Gi-Sung Yeo

Person

Seoul, KR

People

Patents Grantslast 30 patents

Information Patent Grant
Semiconductor device having sufficient process margin and method of...
- Patent number 9,673,195
- Issue date Jun 6, 2017
- Samsung Electronics Co., Ltd.
- Man-Hyoung Ryoo
- G11 - INFORMATION STORAGE
Information Patent Grant
Method of forming a hard mask and method of forming a fine pattern...
- Patent number 8,278,221
- Issue date Oct 2, 2012
- Samsung Electronics Co., Ltd.
- Cha-won Koh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device having sufficient process margin and method of...
- Patent number 8,193,047
- Issue date Jun 5, 2012
- Samsung Electronics Co., Ltd.
- Man-Hyoung Ryoo
- G11 - INFORMATION STORAGE
Information Patent Grant
Method of forming fine patterns of semiconductor device
- Patent number 8,026,044
- Issue date Sep 27, 2011
- Samsung Electronics Co., Ltd.
- Doo-youl Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor memory devices including offset bit lines
- Patent number 8,013,374
- Issue date Sep 6, 2011
- Samsung Electronics Co., Ltd.
- Doo-Hoon Goo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor memory devices including diagonal bit lines
- Patent number 8,013,375
- Issue date Sep 6, 2011
- Samsung Electronics Co., Ltd.
- Duo-Hoon Goo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming a hard mask and method of forming a fine pattern...
- Patent number 8,003,543
- Issue date Aug 23, 2011
- Samsung Electronics Co., Ltd.
- Cha-won Koh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing a mask
- Patent number 7,873,935
- Issue date Jan 18, 2011
- Samsung Electronics Co., Ltd.
- Sung-gon Jung
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for forming patterns of semiconductor device
- Patent number 7,862,988
- Issue date Jan 4, 2011
- Samsung Electronics Co., Ltd.
- Cha-Won Koh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of forming pattern
- Patent number 7,842,451
- Issue date Nov 30, 2010
- Samsung Electronics Co., Ltd.
- Cha-Won Koh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor devices having Fin-type active areas and methods of m...
- Patent number 7,795,099
- Issue date Sep 14, 2010
- Samsung Electronics Co., Ltd.
- Hyun-jae Kang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Flash memory device using double patterning technology and method o...
- Patent number 7,787,301
- Issue date Aug 31, 2010
- Samsung Electronics Co., Ltd.
- Doo-youl Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming a hard mask and method of forming a fine pattern...
- Patent number 7,732,341
- Issue date Jun 8, 2010
- Samsung Electronics Co., Ltd.
- Cha-won Koh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
E-beam lithography system for synchronously irradiating a plurality...
- Patent number 7,723,702
- Issue date May 25, 2010
- Samsung Electronics Co., Ltd.
- Je-bum Yoon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming fine metal patterns for a semiconductor device us...
- Patent number 7,687,369
- Issue date Mar 30, 2010
- Samsung Electronics Co., Ltd.
- Cha-won Koh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming a fine pattern of a semiconductor device using a...
- Patent number 7,670,761
- Issue date Mar 2, 2010
- Samsung Electronics Co., Ltd.
- Doo-youl Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-exposure semiconductor fabrication mask sets and methods of f...
- Patent number 7,604,907
- Issue date Oct 20, 2009
- Samsung Electronics Co., Ltd.
- Doo-Youl Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor device having overlay measurement mark and method of...
- Patent number 7,582,899
- Issue date Sep 1, 2009
- Samsung Electronics Co., Ltd.
- Cha-Won Koh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming pattern
- Patent number 7,575,855
- Issue date Aug 18, 2009
- Samsung Electronics Co., Ltd.
- Cha-Won Koh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of performing a photolithography process for forming asymme...
- Patent number 7,550,383
- Issue date Jun 23, 2009
- Samsung Electronics Co., Ltd.
- Joon-Soo Park
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor memory devices including offset active regions
- Patent number 7,547,936
- Issue date Jun 16, 2009
- Samsung Electronics Co., Ltd.
- Doo-Hoon Goo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of fabricating a semiconductor device
- Patent number 7,540,970
- Issue date Jun 2, 2009
- Samsung Electronics Co., Ltd.
- Cha-Won Koh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing mask
- Patent number 7,539,970
- Issue date May 26, 2009
- Samsung Electronics Co., Ltd.
- Sung-Gon Jung
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Multiple exposure apparatus and multiple exposure method using the...
- Patent number 7,518,704
- Issue date Apr 14, 2009
- Samsung Electronics Co., Ltd.
- Sang-jin Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of forming a mask structure and method of forming a minute p...
- Patent number 7,452,825
- Issue date Nov 18, 2008
- Samsung Electronics Co., Ltd.
- Doo-Youl Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor memory device having high electrical performance and...
- Patent number 7,375,390
- Issue date May 20, 2008
- Samsung Electronics Co., Ltd.
- Jung-Hyeon Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming trench in semiconductor device
- Patent number 7,259,065
- Issue date Aug 21, 2007
- Samsung Electronics Co., Ltd.
- Doo-hoon Goo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
DRAM devices having an increased density layout
- Patent number 7,221,014
- Issue date May 22, 2007
- Samsung Electronics Co., Ltd.
- Doo-hoon Goo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device having sufficient process margin and method of...
- Patent number 7,221,031
- Issue date May 22, 2007
- Samsung Electronics Co., Ltd.
- Man-Hyoung Ryoo
- G11 - INFORMATION STORAGE
Information Patent Grant
Semiconductor memory device having high electrical performance and...
- Patent number 7,176,512
- Issue date Feb 13, 2007
- Samsung Electronics Co., Ltd.
- Jung-Hyeon Lee
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SEMICONDUCTOR DEVICE HAVING SUFFICIENT PROCESS MARGIN AND METHOD OF...
