Gishi Chung

Person

Yamanashi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma process device and plasma process method
- Patent number 8,394,231
- Issue date Mar 12, 2013
- Tokyo Electron Limited
- Koichi Takatsuki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method
- Patent number 7,662,728
- Issue date Feb 16, 2010
- Tokyo Electron Limited
- Yusaku Kashiwagi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for forming insulation film and apparatus for forming insula...
- Patent number 7,601,402
- Issue date Oct 13, 2009
- Tokyo Electron Limited
- Yusaku Kashiwagi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor device and fabrication method therefor
- Patent number 6,949,829
- Issue date Sep 27, 2005
- Tokyo Electron Limited
- Takashi Akahori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fabrication process of a semiconductor device including a CVD proce...
- Patent number 6,893,953
- Issue date May 17, 2005
- Tokyo Electron Limited
- Tomohisa Hoshino
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low-dielectric silicon nitride film and method of forming the same,...
- Patent number 6,890,869
- Issue date May 10, 2005
- Tokyo Electron Limited
- Gishi Chung
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE PROCESSING METHOD
- Publication number 20090011149
- Publication date Jan 8, 2009
- TOKYO ELECTRON LIMITED
- Yusaku Kashiwagi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma process device and plasma process method
- Publication number 20070131171
- Publication date Jun 14, 2007
- TOKYO ELECTRON LIMITED
- Koichi Takatsuki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate processing method
- Publication number 20060205191
- Publication date Sep 14, 2006
- TOKYO ELECTRON LIMITED
- Yusaku Kashiwagi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Electroless plating apparatus and electroless plating method
- Publication number 20060037858
- Publication date Feb 23, 2006
- TOKYO ELECTRON LIMITED
- Yoshinori Marumo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Solution treatment apparatus and solution treatment method
- Publication number 20060000704
- Publication date Jan 5, 2006
- TOKYO ELECTRON LIMITED
- Hiroshi Sato
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Coating device and coating method
- Publication number 20050170093
- Publication date Aug 4, 2005
- TOKYO ELECTRON LIMITED
- Gishi Chung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor manufacturing apparatus and heat treatment method
- Publication number 20040253839
- Publication date Dec 16, 2004
- TOKYO ELECTRON LIMITED
- Masahiro Shimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electroless plating apparatus and electroless plating method
- Publication number 20040251141
- Publication date Dec 16, 2004
- TOKYO ELECTRON LIMITED
- Gishi Chung
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method for forming insulation film and apparatus for forming insula...
- Publication number 20040212114
- Publication date Oct 28, 2004
- TOKYO ELECTRON LIMITED
- Yusaku Kashiwagi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma processing device and plasma processing method
- Publication number 20040127033
- Publication date Jul 1, 2004
- Koichi Takatsuki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device and fabrication method therefor
- Publication number 20040041266
- Publication date Mar 4, 2004
- Takashi Akahori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Low-dielectric silicon nitride film and method of forming the same,...
- Publication number 20030162412
- Publication date Aug 28, 2003
- Gishi Chung
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method and apparatus for manufacturing semiconductor device
- Publication number 20020173078
- Publication date Nov 21, 2002
- Yumiko Kawano
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Fabrication process of a semiconductor device including a CVD proce...
- Publication number 20020009872
- Publication date Jan 24, 2002
- Tomohisa Hoshino
- H01 - BASIC ELECTRIC ELEMENTS

Gishi Chung

Person

Patents Grantslast 30 patents

Plasma process device and plasma process method

Substrate processing method

Method for forming insulation film and apparatus for forming insula...

Semiconductor device and fabrication method therefor

Fabrication process of a semiconductor device including a CVD proce...

Low-dielectric silicon nitride film and method of forming the same,...

Patents Applicationslast 30 patents

SUBSTRATE PROCESSING METHOD

Plasma process device and plasma process method

Substrate processing method

Electroless plating apparatus and electroless plating method

Solution treatment apparatus and solution treatment method

Coating device and coating method

Semiconductor manufacturing apparatus and heat treatment method

Electroless plating apparatus and electroless plating method

Method for forming insulation film and apparatus for forming insula...

Plasma processing device and plasma processing method

Semiconductor device and fabrication method therefor

Low-dielectric silicon nitride film and method of forming the same,...

Method and apparatus for manufacturing semiconductor device

Fabrication process of a semiconductor device including a CVD proce...