Gian Francesco Lorusso

Person

Overijse, BE

People

Patents Grantslast 30 patents

Information Patent Grant
Methods and systems for evaluating extreme ultraviolet mask flatness
- Patent number 9,104,122
- Issue date Aug 11, 2015
- IMEC
- Gian Francesco Lorusso
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Detection of contamination in EUV systems
- Patent number 9,086,638
- Issue date Jul 21, 2015
- IMEC
- Rik Jonckheere
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Systems and methods for UV lithography
- Patent number 8,006,202
- Issue date Aug 23, 2011
- IMEC
- Gian Francesco Lorusso
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method and system for measuring contamination of a lithographical e...
- Patent number 7,750,319
- Issue date Jul 6, 2010
- IMEC
- Gian Francesco Lorusso
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR EVALUATING THE BENDING STIFFNESS OF HIGH ASPECT RATIO NA...
- Publication number 20250052703
- Publication date Feb 13, 2025
- IMEC vzw
- XiuMei Xu
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHOD OF PERFORMING METROLOGY ON A MICROFABRICATION PATTERN
- Publication number 20230298854
- Publication date Sep 21, 2023
- IMEC vzw
- Joren Severi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Pattern Height Metrology Using an E-Beam System
- Publication number 20220392742
- Publication date Dec 8, 2022
- IMEC vzw
- Gian Francesco Lorusso
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DETECTION OF CONTAMINATION IN EUV SYSTEMS
- Publication number 20120099092
- Publication date Apr 26, 2012
- IMEC
- Rik Jonckheere
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Methods and Systems for Evaluating Extreme Ultraviolet Mask Flatness
- Publication number 20120075604
- Publication date Mar 29, 2012
- IMEC
- Gian Francesco Lorusso
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DETECTION OF CONTAMINATION IN EUV SYSTEMS
- Publication number 20090103069
- Publication date Apr 23, 2009
- Interuniversitair Microelektronica Centrum vzw (IMEC)
- Rik Jonckheere
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND SYSTEM FOR MEASURING CONTAMINATION OF A LITHOGRAPHICAL E...
- Publication number 20080315125
- Publication date Dec 25, 2008
- Interuniversitair Microelektronica Centrum (IMEC) VZW
- Gian Francesco Lorusso
- G01 - MEASURING TESTING
Information Patent Application
SYSTEMS AND METHODS FOR UV LITHOGRAPHY
- Publication number 20080229273
- Publication date Sep 18, 2008
- Interuniversitair Microelektronica Centrum (IMEC) VZW
- Gian Francesco Lorusso
- B82 - NANO-TECHNOLOGY

Gian Francesco Lorusso

Person

Patents Grantslast 30 patents

Methods and systems for evaluating extreme ultraviolet mask flatness

Detection of contamination in EUV systems

Systems and methods for UV lithography

Method and system for measuring contamination of a lithographical e...

Patents Applicationslast 30 patents

METHOD FOR EVALUATING THE BENDING STIFFNESS OF HIGH ASPECT RATIO NA...

METHOD OF PERFORMING METROLOGY ON A MICROFABRICATION PATTERN

Pattern Height Metrology Using an E-Beam System

DETECTION OF CONTAMINATION IN EUV SYSTEMS

Methods and Systems for Evaluating Extreme Ultraviolet Mask Flatness

DETECTION OF CONTAMINATION IN EUV SYSTEMS

METHOD AND SYSTEM FOR MEASURING CONTAMINATION OF A LITHOGRAPHICAL E...

SYSTEMS AND METHODS FOR UV LITHOGRAPHY