Gerbrand VAN DER ZOUW

Person

Waalre, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Method and apparatus for measuring a parameter of interest using im...
- Patent number 10,983,445
- Issue date Apr 20, 2021
- ASML Netherlands B.V.
- Nitesh Pandey
- G01 - MEASURING TESTING
Information Patent Grant
Method of determining a value of a parameter of interest, method of...
- Patent number 10,795,269
- Issue date Oct 6, 2020
- ASML Netherlands B.V.
- Zili Zhou
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Focus control arrangement and method
- Patent number 10,551,308
- Issue date Feb 4, 2020
- ASML Netherlands B.V.
- Martin Jacobus Johan Jak
- G01 - MEASURING TESTING
Information Patent Grant
Method of inspecting a substrate, metrology apparatus, and lithogra...
- Patent number 10,534,274
- Issue date Jan 14, 2020
- ASML Netherlands B.V.
- Teunis Willem Tukker
- G01 - MEASURING TESTING
Information Patent Grant
Measurement system, lithographic system, and method of measuring a...
- Patent number 10,437,159
- Issue date Oct 8, 2019
- ASML Netherlands B.V.
- Teunis Willem Tukker
- G01 - MEASURING TESTING
Information Patent Grant
Metrology method and apparatus, computer program and lithographic s...
- Patent number 10,423,077
- Issue date Sep 24, 2019
- ASML Netherlands B.V.
- Nitesh Pandey
- G01 - MEASURING TESTING
Information Patent Grant
Illumination system, inspection apparatus including such an illumin...
- Patent number 10,338,401
- Issue date Jul 2, 2019
- ASML Netherlands B.V.
- Gerbrand Van Der Zouw
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation conditioning system, illumination system and metrology ap...
- Patent number 10,303,064
- Issue date May 28, 2019
- ASML Netherlands B.V.
- Sebastianus Adrianus Goorden
- G02 - OPTICS
Information Patent Grant
Focus monitoring arrangement and inspection apparatus including suc...
- Patent number 10,215,954
- Issue date Feb 26, 2019
- ASML Netherlands B.V.
- Gerbrand Van Der Zouw
- G01 - MEASURING TESTING
Information Patent Grant
Metrology method and apparatus, computer program and lithographic s...
- Patent number 10,191,391
- Issue date Jan 29, 2019
- ASML Netherlands B.V.
- Nitesh Pandey
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Inspection apparatus and device manufacturing method
- Patent number 10,126,237
- Issue date Nov 13, 2018
- ASML Netherlands B.V.
- Gerbrand Van Der Zouw
- G01 - MEASURING TESTING
Information Patent Grant
Illumination system, inspection apparatus including such an illumin...
- Patent number 9,753,296
- Issue date Sep 5, 2017
- ASML Netherlands B.V.
- Gerbrand Van Der Zouw
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photon source, metrology apparatus, lithographic system and device...
- Patent number 9,357,626
- Issue date May 31, 2016
- ASML Netherlands B.V.
- Henricus Petrus Maria Pellemans
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Photon source, metrology apparatus, lithographic system and device...
- Patent number 8,921,814
- Issue date Dec 30, 2014
- ASML Netherlands B.V.
- Henricus Petrus Maria Pellemans
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Calibration method and apparatus
- Patent number 8,553,218
- Issue date Oct 8, 2013
- ASML Netherlands B.V.
- Patricius Aloysius Jacobus Tinnemans
- G01 - MEASURING TESTING
Information Patent Grant
Lithographic apparatus, stage apparatus and device manufacturing me...
- Patent number 8,384,881
- Issue date Feb 26, 2013
- ASML Netherlands B.V.
- Joost Jeroen Ottens
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for vibration detection and vibration analysis...
- Patent number 7,773,235
- Issue date Aug 10, 2010
- ASML Netherlands B.V.
- Haico Victor Kok
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for vibration detection and vibration analysis...
- Patent number 7,409,302
- Issue date Aug 5, 2008
- ASML Netherlands B.V.
- Haico Victor Kok
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic device and method for wafer alignment with reduced til...
- Patent number 6,891,598
- Issue date May 10, 2005
- ASML Netherlands B.V.
- Gerbrand Van Der Zouw
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
WAVELENGTH SELECTION MODULE, ILLUMINATION SYSTEM AND METROLOGY SYSTEM
- Publication number 20220299365
- Publication date Sep 22, 2022
- ASML NETHERLANDS B.V.
- Gerbrand VAN DER ZOUW
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR MEASURING A PARAMETER OF INTEREST USING IM...
- Publication number 20190250094
- Publication date Aug 15, 2019
- ASML NETHERLANDS B.V.
- Nitesh PANDEY
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Metrology Method and Apparatus, Computer Program and Lithographic S...
- Publication number 20190146356
- Publication date May 16, 2019
- ASML NETHERLANDS B.V.
- Nitesh PANDEY
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method Of Determining A Value Of A Parameter Of Interest, Method Of...
- Publication number 20190129316
- Publication date May 2, 2019
- ASML NETHERLANDS B.V.
- Zili ZHOU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Measurement System, Lithographic System, and Method Of Measuring a...
- Publication number 20180164699
- Publication date Jun 14, 2018
- ASML NETHERLANDS B.V.
- Teunis Willem TUKKER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of Inspecting a Substrate, Metrology Apparatus, and Lithogra...
- Publication number 20180107124
- Publication date Apr 19, 2018
- ASML NETHERLANDS B.V.
- Teunis Willem TUKKER
- G01 - MEASURING TESTING
Information Patent Application
Illumination System, Inspection Apparatus Including Such an Illumin...
- Publication number 20180088347
- Publication date Mar 29, 2018
- ASML NETHERLANDS B.V.
- Gerbrand VAN DER ZOUW
- G02 - OPTICS
Information Patent Application
Radiation Conditioning System, Illumination System And Metrology Ap...
- Publication number 20170329232
- Publication date Nov 16, 2017
- ASM Netherlands B.V.
- Sebastianus Adrianus GOORDEN
- G01 - MEASURING TESTING
Information Patent Application
Focus Monitoring Arrangement and Inspection Apparatus Including Suc...
- Publication number 20170176714
- Publication date Jun 22, 2017
- ASML NETHERLANDS B.V.
- Gerbrand Van Der Zouw
- G02 - OPTICS
Information Patent Application
FOCUS CONTROL ARRANGEMENT AND METHOD
- Publication number 20170176328
- Publication date Jun 22, 2017
- ASML NETHERLANDS B.V.
- Martin Jacobus Johan JAK
- G01 - MEASURING TESTING
Information Patent Application
Metrology Method and Apparatus, Computer Program and Lithographic S...
- Publication number 20170097575
- Publication date Apr 6, 2017
- ASML NETHERLANDS B.V.
- Nitesh PANDEY
- G01 - MEASURING TESTING
Information Patent Application
Inspection Apparatus And Device Manufacturing Method
- Publication number 20160091422
- Publication date Mar 31, 2016
- ASML Netherlands B.V.
- Gerbrand Van Der Zouw
- G01 - MEASURING TESTING
Information Patent Application
Illumination System, Inspection Apparatus Including Such an Illumin...
- Publication number 20160025992
- Publication date Jan 28, 2016
- ASML NETHERLANDS B.V.
- Gerbrand VAN DER ZOUW
- G02 - OPTICS
Information Patent Application
Photon Source, Metrology Apparatus, Lithographic System and Device...
- Publication number 20150108373
- Publication date Apr 23, 2015
- ASML NETHERLANDS B.V.
- Henricus Petrus Maria PELLEMANS
- G01 - MEASURING TESTING
Information Patent Application
Photon Source, Metrology Apparatus, Lithographic System and Device...
- Publication number 20130329204
- Publication date Dec 12, 2013
- Henricus Petrus Maria PELLEMANS
- G01 - MEASURING TESTING
Information Patent Application
Calibration Method and Apparatus
- Publication number 20110178785
- Publication date Jul 21, 2011
- ASML NETHERLANDS B.V.
- Patricius Aloysius Jacobus TINNEMANS
- G01 - MEASURING TESTING
Information Patent Application
LITHOGRAPHIC APPARATUS, STAGE APPARATUS AND DEVICE MANUFACTURING ME...
- Publication number 20090086180
- Publication date Apr 2, 2009
- ASML NETHERLANDS B.V.
- Joost Jeroen OTTENS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic device and method for wafer alignment with reduced til...
- Publication number 20040179181
- Publication date Sep 16, 2004
- ASML NETHERLANDS B.V.
- Gerbrand Van Der Zouw
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Gerbrand VAN DER ZOUW

