Gerhard Pohlers

Person

Needham, MA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Ion exchange resins, purification methods and methods of making ion...
- Patent number 10,821,433
- Issue date Nov 3, 2020
- Rohm and Haas Electronic Materials LLC
- Andrey Rudenko
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Photoresists comprising amide component
- Patent number 10,719,014
- Issue date Jul 21, 2020
- Rohm and Haas Electronic Materials LLC
- Cong Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresists comprising ionic compound
- Patent number 10,527,934
- Issue date Jan 7, 2020
- Rohm and Haas Electronic Materials LLC
- Gerhard Pohlers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Topcoat compositions containing fluorinated thermal acid generators
- Patent number 10,481,495
- Issue date Nov 19, 2019
- Rohm and Haas Electronic Materials LLC
- Irvinder Kaur
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Purification methods
- Patent number 10,370,320
- Issue date Aug 6, 2019
- Rohm and Haas Electronic Materials LLC
- Andrey Rudenko
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Photoresists and methods of use thereof
- Patent number 10,295,910
- Issue date May 21, 2019
- Rohm and Haas Electronic Materials LLC
- Gerhard Pohlers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Thermal acid generators and photoresist pattern trimming compositio...
- Patent number 10,241,407
- Issue date Mar 26, 2019
- Rohm and Haas Electronic Materials LLC
- Irvinder Kaur
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Topcoat compositions containing fluorinated thermal acid generators
- Patent number 10,241,411
- Issue date Mar 26, 2019
- Rohm and Haas Electronic Materials LLC
- Irvinder Kaur
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Photoresist pattern trimming methods
- Patent number 10,162,266
- Issue date Dec 25, 2018
- Rohm and Haas Electronic Materials LLC
- Gerhard Pohlers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Thermal acid generators and photoresist pattern trimming compositio...
- Patent number 10,007,179
- Issue date Jun 26, 2018
- Rohm and Haas Electronic Materials LLC
- Irvinder Kaur
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresists and methods for use thereof
- Patent number 9,665,001
- Issue date May 30, 2017
- Rohm and Haas Electronic Materials LLC
- Gerhard Pohlers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Ionic thermal acid generators for low temperature applications
- Patent number 9,541,834
- Issue date Jan 10, 2017
- Rohm and Haas Electronic Materials LLC
- Gerhard Pohlers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresists and methods for use thereof
- Patent number 9,502,254
- Issue date Nov 22, 2016
- Rohm and Haas Electronic Materials LLC
- Gerhard Pohlers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist comprising nitrogen-containing compound
- Patent number 9,475,763
- Issue date Oct 25, 2016
- Rohm and Haas Electronic Materials LLC
- Cong Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist pattern trimming compositions and methods
- Patent number 9,448,486
- Issue date Sep 20, 2016
- Rohm and Haas Electronic Materials LLC
- Cong Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Ion implantation methods
- Patent number 9,209,028
- Issue date Dec 8, 2015
- Rohm and Haas Electronic Materials LLC
- Cheng-Bai Xu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photoresist and coated substrate comprising same
- Patent number 9,012,128
- Issue date Apr 21, 2015
- Rohm and Haas Electronic Materials LLC
- Deyan Wang
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photoresist comprising nitrogen-containing compound
- Patent number 8,927,190
- Issue date Jan 6, 2015
- Rohm and Haas Electronic Materials LLC
- Cong Liu
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photoresists and methods for use thereof
- Patent number 8,815,754
- Issue date Aug 26, 2014
- Rohm and Haas Electronics Materials LLC
- Gerhard Pohlers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Surface active additive and photoresist composition comprising same
- Patent number 8,722,825
- Issue date May 13, 2014
- Rohm and Haas Electronic Materials LLC
- Deyan Wang
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
CONTAINERS WITH ACTIVE SURFACE AND METHODS OF FORMING SUCH CONTAINERS
- Publication number 20190382161
- Publication date Dec 19, 2019
- Rohm and Haas Electronic Materials L.L.C.
- Andrey Rudenko
- B65 - CONVEYING PACKING STORING HANDLING THIN OR FILAMENTARY MATERIAL
Information Patent Application
TOPCOAT COMPOSITIONS CONTAINING FLUORINATED THERMAL ACID GENERATORS
- Publication number 20190243246
- Publication date Aug 8, 2019
- Rohm and Haas Electronic Materials L.L.C.
- Irvinder Kaur
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PURIFICATION METHODS
