Gijsbert RISPENS

Person

Eersel, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Process window based on defect probability
- Patent number 11,822,255
- Issue date Nov 21, 2023
- ASML Netherlands B.V.
- Abraham Slachter
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Membrane for EUV lithography
- Patent number 11,762,281
- Issue date Sep 19, 2023
- ASML Netherlands B.V.
- Maxim Aleksandrovich Nasalevich
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic patterning process and resists to use therein
- Patent number 11,415,886
- Issue date Aug 16, 2022
- ASML Netherlands B.V.
- Sander Frederik Wuister
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process window based on defect probability
- Patent number 11,079,687
- Issue date Aug 3, 2021
- ASML Netherlands B.V.
- Abraham Slachter
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for removing photosensitive material on a substrate
- Patent number 10,948,825
- Issue date Mar 16, 2021
- ASML Netherlands B.V.
- Christianus Wilhelmus Johannes Berendsen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Membrane for EUV lithography
- Patent number 10,908,496
- Issue date Feb 2, 2021
- ASML Netherlands B.V.
- Maxim Aleksandrovich Nasalevich
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic patterning process and resists to use therein
- Patent number 10,416,555
- Issue date Sep 17, 2019
- ASML Netherlands B.V.
- Sander Frederik Wuister
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
PROCESS WINDOW BASED ON DEFECT PROBABILITY
- Publication number 20240126181
- Publication date Apr 18, 2024
- ASML NETHERLANDS B.V.
- Abraham SLACHTER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MEMBRANE FOR EUV LITHOGRAPHY
- Publication number 20240004283
- Publication date Jan 4, 2024
- ASML NETHERLANDS B.V.
- Maxim Aleksandrovich Nasalevich
- G02 - OPTICS
Information Patent Application
PROCESS WINDOW BASED ON DEFECT PROBABILITY
- Publication number 20210356874
- Publication date Nov 18, 2021
- ASML NETHERLANDS B.V.
- Abraham SLACHTER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MEMBRANE FOR EUV LITHOGRAPHY
- Publication number 20210109438
- Publication date Apr 15, 2021
- ASML NETHERLANDS B.V.
- Maxim Aleksandrovich Nasalevich
- G02 - OPTICS
Information Patent Application
PROCESS WINDOW BASED ON DEFECT PROBABILITY
- Publication number 20210018850
- Publication date Jan 21, 2021
- ASML NETHERLANDS B.V.
- Abraham SLACHTER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR REMOVING PHOTOSENSITIVE MATERIAL ON A SUBSTRATE
- Publication number 20200166845
- Publication date May 28, 2020
- ASML NETHERLANDS B.V.
- Christianus Wilhelmus Johannes BERENDSEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic Patterning Process and Resists to Use Therein
- Publication number 20190339615
- Publication date Nov 7, 2019
- ASML NETHERLANDS B.V.
- Sander Frederik WUISTER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic Patterning Process and Resists to Use Therein
- Publication number 20180004085
- Publication date Jan 4, 2018
- ASML NETHERLANDS B.V.
- Sander Frederik WUISTER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Gijsbert RISPENS

Person

Patents Grantslast 30 patents

Process window based on defect probability

Membrane for EUV lithography

Lithographic patterning process and resists to use therein

Process window based on defect probability

Method for removing photosensitive material on a substrate

Membrane for EUV lithography

Lithographic patterning process and resists to use therein

Patents Applicationslast 30 patents

PROCESS WINDOW BASED ON DEFECT PROBABILITY

MEMBRANE FOR EUV LITHOGRAPHY

PROCESS WINDOW BASED ON DEFECT PROBABILITY

MEMBRANE FOR EUV LITHOGRAPHY

PROCESS WINDOW BASED ON DEFECT PROBABILITY

METHOD FOR REMOVING PHOTOSENSITIVE MATERIAL ON A SUBSTRATE

Lithographic Patterning Process and Resists to Use Therein

Lithographic Patterning Process and Resists to Use Therein