Gerd Marxsen

Person

Radebeul, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Semiconductor device formed by a replacement gate approach based on...
- Patent number 8,383,500
- Issue date Feb 26, 2013
- GLOBALFOUNDRIES Inc.
- Gerd Marxsen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
CMP system and method using individually controlled temperature zones
- Patent number 8,182,709
- Issue date May 22, 2012
- Advanced Micro Devices, Inc.
- Jens Heinrich
- B24 - GRINDING POLISHING
Information Patent Grant
Reduced defectivity in contacts of a semiconductor device comprisin...
- Patent number 8,183,139
- Issue date May 22, 2012
- GLOBALFOUNDRIES Inc.
- Gerd Marxsen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for optical endpoint detection during CMP by usin...
- Patent number 8,152,595
- Issue date Apr 10, 2012
- Advanced Micro Devices Inc.
- Mike Schlicker
- B24 - GRINDING POLISHING
Information Patent Grant
Superior fill conditions in a replacement gate approach by performi...
- Patent number 8,138,038
- Issue date Mar 20, 2012
- GLOBALFOUNDRIES Inc.
- Jens Heinrich
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Technique for electrochemically depositing an alloy having a chemic...
- Patent number 7,985,329
- Issue date Jul 26, 2011
- Advanced Micro Devices, Inc.
- Axel Preusse
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Polishing head using zone control
- Patent number 7,905,764
- Issue date Mar 15, 2011
- GlobolFoundries Inc.
- Jens Heinrich
- B24 - GRINDING POLISHING
Information Patent Grant
Method and system for controlling the chemical mechanical polishing...
- Patent number 7,268,000
- Issue date Sep 11, 2007
- Advanced Micro Devices, Inc.
- Dirk Wollstein
- B24 - GRINDING POLISHING
Information Patent Grant
Method of electroplating copper over a patterned dielectric layer t...
- Patent number 6,958,247
- Issue date Oct 25, 2005
- Advanced Micro Devices, Inc.
- Gerd Marxsen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for controlling the chemical mechanical polishing...
- Patent number 6,957,997
- Issue date Oct 25, 2005
- Advanced Micro Devices, Inc.
- Gerd Marxsen
- B24 - GRINDING POLISHING
Information Patent Grant
Method and system for improving the manufacturing of metal damascen...
- Patent number 6,774,030
- Issue date Aug 10, 2004
- Advanced Micro Devices, Inc.
- Gerd Marxsen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for electrochemical metal deposition
- Patent number 6,761,812
- Issue date Jul 13, 2004
- Advanced Micro Devices, Inc.
- Axel Preusse
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Apparatus and method for chemical mechanical polishing of a substrate
- Patent number 6,752,697
- Issue date Jun 22, 2004
- Advanced Micro Devices, Inc.
- Uwe Gunter Stoeckgen
- B24 - GRINDING POLISHING
Information Patent Grant
Method of controlling the duration of an endpoint polishing process...
- Patent number 6,746,958
- Issue date Jun 8, 2004
- Advanced Micro Devices, Inc.
- Joyce S. Oey Hewett
- B24 - GRINDING POLISHING
Information Patent Grant
Prevention of precipitation defects on copper interconnects during...
- Patent number 6,720,264
- Issue date Apr 13, 2004
- Advanced Micro Devices, Inc.
- Kashmir S. Sahota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Polishing head and apparatus with an improved pad conditioner for c...
- Patent number 6,699,107
- Issue date Mar 2, 2004
- Advanced Micro Devices, Inc.
- Uwe Gunter Stoeckgen
- B24 - GRINDING POLISHING
Information Patent Grant
Method of forming metal lines having improved uniformity on a subst...
- Patent number 6,620,726
- Issue date Sep 16, 2003
- Advanced Micro Devices, Inc.
- Axel Preusse
- B24 - GRINDING POLISHING
Information Patent Grant
Method of controlling chemical mechanical polishing operations to c...
- Patent number 6,595,830
- Issue date Jul 22, 2003
- Advanced Micro Devices, Inc.
- Joyce S. Oey Hewett
- B24 - GRINDING POLISHING

