Gil-Woo KONG

Person

Daegu-si, KR

People

Patents Grantslast 30 patents

Information Patent Grant
Reflective type blankmask and photomask for EUV
- Patent number 11,815,801
- Issue date Nov 14, 2023
- S&S TECH Co., Ltd.
- Cheol Shin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reflective type blankmask and photomask for EUV
- Patent number 11,579,521
- Issue date Feb 14, 2023
- S&S TECH Co., Ltd.
- Cheol Shin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Blankmask and photomask for extreme ultraviolet lithography
- Patent number 11,467,485
- Issue date Oct 11, 2022
- S&S TECH Co., Ltd.
- Cheol Shin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective type blankmask for EUV, and method for manufacturing the...
- Patent number 11,435,661
- Issue date Sep 6, 2022
- S&S TECH Co., Ltd.
- Chul-Kyu Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
BLANKMASK AND PHOTOMASK
- Publication number 20220075258
- Publication date Mar 10, 2022
- S&S TECH CO., LTD.
- Cheol SHIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE TYPE BLANKMASK FOR EUV, AND METHOD FOR MANUFACTURING THE...
- Publication number 20220066311
- Publication date Mar 3, 2022
- S&S TECH CO., LTD.
- Chul-Kyu YANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BLANKMASK WITH BACKSIDE CONDUCTIVE LAYER, AND PHOTOMASK MANUFACTURE...
- Publication number 20220066310
- Publication date Mar 3, 2022
- S&S TECH CO., LTD.
- Gyeong-Won SEO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REFLECTIVE TYPE BLANKMASK AND PHOTOMASK FOR EUV
- Publication number 20210208495
- Publication date Jul 8, 2021
- S&S TECH Co., Ltd.
- Cheol SHIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REFLECTIVE TYPE BLANKMASK AND PHOTOMASK FOR EUV
- Publication number 20210208496
- Publication date Jul 8, 2021
- S&S TECH CO., LTD.
- Cheol SHIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
BLANKMASK AND PHOTOMASK FOR EXTREME ULTRAVIOLET LITHOGRAPHY
- Publication number 20210132487
- Publication date May 6, 2021
- S&S TECH CO., LTD.
- Cheol SHIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHASE-SHIFT BLANKMASK AND PHASE-SHIFT PHOTOMASK
- Publication number 20180335692
- Publication date Nov 22, 2018
- S&S TECH CO., LTD.
- Kee-Soo NAM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHASE-SHIFT BLANKMASK AND METHOD OF FABRICATING THE SAME
- Publication number 20180335691
- Publication date Nov 22, 2018
- S&S TECH CO., LTD.
- Kee-Soo NAM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Gil-Woo KONG

Person

Patents Grantslast 30 patents

Reflective type blankmask and photomask for EUV

Reflective type blankmask and photomask for EUV

Blankmask and photomask for extreme ultraviolet lithography

Reflective type blankmask for EUV, and method for manufacturing the...

Patents Applicationslast 30 patents

BLANKMASK AND PHOTOMASK

REFLECTIVE TYPE BLANKMASK FOR EUV, AND METHOD FOR MANUFACTURING THE...

BLANKMASK WITH BACKSIDE CONDUCTIVE LAYER, AND PHOTOMASK MANUFACTURE...

REFLECTIVE TYPE BLANKMASK AND PHOTOMASK FOR EUV

REFLECTIVE TYPE BLANKMASK AND PHOTOMASK FOR EUV

BLANKMASK AND PHOTOMASK FOR EXTREME ULTRAVIOLET LITHOGRAPHY

PHASE-SHIFT BLANKMASK AND PHASE-SHIFT PHOTOMASK

PHASE-SHIFT BLANKMASK AND METHOD OF FABRICATING THE SAME