Person

Patents Grantslast 30 patents

Method and apparatus for measuring a parameter of interest using im...

Method of determining a value of a parameter of interest, method of...

Focus control arrangement and method

Method of inspecting a substrate, metrology apparatus, and lithogra...

Measurement system, lithographic system, and method of measuring a...

Metrology method and apparatus, computer program and lithographic s...

Illumination system, inspection apparatus including such an illumin...

Radiation conditioning system, illumination system and metrology ap...

Focus monitoring arrangement and inspection apparatus including suc...

Metrology method and apparatus, computer program and lithographic s...

Inspection apparatus and device manufacturing method

Illumination system, inspection apparatus including such an illumin...

Photon source, metrology apparatus, lithographic system and device...

Photon source, metrology apparatus, lithographic system and device...

Calibration method and apparatus

Lithographic apparatus, stage apparatus and device manufacturing me...

Method and apparatus for vibration detection and vibration analysis...

Method and apparatus for vibration detection and vibration analysis...

Lithographic device and method for wafer alignment with reduced til...

Patents Applicationslast 30 patents

WAVELENGTH SELECTION MODULE, ILLUMINATION SYSTEM AND METROLOGY SYSTEM

METHOD AND APPARATUS FOR MEASURING A PARAMETER OF INTEREST USING IM...

Metrology Method and Apparatus, Computer Program and Lithographic S...

Method Of Determining A Value Of A Parameter Of Interest, Method Of...

Measurement System, Lithographic System, and Method Of Measuring a...

Method of Inspecting a Substrate, Metrology Apparatus, and Lithogra...

Illumination System, Inspection Apparatus Including Such an Illumin...

Radiation Conditioning System, Illumination System And Metrology Ap...

Focus Monitoring Arrangement and Inspection Apparatus Including Suc...

FOCUS CONTROL ARRANGEMENT AND METHOD

Metrology Method and Apparatus, Computer Program and Lithographic S...

Inspection Apparatus And Device Manufacturing Method

Illumination System, Inspection Apparatus Including Such an Illumin...

Photon Source, Metrology Apparatus, Lithographic System and Device...

Photon Source, Metrology Apparatus, Lithographic System and Device...

Calibration Method and Apparatus

LITHOGRAPHIC APPARATUS, STAGE APPARATUS AND DEVICE MANUFACTURING ME...

Lithographic device and method for wafer alignment with reduced til...