- Publication number 20140231925
- Publication date Aug 21, 2014
- Man-Hyoung RYOO
- G11 - INFORMATION STORAGE
Information Patent Application
METHOD OF FORMING A HARD MASK AND METHOD OF FORMING A FINE PATTERN...
- Publication number 20110269294
- Publication date Nov 3, 2011
- Samsung Electronics Co., Ltd.
- Cha-won Koh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device having sufficient process margin and method of...
- Publication number 20110156159
- Publication date Jun 30, 2011
- Man-Hyoung Ryoo
- G11 - INFORMATION STORAGE
Information Patent Application
Flash Memory Device Using Double Patterning Technology and Method o...
- Publication number 20100290285
- Publication date Nov 18, 2010
- Doo-youl Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING A HARD MASK AND METHOD OF FORMING A FINE PATTERN...
- Publication number 20100197139
- Publication date Aug 5, 2010
- Samsung Electronics Co., Ltd.
- Cha-won Koh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device having sufficient process margin and method of...
- Publication number 20100190303
- Publication date Jul 29, 2010
- Man-Hyoung Ryoo
- G11 - INFORMATION STORAGE
Information Patent Application
METHOD OF FORMING PATTERN
- Publication number 20090291561
- Publication date Nov 26, 2009
- Cha-Won Koh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Semiconductor Memory Devices Including Offset Bit Lines
- Publication number 20090218609
- Publication date Sep 3, 2009
- SAMSUNG ELECTRONICS CO., LTD.
- Doo-Hoon Goo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor Memory Devices Including Extended Memory Elements
- Publication number 20090218654
- Publication date Sep 3, 2009
- SAMSUNG ELECTRONICS CO., LTD.
- Don-Hoon Goo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor Memory Devices Including Diagonal Bit Lines
- Publication number 20090218610
- Publication date Sep 3, 2009
- SAMSUNG ELECTRONICS CO., LTD.
- Don-Hoon Goo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of forming a fine pattern of a semiconductor device using a...
- Publication number 20080280381
- Publication date Nov 13, 2008
- Samsung Electronics Co., Ltd.
- Doo-youl Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF FORMING FINE PATTERNS OF SEMICONDUCTOR DEVICE
- Publication number 20080206686
- Publication date Aug 28, 2008
- Samsung Electronics Co., Ltd.
- Doo-youl LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of forming fine metal patterns for a semiconductor device us...
- Publication number 20080200026
- Publication date Aug 21, 2008
- Cha-won Koh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHODS FOR CONTROLLING ITS PATTERNS
- Publication number 20080169862
- Publication date Jul 17, 2008
- Samsung Electronics Co., Ltd.
- Joon-Soo PARK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor devices having Fin-type active areas and methods of m...
- Publication number 20080105931
- Publication date May 8, 2008
- SAMSUNG ELECTRONICS CO., LTD.
- Hyun-jae Kang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of manufacturing mask
- Publication number 20080097729
- Publication date Apr 24, 2008
- SAMSUNG ELECTRONICS CO., LTD.
- Sung-Gon Jung
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of forming a hard mask and method of forming a fine pattern...
- Publication number 20080090419
- Publication date Apr 17, 2008
- Cha-won Koh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods of Forming Fine Patterns In Integrated Circuits Using Atomi...
- Publication number 20080076070
- Publication date Mar 27, 2008
- SAMSUNG ELECTRONICS CO., LTD.
- Cha-won Koh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Flash memory device using double patterning technology and method o...
- Publication number 20080067550
- Publication date Mar 20, 2008
- SAMSUNG ELECTRONICS CO., LTD.
- Doo-youl Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of forming a mask structure and method of forming a minute p...
- Publication number 20080057610
- Publication date Mar 6, 2008
- SAMSUNG ELECTRONICS CO., LTD.
- Doo-Youl Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING A MASK
- Publication number 20080010628
- Publication date Jan 10, 2008
- Sung-gon Jung
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Semiconductor device having vertical channel transistor
- Publication number 20070284623
- Publication date Dec 13, 2007
- Sang-Jin Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of fabricating semiconductor device
- Publication number 20070197014
- Publication date Aug 23, 2007
- Samsung Electronics Co., Ltd.
- Jin-ho Jeon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE HAVING SUFFICIENT PROCESS MARGIN AND METHOD OF...
- Publication number 20070190812
- Publication date Aug 16, 2007
- Samsung Electronics Co., Ltd.
- Man-Hyoung RYOO
- G11 - INFORMATION STORAGE
Information Patent Application
E-beam lithography system for synchronously irradiating a plurality...
- Publication number 20070181828
- Publication date Aug 9, 2007
- SAMSUNG ELECTRONICS CO., LTD.
- Je-bum Yoon
- B82 - NANO-TECHNOLOGY
Information Patent Application
SEMICONDUCTOR MEMORY DEVICE HAVING HIGH ELECTRICAL PERFORMANCE AND...
- Publication number 20070108491
- Publication date May 17, 2007
- Jung-Hyeon Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for forming patterns of semiconductor device
- Publication number 20070077524
- Publication date Apr 5, 2007
- SAMSUNG ELECTRONICS CO., LTD.
- Cha-Won Koh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and system for measuring overlay of semiconductor device
- Publication number 20070064232
- Publication date Mar 22, 2007
- SAMSUNG ELECTRONICS CO., LTD.
- Duck-Sun Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Methods of fabricating a semiconductor device
- Publication number 20070020565
- Publication date Jan 25, 2007
- SAMSUNG ELECTRONICS CO., LTD.
- Cha-Won Koh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Multiple exposure apparatus and multiple exposure method using the...
- Publication number 20060192933
- Publication date Aug 31, 2006
- Sang-jin Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Gi-Sung Yeo

