Gert R.M. Moyaerts

Person

Phoenix, AZ, US

People

Patents Grantslast 30 patents

Information Patent Grant
Composition for advanced node front-and-back-end of line chemical m...
- Patent number 9,190,286
- Issue date Nov 17, 2015
- Fujifilm Planar Solutions, LLC
- Bin Hu
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Composition for advanced node front-and back-end of line chemical m...
- Patent number 8,961,815
- Issue date Feb 24, 2015
- Planar Solutions, LLC
- Bin Hu
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Ultrapure colloidal silica for use in chemical mechanical polishing...
- Patent number 8,779,011
- Issue date Jul 15, 2014
- Fujifilm Planar Solutions, LLC
- Deepak Mahulikar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ultrapure colloidal silica for use in chemical mechanical polishing...
- Patent number 8,211,193
- Issue date Jul 3, 2012
- Fujifilm Planar Solutions, LLC
- Deepak Mahulikar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
COMPOSITION FOR ADVANCED NODE FRONT-AND-BACK-END OF LINE CHEMICAL M...
- Publication number 20150132957
- Publication date May 14, 2015
- FUJIFILM PLANAR SOLUTIONS, LLC
- Bin Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ULTRAPURE COLLOIDAL SILICA FOR USE IN CHEMICAL MECHANICAL POLISHING...
- Publication number 20120145950
- Publication date Jun 14, 2012
- Planar Solutions, LLC
- Deepak Mahulikar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
COMPOSITION FOR ADVANCED NODE FRONT-AND BACK-END OF LINE CHEMICAL M...
- Publication number 20120003901
- Publication date Jan 5, 2012
- Planar Solutions, LLC
- Bin Hu
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Ultrapure colloidal silica for use in chemical mechanical polishing...
- Publication number 20070254964
- Publication date Nov 1, 2007
- Planar Solutions, LLC
- Deepak Mahulikar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Ultrapure colloidal silica for use in chemical mechanical polishing...
- Publication number 20070075292
- Publication date Apr 5, 2007
- Planar Solutions, LLC
- Deepak Mahulikar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Colloidal silica based chemical mechanical polishing slurry
- Publication number 20060124593
- Publication date Jun 15, 2006
- Planar Solutions, LLC
- Gert R.M. Moyaerts
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Gert R.M. Moyaerts

Person

Patents Grantslast 30 patents

Composition for advanced node front-and-back-end of line chemical m...

Composition for advanced node front-and back-end of line chemical m...

Ultrapure colloidal silica for use in chemical mechanical polishing...

Ultrapure colloidal silica for use in chemical mechanical polishing...

Patents Applicationslast 30 patents

COMPOSITION FOR ADVANCED NODE FRONT-AND-BACK-END OF LINE CHEMICAL M...

ULTRAPURE COLLOIDAL SILICA FOR USE IN CHEMICAL MECHANICAL POLISHING...

COMPOSITION FOR ADVANCED NODE FRONT-AND BACK-END OF LINE CHEMICAL M...

Ultrapure colloidal silica for use in chemical mechanical polishing...

Ultrapure colloidal silica for use in chemical mechanical polishing...

Colloidal silica based chemical mechanical polishing slurry