Gilles Amblard

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Surface treatment with an acidic composition to prevent substrate a...
- Patent number 7,799,514
- Issue date Sep 21, 2010
- GLOBALFOUNDRIES Inc.
- Ramkumar Subramanian
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for removal of immersion lithography medium in immersion lit...
- Patent number 7,741,012
- Issue date Jun 22, 2010
- Advanced Micro Devices, Inc.
- Adam R. Pawloski
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for patterning a photo-resist in an immersion lithography pr...
- Patent number 7,704,674
- Issue date Apr 27, 2010
- Gilles Amblard
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Combination of non-lithographic shrink techniques and trim process...
- Patent number 7,405,032
- Issue date Jul 29, 2008
- Advanced Micro Devices, Inc.
- Gilles Amblard
- G01 - MEASURING TESTING
Information Patent Grant
Organic BARC with adjustable etch rate
- Patent number 7,262,138
- Issue date Aug 28, 2007
- Advanced Micro Devices, Inc.
- Bhanwar Singh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Use of non-lithographic shrink techniques for fabrication/making of...
- Patent number 7,159,205
- Issue date Jan 2, 2007
- Advanced Micro Devices, Inc.
- Gilles Amblard
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Non-lithographic shrink techniques for improving line edge roughnes...
- Patent number 7,064,846
- Issue date Jun 20, 2006
- Advanced Micro Devices, Inc.
- Gilles Amblard
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Use of base developers as immersion lithography fluid
- Patent number 7,056,646
- Issue date Jun 6, 2006
- Advanced Micro Devices, Inc.
- Gilles Amblard
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for elimination of bubbles in immersion medium...
- Patent number 7,014,966
- Issue date Mar 21, 2006
- Advanced Micro Devices, Inc.
- Adam R. Pawloski
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of controlling line edge roughness in resist films
- Patent number 6,764,946
- Issue date Jul 20, 2004
- Advanced Micro Devices, Inc.
- Gilles Amblard
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Method and apparatus for elimination of bubbles in immersion medium...
- Publication number 20050048223
- Publication date Mar 3, 2005
- Adam R. Pawloski
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Gilles Amblard

Person

Patents Grantslast 30 patents

Surface treatment with an acidic composition to prevent substrate a...

Method for removal of immersion lithography medium in immersion lit...

Method for patterning a photo-resist in an immersion lithography pr...

Combination of non-lithographic shrink techniques and trim process...

Organic BARC with adjustable etch rate

Use of non-lithographic shrink techniques for fabrication/making of...

Non-lithographic shrink techniques for improving line edge roughnes...

Use of base developers as immersion lithography fluid

Method and apparatus for elimination of bubbles in immersion medium...

Method of controlling line edge roughness in resist films

Patents Applicationslast 30 patents

Method and apparatus for elimination of bubbles in immersion medium...