Gertrud Falk

Person

Rottenbach, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Process for increasing the etch resistance and for reducing the hol...
- Patent number 7,018,784
- Issue date Mar 28, 2006
- Infineon Technologies AG
- Jörg Rottstegge
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Negative resist process with simultaneous development and aromatiza...
- Patent number 6,946,236
- Issue date Sep 20, 2005
- Infineon Technologies AG
- Jörg Rottstegge
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process for modifying resist structures and resist films from the a...
- Patent number 6,899,997
- Issue date May 31, 2005
- Infineon Technologies AG
- Siew Siew Yip
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process for sidewall amplification of resist structures and for the...
- Patent number 6,893,972
- Issue date May 17, 2005
- Infineon Technologies AG
- Jörg Rottstegge
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photoresist compound and method for structuring a photoresist layer
- Patent number 6,841,332
- Issue date Jan 11, 2005
- Infineon Technology AG
- Gertrud Falk
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Negative resist process with simultaneous development and silylation
- Patent number 6,770,423
- Issue date Aug 3, 2004
- Infineon Technologies AG
- Jörg Rottstegge
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photolithographic structure generation process
- Patent number 6,042,993
- Issue date Mar 28, 2000
- Siemens Aktiengesellschaft
- Rainer Leuschner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Spectrometry plasma burner
- Patent number 4,551,609
- Issue date Nov 5, 1985
- Siemens Aktiengesellschaft
- Gertrud Falk
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
Process for increasing the etch resistance and for reducing the hol...
- Publication number 20040043330
- Publication date Mar 4, 2004
- Jorg Rottstegge
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Process for modifying resist structures and resist films from the a...
- Publication number 20030211422
- Publication date Nov 13, 2003
- Siew Siew Yip
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Silylating process for photoresists in the UV region
- Publication number 20030096194
- Publication date May 22, 2003
- Jorg Rottstegge
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Process for sidewall amplification of resist structures and for the...
- Publication number 20030091936
- Publication date May 15, 2003
- Jorg Rottstegge
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Negative resist process with simultaneous development and silylation
- Publication number 20030082488
- Publication date May 1, 2003
- Jorg Rottstegge
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Negative resist process with simultaneous development and aromatiza...
- Publication number 20030073037
- Publication date Apr 17, 2003
- Jorg Rottstegge
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photoresist compound and method for structuring a photoresist layer
- Publication number 20030022111
- Publication date Jan 30, 2003
- Gertrud Falk
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Gertrud Falk

Person

Patents Grantslast 30 patents

Process for increasing the etch resistance and for reducing the hol...

Negative resist process with simultaneous development and aromatiza...

Process for modifying resist structures and resist films from the a...

Process for sidewall amplification of resist structures and for the...

Photoresist compound and method for structuring a photoresist layer

Negative resist process with simultaneous development and silylation

Photolithographic structure generation process

Spectrometry plasma burner

Patents Applicationslast 30 patents

Process for increasing the etch resistance and for reducing the hol...

Process for modifying resist structures and resist films from the a...

Silylating process for photoresists in the UV region

Process for sidewall amplification of resist structures and for the...

Negative resist process with simultaneous development and silylation

Negative resist process with simultaneous development and aromatiza...

Photoresist compound and method for structuring a photoresist layer