- Publication number 20190202767
- Publication date Jul 4, 2019
- Rohm and Haas Electronic Materials L.L.C.
- Andrey RUDENKO
- C07 - ORGANIC CHEMISTRY
Information Patent Application
ION EXCHANGE RESINS, PURIFICATION METHODS AND METHODS OF MAKING ION...
- Publication number 20190126264
- Publication date May 2, 2019
- Rohm and Haas Electronic Materials L.L.C.
- Andrey Rudenko
- C07 - ORGANIC CHEMISTRY
Information Patent Application
TOPCOAT COMPOSITIONS CONTAINING FLUORINATED THERMAL ACID GENERATORS
- Publication number 20180118968
- Publication date May 3, 2018
- Rohm and Haas Electronic Materials L.L.C.
- Irvinder Kaur
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
THERMAL ACID GENERATORS AND PHOTORESIST PATTERN TRIMMING COMPOSITIO...
- Publication number 20170123313
- Publication date May 4, 2017
- Rohm and Haas Electronic Materials L.L.C.
- Irvinder Kaur
- C07 - ORGANIC CHEMISTRY
Information Patent Application
THERMAL ACID GENERATORS AND PHOTORESIST PATTERN TRIMMING COMPOSITIO...
- Publication number 20170123314
- Publication date May 4, 2017
- Rohm and Haas Electronic Materials L.L.C.
- Irvinder Kaur
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PHOTORESIST COMPRISING NITROGEN-CONTAINING COMPOUND
- Publication number 20150353482
- Publication date Dec 10, 2015
- Rohm and Haas Electronic Materials L.L.C.
- Cong Liu
- C07 - ORGANIC CHEMISTRY
Information Patent Application
ION IMPLANTATION METHODS
- Publication number 20150214056
- Publication date Jul 30, 2015
- Rohm and Haas Electronic Materials L.L.C.
- Cheng-Bai XU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IONIC THERMAL ACID GENERATORS FOR LOW TEMPERATURE APPLICATIONS
- Publication number 20150212414
- Publication date Jul 30, 2015
- Rohm and Haas Electronic Materials L.L.C.
- Gerhard POHLERS
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PHOTORESIST PATTERN TRIMMING COMPOSITIONS AND METHODS
- Publication number 20150185620
- Publication date Jul 2, 2015
- Rohm and Haas Electronic Materials L.L.C.
- Cong LIU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST PATTERN TRIMMING METHODS
- Publication number 20140186772
- Publication date Jul 3, 2014
- Gerhard POHLERS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESISTS COMPRISING IONIC COMPOUND
- Publication number 20140120470
- Publication date May 1, 2014
- Rohm and Haas Electronic Materials L.L.C.
- Gerhard POHLERS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
THERMAL ACID GENERATORS FOR USE IN PHOTORESIST
- Publication number 20140120469
- Publication date May 1, 2014
- Rohm and Haas Electronic Materials L.L.C.
- Gregory P. PROKOPOWICZ
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST AND COATED SUBSTRATE COMPRISING SAME
- Publication number 20140065540
- Publication date Mar 6, 2014
- ROHM AND HAAS ELECTRONIC MATERIALS
- Deyan Wang
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTORESISTS COMPRISING AMIDE COMPONENT
- Publication number 20130344439
- Publication date Dec 26, 2013
- Cong LIU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESISTS COMPRISING MULTI-AMIDE COMPONENT
- Publication number 20130244178
- Publication date Sep 19, 2013
- Rohm and Haas Electronic Materials L.L.C.
- Gregory P. Prokopowicz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SURFACE ACTIVE ADDITIVE AND PHOTORESIST COMPOSITION COMPRISING SAME
- Publication number 20130137035
- Publication date May 30, 2013
- DOW GLOBAL TECHNOLOGIES LLC
- Deyan Wang
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POLYMER COMPOSITION AND PHOTORESIST COMPRISING THE POLYMER
- Publication number 20120301823
- Publication date Nov 29, 2012
- DOW GLOBAL TECHNOLOGIES LLC
- Gregory P. Prokopowicz
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTORESISTS COMPRISING MULTI-AMIDE COMPONENT
- Publication number 20120077120
- Publication date Mar 29, 2012
- Rohm and Haas Electronic Materials L.L.C.
- Gregory P. PROKOPOWICZ
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESISTS AND METHODS FOR USE THEREOF
- Publication number 20110254140
- Publication date Oct 20, 2011
- Rohm and Haas Electronic Materials L.L.C.
- Gerhard POHLERS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESISTS AND METHODS OF USE THEREOF
- Publication number 20110256481
- Publication date Oct 20, 2011
- Rohm and Haas Electronic Materials L.L.C.
- Gerhard POHLERS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESISTS AND METHODS FOR USE THEREOF
- Publication number 20110254133
- Publication date Oct 20, 2011
- Rohm and Haas Electronic Materials L.L.C.
- Gerhard POHLERS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST COMPRISING NITROGEN-CONTAINING COMPOUND
- Publication number 20110223535
- Publication date Sep 15, 2011
- Rohm and Haas Electronic Materials L.L.C.
- Cong Liu
- C07 - ORGANIC CHEMISTRY

