Glyn Reynolds

Person

Gilbert, AZ, US

People

Patents Grantslast 30 patents

Information Patent Grant
Vacuum-processing chamber-shield and multi-chamber pumping method
- Patent number 7,001,491
- Issue date Feb 21, 2006
- Tokyo Electron Limited
- Michael J. Lombardi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sputtering source for ionized physical vapor deposition of metals
- Patent number 6,929,720
- Issue date Aug 16, 2005
- Tokyo Electron Limited
- Glyn Jeremy Reynolds
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ionized PVD with sequential deposition and etching
- Patent number 6,755,945
- Issue date Jun 29, 2004
- Tokyo Electron Limited
- Tugrul Yasar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for ionized physical vapor deposition
- Patent number 6,719,886
- Issue date Apr 13, 2004
- Tokyo Electron Limited
- John Stephen Drewery
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Reduced edge contact wafer handling system and method of retrofitti...
- Patent number 6,692,219
- Issue date Feb 17, 2004
- Tokyo Electron Limited
- Stephen D. Coomer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inductively-coupled plasma processing system
- Patent number 6,652,711
- Issue date Nov 25, 2003
- Tokyo Electron Limited
- Jozef Brcka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Immersed inductively—coupled plasma source
- Patent number 6,417,626
- Issue date Jul 9, 2002
- Tokyo Electron Limited
- Jozef Brcka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for ionized physical vapor deposition
- Patent number 6,287,435
- Issue date Sep 11, 2001
- Tokyo Electron Limited
- John Stephen Drewery
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Buffer chamber for integrating physical and chemical vapor depositi...
- Patent number 6,183,564
- Issue date Feb 6, 2001
- Tokyo Electron Limited
- Glyn J. Reynolds
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Virtual shutter method and apparatus for preventing damage to galli...
- Patent number 6,156,164
- Issue date Dec 5, 2000
- Tokyo Electron Limited
- Jason Smolanoff
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
Vacuum-processing chamber-shield and multi-chamber pumping method
- Publication number 20060037537
- Publication date Feb 23, 2006
- TOKYO ELECTRON LIMITED
- Michael J. Lombardi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Vacuum-processing chamber-shield and multi-chamber pumping method
- Publication number 20040262155
- Publication date Dec 30, 2004
- TOKYO ELECTRON LIMITED
- Michael J. Lombardi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Sputtering source for ionized physical vapor deposition of metals
- Publication number 20040245092
- Publication date Dec 9, 2004
- TOKYO ELECTRON LIMITED
- Glyn Jeremy Reynolds
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Ionized PVD with sequential deposition and etching
- Publication number 20030034244
- Publication date Feb 20, 2003
- Tugrul Yasar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Inductively-coupled plasma processing system
- Publication number 20020185229
- Publication date Dec 12, 2002
- Tokyo Electron Limited of TBS Broadcast Center
- Jozef Brcka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for ionized physical vapor deposition
- Publication number 20020104751
- Publication date Aug 8, 2002
- John Stephen Drewery
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Reduced edge contact wafer handling system and method of retrofitti...
- Publication number 20020064450
- Publication date May 30, 2002
- TOKYO ELECTRON LIMITED
- Stephen D. Coomer
- H01 - BASIC ELECTRIC ELEMENTS

Glyn Reynolds

Person

Patents Grantslast 30 patents

Vacuum-processing chamber-shield and multi-chamber pumping method

Sputtering source for ionized physical vapor deposition of metals

Ionized PVD with sequential deposition and etching

Method and apparatus for ionized physical vapor deposition

Reduced edge contact wafer handling system and method of retrofitti...

Inductively-coupled plasma processing system

Immersed inductively&#x02014;coupled plasma source

Method and apparatus for ionized physical vapor deposition

Buffer chamber for integrating physical and chemical vapor depositi...

Virtual shutter method and apparatus for preventing damage to galli...

Patents Applicationslast 30 patents

Vacuum-processing chamber-shield and multi-chamber pumping method

Vacuum-processing chamber-shield and multi-chamber pumping method

Sputtering source for ionized physical vapor deposition of metals

Ionized PVD with sequential deposition and etching

Inductively-coupled plasma processing system

Method and apparatus for ionized physical vapor deposition

Reduced edge contact wafer handling system and method of retrofitti...

Immersed inductively—coupled plasma source