Patents Applicationslast 30 patents

Information Patent Application
Reduced Defectivity in Contacts of a Semiconductor Device Comprisin...
- Publication number 20110269303
- Publication date Nov 3, 2011
- GLOBALFOUNDRIES INC.
- Gerd Marxsen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE FORMED BY A REPLACEMENT GATE APPROACH BASED ON...
- Publication number 20110186931
- Publication date Aug 4, 2011
- Gerd Marxsen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUPERIOR FILL CONDITIONS IN A REPLACEMENT GATE APPROACH BY PERFORMI...
- Publication number 20110076844
- Publication date Mar 31, 2011
- Jens Heinrich
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF REDUCING NON-UNIFORMITIES DURING CHEMICAL MECHANICAL POLI...
- Publication number 20100112816
- Publication date May 6, 2010
- Gerd Marxsen
- B24 - GRINDING POLISHING
Information Patent Application
SYSTEM AND METHOD FOR OPTICAL ENDPOINT DETECTION DURING CMP BY USIN...
- Publication number 20090275264
- Publication date Nov 5, 2009
- Mike Schlicker
- B24 - GRINDING POLISHING
Information Patent Application
CMP SYSTEM AND METHOD USING INDIVIDUALLY CONTROLLED TEMPERATURE ZONES
- Publication number 20090170320
- Publication date Jul 2, 2009
- Jens Heinrich
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING HEAD USING ZONE CONTROL
- Publication number 20090061745
- Publication date Mar 5, 2009
- Jens Heinrich
- B24 - GRINDING POLISHING
Information Patent Application
METHOD AND SYSTEM FOR CONTROLLING CHEMICAL MECHANICAL POLISHING BY...
- Publication number 20080242196
- Publication date Oct 2, 2008
- Gerd Marxsen
- B24 - GRINDING POLISHING
Information Patent Application
Technique for electrochemically depositing an alloy having a chemic...
- Publication number 20060219565
- Publication date Oct 5, 2006
- Axel Preusse
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Method for forming a defined recess in a damascene structure using...
- Publication number 20060172527
- Publication date Aug 3, 2006
- Gerd Marxsen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and system for controlling the chemical mechanical polishing...
- Publication number 20050070209
- Publication date Mar 31, 2005
- Gerd Marxsen
- B24 - GRINDING POLISHING
Information Patent Application
Method of electroplating copper over a patterned dielectric layer t...
- Publication number 20040214423
- Publication date Oct 28, 2004
- Gerd Marxsen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Retaining ring having reduced wear and contamination rate for a pol...
- Publication number 20040123951
- Publication date Jul 1, 2004
- Jens Kramer
- B24 - GRINDING POLISHING
Information Patent Application
Method of selectively removing metal residues from a dielectric lay...
- Publication number 20040063318
- Publication date Apr 1, 2004
- Rene Kai Nagel
- B24 - GRINDING POLISHING
Information Patent Application
Method of reducing a defect level after chemically mechanically pol...
- Publication number 20040043611
- Publication date Mar 4, 2004
- Uwe Gunter Stoeckgen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PREVENTION OF PRECIPITATION DEFECTS ON COPPER INTERCONNECTS DURING...
- Publication number 20040014319
- Publication date Jan 22, 2004
- Kashmir S. Sahota
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Apparatus and method for reducing oxidation of polished metal surfa...
- Publication number 20040009670
- Publication date Jan 15, 2004
- Axel Preusse
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
System and method for reducing the chemical reactivity of water and...
- Publication number 20040000234
- Publication date Jan 1, 2004
- Axel Preusse
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus and method for electrochemical metal deposition
- Publication number 20040000485
- Publication date Jan 1, 2004
- Axel Preusse
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Method and system for improving the manufacturing of metal damascen...
- Publication number 20030224596
- Publication date Dec 4, 2003
- Gerd Marxsen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and system for controlling the chemical mechanical polishing...
- Publication number 20030186546
- Publication date Oct 2, 2003
- Dirk Wollstein
- B24 - GRINDING POLISHING
Information Patent Application
METHOD OF FORMING METAL LINES HAVING IMPROVED UNIFORMITY ON A SUBST...
- Publication number 20030162385
- Publication date Aug 28, 2003
- Axel Preusse
- B24 - GRINDING POLISHING
Information Patent Application
Polishing head and apparatus with an improved pad conditioner for c...
- Publication number 20030162486
- Publication date Aug 28, 2003
- Uwe Gunter Stoeckgen
- B24 - GRINDING POLISHING

Gerd Marxsen

Person

Patents Grantslast 30 patents

Semiconductor device formed by a replacement gate approach based on...

CMP system and method using individually controlled temperature zones

Reduced defectivity in contacts of a semiconductor device comprisin...

System and method for optical endpoint detection during CMP by usin...

Superior fill conditions in a replacement gate approach by performi...

Technique for electrochemically depositing an alloy having a chemic...

Polishing head using zone control

Method and system for controlling the chemical mechanical polishing...

Method of electroplating copper over a patterned dielectric layer t...

Method and system for controlling the chemical mechanical polishing...

Method and system for improving the manufacturing of metal damascen...

Apparatus and method for electrochemical metal deposition

Apparatus and method for chemical mechanical polishing of a substrate

Method of controlling the duration of an endpoint polishing process...

Prevention of precipitation defects on copper interconnects during...

Polishing head and apparatus with an improved pad conditioner for c...

Method of forming metal lines having improved uniformity on a subst...

Method of controlling chemical mechanical polishing operations to c...

Patents Applicationslast 30 patents

Reduced Defectivity in Contacts of a Semiconductor Device Comprisin...

SEMICONDUCTOR DEVICE FORMED BY A REPLACEMENT GATE APPROACH BASED ON...

SUPERIOR FILL CONDITIONS IN A REPLACEMENT GATE APPROACH BY PERFORMI...

METHOD OF REDUCING NON-UNIFORMITIES DURING CHEMICAL MECHANICAL POLI...

SYSTEM AND METHOD FOR OPTICAL ENDPOINT DETECTION DURING CMP BY USIN...

CMP SYSTEM AND METHOD USING INDIVIDUALLY CONTROLLED TEMPERATURE ZONES

POLISHING HEAD USING ZONE CONTROL

METHOD AND SYSTEM FOR CONTROLLING CHEMICAL MECHANICAL POLISHING BY...

Technique for electrochemically depositing an alloy having a chemic...

Method for forming a defined recess in a damascene structure using...

Method and system for controlling the chemical mechanical polishing...

Method of electroplating copper over a patterned dielectric layer t...

Retaining ring having reduced wear and contamination rate for a pol...

Method of selectively removing metal residues from a dielectric lay...

Method of reducing a defect level after chemically mechanically pol...

PREVENTION OF PRECIPITATION DEFECTS ON COPPER INTERCONNECTS DURING...

Apparatus and method for reducing oxidation of polished metal surfa...

System and method for reducing the chemical reactivity of water and...

Apparatus and method for electrochemical metal deposition

Method and system for improving the manufacturing of metal damascen...

Method and system for controlling the chemical mechanical polishing...

METHOD OF FORMING METAL LINES HAVING IMPROVED UNIFORMITY ON A SUBST...

Polishing head and apparatus with an improved pad conditioner for c...