Gerhard Pohlers

Person

Patents Grantslast 30 patents

Ion exchange resins, purification methods and methods of making ion...

Photoresists comprising amide component

Photoresists comprising ionic compound

Topcoat compositions containing fluorinated thermal acid generators

Purification methods

Photoresists and methods of use thereof

Thermal acid generators and photoresist pattern trimming compositio...

Topcoat compositions containing fluorinated thermal acid generators

Photoresist pattern trimming methods

Thermal acid generators and photoresist pattern trimming compositio...

Photoresists and methods for use thereof

Ionic thermal acid generators for low temperature applications

Photoresists and methods for use thereof

Photoresist comprising nitrogen-containing compound

Photoresist pattern trimming compositions and methods

Ion implantation methods

Photoresist and coated substrate comprising same

Photoresist comprising nitrogen-containing compound

Photoresists and methods for use thereof

Surface active additive and photoresist composition comprising same

Patents Applicationslast 30 patents

CONTAINERS WITH ACTIVE SURFACE AND METHODS OF FORMING SUCH CONTAINERS

TOPCOAT COMPOSITIONS CONTAINING FLUORINATED THERMAL ACID GENERATORS

PURIFICATION METHODS

ION EXCHANGE RESINS, PURIFICATION METHODS AND METHODS OF MAKING ION...

TOPCOAT COMPOSITIONS CONTAINING FLUORINATED THERMAL ACID GENERATORS

THERMAL ACID GENERATORS AND PHOTORESIST PATTERN TRIMMING COMPOSITIO...

THERMAL ACID GENERATORS AND PHOTORESIST PATTERN TRIMMING COMPOSITIO...

PHOTORESIST COMPRISING NITROGEN-CONTAINING COMPOUND

ION IMPLANTATION METHODS

IONIC THERMAL ACID GENERATORS FOR LOW TEMPERATURE APPLICATIONS

PHOTORESIST PATTERN TRIMMING COMPOSITIONS AND METHODS

PHOTORESIST PATTERN TRIMMING METHODS

PHOTORESISTS COMPRISING IONIC COMPOUND

THERMAL ACID GENERATORS FOR USE IN PHOTORESIST

PHOTORESIST AND COATED SUBSTRATE COMPRISING SAME

PHOTORESISTS COMPRISING AMIDE COMPONENT

PHOTORESISTS COMPRISING MULTI-AMIDE COMPONENT

SURFACE ACTIVE ADDITIVE AND PHOTORESIST COMPOSITION COMPRISING SAME

POLYMER COMPOSITION AND PHOTORESIST COMPRISING THE POLYMER

PHOTORESISTS COMPRISING MULTI-AMIDE COMPONENT

PHOTORESISTS AND METHODS FOR USE THEREOF

PHOTORESISTS AND METHODS OF USE THEREOF

PHOTORESISTS AND METHODS FOR USE THEREOF

PHOTORESIST COMPRISING NITROGEN-CONTAINING COMPOUND