Person

Patents Grantslast 30 patents

Semiconductor device having sufficient process margin and method of...

Method of forming a hard mask and method of forming a fine pattern...

Semiconductor device having sufficient process margin and method of...

Method of forming fine patterns of semiconductor device

Semiconductor memory devices including offset bit lines

Semiconductor memory devices including diagonal bit lines

Method of forming a hard mask and method of forming a fine pattern...

Method of manufacturing a mask

Method for forming patterns of semiconductor device

Method of forming pattern

Semiconductor devices having Fin-type active areas and methods of m...

Flash memory device using double patterning technology and method o...

Method of forming a hard mask and method of forming a fine pattern...

E-beam lithography system for synchronously irradiating a plurality...

Method of forming fine metal patterns for a semiconductor device us...

Method of forming a fine pattern of a semiconductor device using a...

Multi-exposure semiconductor fabrication mask sets and methods of f...

Semiconductor device having overlay measurement mark and method of...

Method of forming pattern

Methods of performing a photolithography process for forming asymme...

Semiconductor memory devices including offset active regions

Methods of fabricating a semiconductor device

Method of manufacturing mask

Multiple exposure apparatus and multiple exposure method using the...

Method of forming a mask structure and method of forming a minute p...

Semiconductor memory device having high electrical performance and...

Method of forming trench in semiconductor device

DRAM devices having an increased density layout

Semiconductor device having sufficient process margin and method of...

Semiconductor memory device having high electrical performance and...

Patents Applicationslast 30 patents

SEMICONDUCTOR DEVICE HAVING SUFFICIENT PROCESS MARGIN AND METHOD OF...

METHOD OF FORMING A HARD MASK AND METHOD OF FORMING A FINE PATTERN...

Semiconductor device having sufficient process margin and method of...

Flash Memory Device Using Double Patterning Technology and Method o...

METHOD OF FORMING A HARD MASK AND METHOD OF FORMING A FINE PATTERN...

Semiconductor device having sufficient process margin and method of...

METHOD OF FORMING PATTERN

Semiconductor Memory Devices Including Offset Bit Lines

Semiconductor Memory Devices Including Extended Memory Elements

Semiconductor Memory Devices Including Diagonal Bit Lines

Method of forming a fine pattern of a semiconductor device using a...

METHOD OF FORMING FINE PATTERNS OF SEMICONDUCTOR DEVICE

Method of forming fine metal patterns for a semiconductor device us...

SEMICONDUCTOR DEVICE AND METHODS FOR CONTROLLING ITS PATTERNS

Semiconductor devices having Fin-type active areas and methods of m...

Method of manufacturing mask

Method of forming a hard mask and method of forming a fine pattern...

Methods of Forming Fine Patterns In Integrated Circuits Using Atomi...

Flash memory device using double patterning technology and method o...

Method of forming a mask structure and method of forming a minute p...

METHOD OF MANUFACTURING A MASK

Semiconductor device having vertical channel transistor

Method of fabricating semiconductor device

SEMICONDUCTOR DEVICE HAVING SUFFICIENT PROCESS MARGIN AND METHOD OF...

E-beam lithography system for synchronously irradiating a plurality...

SEMICONDUCTOR MEMORY DEVICE HAVING HIGH ELECTRICAL PERFORMANCE AND...

Method for forming patterns of semiconductor device

Method and system for measuring overlay of semiconductor device

Methods of fabricating a semiconductor device

Multiple exposure apparatus and multiple exposure method using the...