Gerrit Johannes Nijmeijer

Person

Larchmont, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Wafer alignment using form birefringence of targets or product
- Patent number 11,971,665
- Issue date Apr 30, 2024
- ASML Holding N.V.
- Joshua Adams
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alignment mark for two-dimensional alignment in an alignment system
- Patent number 11,156,928
- Issue date Oct 26, 2021
- ASML Holding N.V.
- Gerrit Johannes Nijmeijer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus with a sensor and a method of performing target measurement
- Patent number 11,054,751
- Issue date Jul 6, 2021
- ASML Holding N.V.
- Hong Ye
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate placement in immersion lithography
- Patent number 10,345,711
- Issue date Jul 9, 2019
- ASML Netherlands B.V.
- Christiaan Alexander Hoogendam
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate placement in immersion lithography
- Patent number 9,740,106
- Issue date Aug 22, 2017
- ASML Netherlands B.V.
- Christiaan Alexander Hoogendam
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mark position measuring apparatus and method, lithographic apparatu...
- Patent number 9,551,939
- Issue date Jan 24, 2017
- ASML Netherlands B.V.
- Simon Gijsbert Josephus Mathijssen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Position measuring apparatus, position measuring method, lithograph...
- Patent number 9,506,743
- Issue date Nov 29, 2016
- ASML Netherlands B.V.
- Arie Jeffrey Den Boef
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate placement in immersion lithography
- Patent number 9,182,222
- Issue date Nov 10, 2015
- ASML Netherlands B.V.
- Christiaan Alexander Hoogendam
- G01 - MEASURING TESTING
Information Patent Grant
Substrate placement in immersion lithography
- Patent number 8,441,617
- Issue date May 14, 2013
- ASML Netherlands B.V.
- Christiaan Alexander Hoogendam
- G01 - MEASURING TESTING
Information Patent Grant
Substrate placement in immersion lithography
- Patent number 8,077,291
- Issue date Dec 13, 2011
- ASML Netherlands B.V.
- Christiaan Alexander Hoogendam
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
WAFER ALIGNMENT USING FORM BIREFRINGENCE OF TARGETS OR PRODUCT
- Publication number 20220137523
- Publication date May 5, 2022
- ASML Holding N.V.
- Joshua ADAMS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Alignment Mark For Two-Dimensional Alignment In An Alignment System
- Publication number 20200124995
- Publication date Apr 23, 2020
- ASML Holding N.V.
- Gerrit Johannes NIJMEIJER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
AN APPARATUS WITH A SENSOR AND A METHOD OF PERFORMING TARGET MEASUR...
- Publication number 20180299793
- Publication date Oct 18, 2018
- ASML Holding N.V.
- Hong YE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE PLACEMENT IN IMMERSION LITHOGRAPHY
- Publication number 20180067401
- Publication date Mar 8, 2018
- ASML NETHERLANDS B.V.
- Christiaan Alexander Hoogendam
- G01 - MEASURING TESTING
Information Patent Application
SUBSTRATE PLACEMENT IN IMMERSION LITHOGRAPHY
- Publication number 20160054665
- Publication date Feb 25, 2016
- ASML NETHERLANDS B.V.
- Christiaan Alexander Hoogendam
- G01 - MEASURING TESTING
Information Patent Application
MARK POSITION MEASURING APPARATUS AND METHOD, LITHOGRAPHIC APPARATU...
- Publication number 20150234290
- Publication date Aug 20, 2015
- ASML NETHERLANDS B.V.
- Simon Gijsbert Josephus Mathijssen
- G01 - MEASURING TESTING
Information Patent Application
POSITION MEASURING APPARATUS, POSITION MEASURING METHOD, LITHOGRAPH...
- Publication number 20150219438
- Publication date Aug 6, 2015
- ASML NETHERLANDS B.V.
- Arie Jeffrey Den Boef
- G01 - MEASURING TESTING
Information Patent Application
SUBSTRATE PLACEMENT IN IMMERSION LITHOGRAPHY
- Publication number 20130182231
- Publication date Jul 18, 2013
- ASML NETHERLANDS B.V.
- Christiaan Alexander Hoogendam
- G01 - MEASURING TESTING
Information Patent Application
SUBSTRATE PLACEMENT IN IMMERSION LITHOGRAPHY
- Publication number 20120050740
- Publication date Mar 1, 2012
- ASML NETHERLANDS B.V.
- CHRISTIAAN ALEXANDER HOOGENDAM
- G01 - MEASURING TESTING
Information Patent Application
Substrate placement in immersion lithography
- Publication number 20080106723
- Publication date May 8, 2008
- ASML NETHERLANDS B.V.
- Christiaan Alexander Hoogendam
- G01 - MEASURING TESTING

Gerrit Johannes Nijmeijer

Person

Patents Grantslast 30 patents

Wafer alignment using form birefringence of targets or product

Alignment mark for two-dimensional alignment in an alignment system

Apparatus with a sensor and a method of performing target measurement

Substrate placement in immersion lithography

Substrate placement in immersion lithography

Mark position measuring apparatus and method, lithographic apparatu...

Position measuring apparatus, position measuring method, lithograph...

Substrate placement in immersion lithography

Substrate placement in immersion lithography

Substrate placement in immersion lithography

Patents Applicationslast 30 patents

WAFER ALIGNMENT USING FORM BIREFRINGENCE OF TARGETS OR PRODUCT

Alignment Mark For Two-Dimensional Alignment In An Alignment System

AN APPARATUS WITH A SENSOR AND A METHOD OF PERFORMING TARGET MEASUR...

SUBSTRATE PLACEMENT IN IMMERSION LITHOGRAPHY

SUBSTRATE PLACEMENT IN IMMERSION LITHOGRAPHY

MARK POSITION MEASURING APPARATUS AND METHOD, LITHOGRAPHIC APPARATU...

POSITION MEASURING APPARATUS, POSITION MEASURING METHOD, LITHOGRAPH...

SUBSTRATE PLACEMENT IN IMMERSION LITHOGRAPHY

SUBSTRATE PLACEMENT IN IMMERSION LITHOGRAPHY

Substrate placement in immersion lithography