FOR USE IN IMPRINT LITHOGRAPHY
- Publication number 20110136928
- Publication date Jun 9, 2011
- International Business Machines Corporation
- Richard Anthony Dipietro
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
LOW-K INTERLEVEL DIELECTRIC MATERIALS AND METHOD OF FORMING LOW-K I...
- Publication number 20100311895
- Publication date Dec 9, 2010
- International Business Machines Corporation
- Geraud Jean-Michel Dubois
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Nanoporous Media with Lamellar Structures
- Publication number 20100055307
- Publication date Mar 4, 2010
- International Business Machines Corporation
- Jennifer Nam Cha
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOPATTERNABLE DIELECTRIC MATERIALS FOR BEOL APPLICATIONS AND MET...
- Publication number 20090291389
- Publication date Nov 26, 2009
- International Business Machines Corporation
- Robert D. Allen
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
LOW-K INTERLEVEL DIELECTRIC MATERIALS AND METHOD OF FORMING LOW-K I...
- Publication number 20080171136
- Publication date Jul 17, 2008
- Geraud Jean-Michel Dubois
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POLYHEDRAL OLIGOMERIC SILSESQUIOXANE BASED IMPRINT MATERIALS AND IM...
- Publication number 20080166871
- Publication date Jul 10, 2008
- Robert David Allen
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Compositions Comprising Poly-oxycarbosilane and Methods for Their U...
- Publication number 20080050530
- Publication date Feb 28, 2008
- Richard Anthony Dipietro
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Polyhedral oligomeric silsesquioxane based imprint materials and im...
- Publication number 20070238317
- Publication date Oct 11, 2007
- International Business Machines Corporation
- Robert David Allen
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR

Geraud Jean-Michel Dubois

Person

Patents Grantslast 30 patents

Homogeneous porous low dielectric constant materials

Nanoporous media templated from unsymmetrical amphiphilic porogens

Polyhedral oligomeric silsesquioxane based imprint materials and im...

Nanoporous media templated from unsymmetrical amphiphilic porogens

Low-K interlevel dielectric materials and method of forming low-K i...

Method of step-and-flash imprint lithography

Photopatternable dielectric materials for BEOL applications and met...

Low-K interlevel dielectric materials and method of forming low-K i...

Nanoporous media with lamellar structures

Imprint process using polyhedral oligomeric silsesquioxane based im...

Method of forming low-K interlevel dielectric layers and structures

Patents Applicationslast 30 patents

HOMOGENEOUS POROUS LOW DIELECTRIC CONSTANT MATERIALS

HOMOGENEOUS POROUS LOW DIELECTRIC CONSTANT MATERIALS

POLYHEDRAL OLIGOMERIC SILSESQUIOXANE BASED IMPRINT MATERIALS AND IM...

Nanoporous Media Templated from Unsymmetrical Amphiphilic Porogens

Homogeneous Porous Low Dielectric Constant Materials

POLY-OXYCARBOSILANE COMPOSITIONS FOR USE IN IMPRINT LITHOGRAPHY

LOW-K INTERLEVEL DIELECTRIC MATERIALS AND METHOD OF FORMING LOW-K I...

Nanoporous Media with Lamellar Structures

PHOTOPATTERNABLE DIELECTRIC MATERIALS FOR BEOL APPLICATIONS AND MET...

LOW-K INTERLEVEL DIELECTRIC MATERIALS AND METHOD OF FORMING LOW-K I...

POLYHEDRAL OLIGOMERIC SILSESQUIOXANE BASED IMPRINT MATERIALS AND IM...

Compositions Comprising Poly-oxycarbosilane and Methods for Their U...

Polyhedral oligomeric silsesquioxane based imprint materials and im...