Gerrit Johannes Nijmeijer

Person

Eindhoven, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Lithographic apparatus, method of exposing a substrate, method of m...
- Patent number 7,835,017
- Issue date Nov 16, 2010
- ASML Netherlands B.V.
- Theodorus Marinus Modderman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate placement in immersion lithography
- Patent number 7,352,440
- Issue date Apr 1, 2008
- ASML Netherlands B.V.
- Christiaan Alexander Hoogendam
- G01 - MEASURING TESTING
Information Patent Grant
System and method of measurement, system and method of alignment, l...
- Patent number 7,280,228
- Issue date Oct 9, 2007
- ASML Netherlands B.V.
- Gerrit Johannes Nijmeijer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Off-axis levelling in lithographic projection apparatus
- Patent number 7,206,058
- Issue date Apr 17, 2007
- ASML Netherlands B.V.
- Theodorus Marinus Modderman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Off-axis levelling in lithographic projection apparatus
- Patent number 7,202,938
- Issue date Apr 10, 2007
- ASML Netherlands B.V.
- Theodorus M. Modderman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic projection apparatus using catoptrics in an optical se...
- Patent number 7,116,401
- Issue date Oct 3, 2006
- ASML Netherlands B.V.
- Gerrit Johannes Nijmeijer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Off-axis leveling in lithographic projection apparatus
- Patent number 7,019,815
- Issue date Mar 28, 2006
- ASML Netherlands B.V.
- Johannes C. M. Jasper
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus, device manufacturing method, and device man...
- Patent number 6,987,555
- Issue date Jan 17, 2006
- ASML Netherlands B.V.
- Paulus Antonius Andreas Teunissen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus, method of calibration, calibration plate, d...
- Patent number 6,955,074
- Issue date Oct 18, 2005
- ASML Netherlands, B.V.
- Leon Martin Levasier
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Off-axis leveling in lithographic projection apparatus
- Patent number 6,924,884
- Issue date Aug 2, 2005
- ASML Netherlands B.V.
- Marcus Emile Joannes Boonman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Off-axis levelling in lithographic projection apparatus
- Patent number 6,882,405
- Issue date Apr 19, 2005
- ASML Netherlands B.V.
- Johannes Christiaan Maria Jasper
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Off-axis levelling in lithographic projection apparatus
- Patent number 6,674,510
- Issue date Jan 6, 2004
- ASML Netherlands B.V.
- Johannes C. M. Jasper
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Lithographic Apparatus, Method of Exposing a Substrate, Method of M...
- Publication number 20070252963
- Publication date Nov 1, 2007
- ASML NETHERLANDS B.V.
- Theodorus Marinus Modderman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Off-axis levelling in lithographic projection apparatus
- Publication number 20060176459
- Publication date Aug 10, 2006
- ASML NETHERLANDS B.V.
- Theodorus Marinus Modderman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Substrate placement in immersion lithography
- Publication number 20060126038
- Publication date Jun 15, 2006
- ASML NETHERLANDS B.V.
- Christiaan Alexander Hoogendam
- G01 - MEASURING TESTING
Information Patent Application
Off-axis levelling in lithographic projection apparatus
- Publication number 20050157281
- Publication date Jul 21, 2005
- ASML NETHERLANDS B.V.
- Johannes C.M. Jasper
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus, method of calibration, calibration plate, d...
- Publication number 20050138988
- Publication date Jun 30, 2005
- ASML NETHERLANDS B.V.
- Leon Martin Levasier
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus, method of exposing a substrate, method of m...
- Publication number 20050134816
- Publication date Jun 23, 2005
- ASML NETHERLANDS B.V.
- Theodorus Marinus Modderman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Off-axis levelling in lithographic projection apparatus
- Publication number 20050088638
- Publication date Apr 28, 2005
- ASML NETHERLANDS B.V.
- Johannes C.M. Jasper
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
System and method of measurement, system and method of alignment, l...
- Publication number 20050046845
- Publication date Mar 3, 2005
- ASML NETHERLANDS B.V.
- Gerrit Johannes Nijmeijer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus, device manufacturing method, and device man...
- Publication number 20050030507
- Publication date Feb 10, 2005
- ASML NETHERLANDS B.V.
- Paulus Antonius Andreas Teunissen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic projection apparatus using catoptrics in an optical se...
- Publication number 20040189964
- Publication date Sep 30, 2004
- ASML NETHERLANDS B.V.
- Gerrit Johannes Nijmeijer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Off-axis levelling in lithographic projection apparatus
- Publication number 20040130691
- Publication date Jul 8, 2004
- ASML NETHERLANDS B.V.
- Marcus Emile Joannes Boonman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Off-axis levelling in lithographic projection apparatus
- Publication number 20040080737
- Publication date Apr 29, 2004
- ASML NETHERLANDS B.V.
- Johannes Christiaan Maria Jasper
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Gerrit Johannes Nijmeijer

Person

Patents Grantslast 30 patents

Lithographic apparatus, method of exposing a substrate, method of m...

Substrate placement in immersion lithography

System and method of measurement, system and method of alignment, l...

Off-axis levelling in lithographic projection apparatus

Off-axis levelling in lithographic projection apparatus

Lithographic projection apparatus using catoptrics in an optical se...

Off-axis leveling in lithographic projection apparatus

Lithographic apparatus, device manufacturing method, and device man...

Lithographic apparatus, method of calibration, calibration plate, d...

Off-axis leveling in lithographic projection apparatus

Off-axis levelling in lithographic projection apparatus

Off-axis levelling in lithographic projection apparatus

Patents Applicationslast 30 patents

Lithographic Apparatus, Method of Exposing a Substrate, Method of M...

Off-axis levelling in lithographic projection apparatus

Substrate placement in immersion lithography

Off-axis levelling in lithographic projection apparatus

Lithographic apparatus, method of calibration, calibration plate, d...

Lithographic apparatus, method of exposing a substrate, method of m...

Off-axis levelling in lithographic projection apparatus

System and method of measurement, system and method of alignment, l...

Lithographic apparatus, device manufacturing method, and device man...

Lithographic projection apparatus using catoptrics in an optical se...

Off-axis levelling in lithographic projection apparatus

Off-axis levelling in lithographic projection apparatus