Gerhard Fuerter

Person

Ellwangen, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Optical projection system
- Patent number 9,891,535
- Issue date Feb 13, 2018
- Carl Zeiss SMT GmbH
- Johannes Rau
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical projection system
- Patent number 9,557,653
- Issue date Jan 31, 2017
- Carl Zeiss SMT GmbH
- Johannes Rau
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical projection system
- Patent number 9,104,016
- Issue date Aug 11, 2015
- Carl Zeiss SMT GmbH
- Johannes Rau
- G02 - OPTICS
Information Patent Grant
Illumination system for a microlithgraphic exposure apparatus
- Patent number 8,873,151
- Issue date Oct 28, 2014
- Carl Zeiss SMT GmbH
- Alexander Sohmer
- G02 - OPTICS
Information Patent Grant
Optical projection system
- Patent number 8,300,210
- Issue date Oct 30, 2012
- Carl Zeiss SMT GmbH
- Johannes Rau
- G02 - OPTICS
Information Patent Grant
Symmetrical objective having four lens groups for microlithography
- Patent number 7,697,211
- Issue date Apr 13, 2010
- Carl Zeiss SMT AG
- David R. Shafer
- G02 - OPTICS
Information Patent Grant
Projection exposure system having a reflective reticle
- Patent number RE40743
- Issue date Jun 16, 2009
- Carl Zeiss SMT AG
- Gerhard Fuerter
- 359 - Optical: systems and elements
Information Patent Grant
Optical beam transformation system and illumination system comprisi...
- Patent number 7,511,886
- Issue date Mar 31, 2009
- Carl Zeiss SMT AG
- Joerg Schultz
- G02 - OPTICS
Information Patent Grant
Optical system, in particular illumination system, of a microlithog...
- Patent number 7,405,808
- Issue date Jul 29, 2008
- Carl Zeiss SMT AG
- Toralf Gruner
- G02 - OPTICS
Information Patent Grant
Projection objective for microlithography
- Patent number 7,271,876
- Issue date Sep 18, 2007
- Carl Zeiss SMT AG
- Wilhelm Ulrich
- G02 - OPTICS
Information Patent Grant
Spectacle lens having astigmatic power
- Patent number 4,613,217
- Issue date Sep 23, 1986
- Carl-Zeiss-Stiftung, Heidenheim/Brenz
- Gerhard Fuerter
- G02 - OPTICS

Patents Applicationslast 30 patents

Information Patent Application
Optical Projection System
- Publication number 20180259856
- Publication date Sep 13, 2018
- Carl Zeiss SMT GMBH
- Johannes Rau
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Optical Projection System
- Publication number 20170219929
- Publication date Aug 3, 2017
- Carl Zeiss SMT GMBH
- Johannes Rau
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL PROJECTION SYSTEM
- Publication number 20150323873
- Publication date Nov 12, 2015
- Carl Zeiss SMT GMBH
- Johannes Rau
- G02 - OPTICS
Information Patent Application
OPTICAL PROJECTION SYSTEM
- Publication number 20130044304
- Publication date Feb 21, 2013
- Carl Zeiss SMT GMBH
- Johannes Rau
- G02 - OPTICS
Information Patent Application
Optical Projection System
- Publication number 20090174874
- Publication date Jul 9, 2009
- Johannes Rau
- G02 - OPTICS
Information Patent Application
SYMMETRICAL OBJECTIVE HAVING FOUR LENS GROUPS FOR MICROLITHOGRAPHY
- Publication number 20090080086
- Publication date Mar 26, 2009
- Carl Zeiss SMT AG
- David R. Shafer
- G02 - OPTICS
Information Patent Application
PROJECTION OBJECTIVE FOR MICROLITHOGRAPHY
- Publication number 20080049320
- Publication date Feb 28, 2008
- Carl Zeiss SMT AG
- Wilhelm Ulrich
- G02 - OPTICS
Information Patent Application
Optical beam transformation system and illumination system comprisi...
- Publication number 20060146384
- Publication date Jul 6, 2006
- Carl Zeiss SMT AG
- Joerg Schultz
- G02 - OPTICS
Information Patent Application
Optical system, in particular illumination system, of a microlithog...
- Publication number 20050152046
- Publication date Jul 14, 2005
- Toralf Gruner
- G02 - OPTICS
Information Patent Application
Projection objective for microlithography
- Publication number 20050134826
- Publication date Jun 23, 2005
- Carl Zeiss SMT AG
- Wilhelm Ulrich
- G02 - OPTICS

Gerhard Fuerter

Person

Patents Grantslast 30 patents

Optical projection system

Optical projection system

Optical projection system

Illumination system for a microlithgraphic exposure apparatus

Optical projection system

Symmetrical objective having four lens groups for microlithography

Projection exposure system having a reflective reticle

Optical beam transformation system and illumination system comprisi...

Optical system, in particular illumination system, of a microlithog...

Projection objective for microlithography

Spectacle lens having astigmatic power

Patents Applicationslast 30 patents

Optical Projection System

Optical Projection System

OPTICAL PROJECTION SYSTEM

OPTICAL PROJECTION SYSTEM

Optical Projection System

SYMMETRICAL OBJECTIVE HAVING FOUR LENS GROUPS FOR MICROLITHOGRAPHY

PROJECTION OBJECTIVE FOR MICROLITHOGRAPHY

Optical beam transformation system and illumination system comprisi...

Optical system, in particular illumination system, of a microlithog...

Projection objective for microlithography