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GLENN A BIERY
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HYDE PARK, NY, US
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Patents Grants
last 30 patents
Information
Patent Grant
High performance CMOS circuits, and methods for fabricating same
Patent number
8,383,483
Issue date
Feb 26, 2013
International Business Machines Corporation
John C. Arnold
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Methods for the formation of fully silicided metal gates
Patent number
8,178,433
Issue date
May 15, 2012
International Business Machines Corporation
Glenn A. Biery
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Methods for the formation of fully silicided metal gates
Patent number
7,705,405
Issue date
Apr 27, 2010
International Business Machines Corporation
Glenn A. Biery
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Fully silicided metal gate semiconductor device structure
Patent number
7,473,975
Issue date
Jan 6, 2009
International Business Machines Corporation
Glenn A. Biery
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Formation of fully silicided (FUSI) gate using a dual silicide process
Patent number
7,273,777
Issue date
Sep 25, 2007
International Business Machines Corporation
Glenn A. Biery
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Reliable low-k interconnect structure with hybrid dielectric
Patent number
7,135,398
Issue date
Nov 14, 2006
International Business Machines Corporation
John A. Fitzsimmons
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Dual damascene interconnect structure using low stress fluorosilica...
Patent number
7,034,400
Issue date
Apr 25, 2006
International Business Machines Corporation
Edward P. Barth
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Two-mask process for metal-insulator-metal capacitors and single ma...
Patent number
6,933,191
Issue date
Aug 23, 2005
International Business Machines Corporation
Glenn A. Biery
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Reliable low-k interconnect structure with hybrid dielectric
Patent number
6,917,108
Issue date
Jul 12, 2005
International Business Machines Corporation
John A. Fitzsimmons
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Self-aligned, lateral diffusion barrier in metal lines to eliminate...
Patent number
6,597,067
Issue date
Jul 22, 2003
International Business Machines Corporation
Glenn Allen Biery
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Topography monitor
Patent number
5,952,674
Issue date
Sep 14, 1999
International Business Machines Corporation
Daniel C. Edelstein
G01 - MEASURING TESTING
Information
Patent Grant
Dual channel d.c. low noise measurement system and test methodology
Patent number
5,563,517
Issue date
Oct 8, 1996
International Business Machines Corporation
Glenn A. Biery
G01 - MEASURING TESTING
Information
Patent Grant
Method of making self-aligned, lateral diffusion barrier in metal l...
Patent number
5,470,788
Issue date
Nov 28, 1995
International Business Machines Corporation
Glenn A. Biery
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Dual channel D.C. low noise measurement system and test methodology
Patent number
5,434,385
Issue date
Jul 18, 1995
International Business Machines Corporation
Glenn A. Biery
G01 - MEASURING TESTING
Patents Applications
last 30 patents
Information
Patent Application
HIGH PERFORMANCE CMOS CIRCUITS, AND METHODS FOR FABRICATING SAME
Publication number
20100041221
Publication date
Feb 18, 2010
International Business Machines Coporation
John C. Arnold
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
METHODS FOR THE FORMATION OF FULLY SILICIDED METAL GATES
Publication number
20090029515
Publication date
Jan 29, 2009
International Business Machines Corporation
Glenn A. Biery
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
FORMATION OF FULLY SILICIDED (FUSI) GATE USING A DUAL SILICIDE PROCESS
Publication number
20070281431
Publication date
Dec 6, 2007
International Business Machines Corporation
Glenn A. Biery
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
High performance CMOS circuits, and methods for fabricating the same
Publication number
20070152276
Publication date
Jul 5, 2007
International Business Machines Corporation
John C. Arnold
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Formation of fully silicided (FUSI) gate using a dual silicide process
Publication number
20070032010
Publication date
Feb 8, 2007
International Business Machines Corporation
Glenn A. Biery
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Methods for the formation of fully silicided metal gates
Publication number
20060006476
Publication date
Jan 12, 2006
International Business Machines Corporation
Glenn A. Biery
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
TWO-MASK PROCESS FOR METAL-INSULATOR-METAL CAPACITORS AND SINGLE MA...
Publication number
20050064658
Publication date
Mar 24, 2005
International Business Machines Corporation
Glenn A. Biery
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Reliable low-k interconnect structure with hybrid dielectric
Publication number
20050023693
Publication date
Feb 3, 2005
John A. Fitzsimmons
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Reliable low-k interconnect structure with hybrid dielectric
Publication number
20040094839
Publication date
May 20, 2004
International Business Machines Corporation
John A. Fitzsimmons
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Dual damascene interconnect structure using low stress fluorosilica...
Publication number
20040061235
Publication date
Apr 1, 2004
Edward P. Barth
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
DUAL DAMASCENE INTERCONNECT STRUCTURE USING LOW STRESS FLOUROSILICA...
Publication number
20020076917
Publication date
Jun 20, 2002
EDWARD P BARTH
H01 - BASIC ELECTRIC ELEMENTS