Gnanamani Amburose

Person

Fremont, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Systems and methods for metastable activated radical selective stri...
- Patent number 12,272,570
- Issue date Apr 8, 2025
- Lam Research Corporation
- Dengliang Yang
- B08 - CLEANING
Information Patent Grant
Systems and methods for metastable activated radical selective stri...
- Patent number 12,272,571
- Issue date Apr 8, 2025
- Lam Research Corporation
- Dengliang Yang
- B08 - CLEANING
Information Patent Grant
Systems and methods for metastable activated radical selective stri...
- Patent number 12,211,709
- Issue date Jan 28, 2025
- Lam Research Corporation
- Dengliang Yang
- B08 - CLEANING
Information Patent Grant
Substrate processing system including dual ion filter for downstrea...
- Patent number 11,967,486
- Issue date Apr 23, 2024
- Lam Research Corporation
- Andrew Stratton Bravo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for metastable activated radical selective stri...
- Patent number 11,694,911
- Issue date Jul 4, 2023
- Lam Research Corporation
- Dengliang Yang
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
ETCH UNIFORMITY IMPROVEMENT IN RADICAL ETCH USING CONFINEMENT RING
- Publication number 20250140529
- Publication date May 1, 2025
- LAM RESEARCH CORPORATION
- Andreas Fischer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING SYSTEM INCLUDING DUAL ION FILTER FOR DOWNSTREA...
- Publication number 20240266147
- Publication date Aug 8, 2024
- LAM RESEARCH CORPORATION
- Andrew Stratton BRAVO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR METASTABLE ACTIVATED RADICAL SELECTIVE STRI...
- Publication number 20240258129
- Publication date Aug 1, 2024
- Lam Reseach Corporation
- Dengliang YANG
- B08 - CLEANING
Information Patent Application
SYSTEMS AND METHODS FOR METASTABLE ACTIVATED RADICAL SELECTIVE STRI...
- Publication number 20240258130
- Publication date Aug 1, 2024
- LAM RESEARCH CORPORATION
- Dengliang YANG
- B08 - CLEANING
Information Patent Application
SYSTEMS AND METHODS FOR METASTABLE ACTIVATED RADICAL SELECTIVE STRI...
- Publication number 20240258131
- Publication date Aug 1, 2024
- LAM RESEARCH CORPORATION
- Dengliang YANG
- B08 - CLEANING
Information Patent Application
SYSTEMS AND METHODS FOR METASTABLE ACTIVATED RADICAL SELECTIVE STRI...
- Publication number 20230369076
- Publication date Nov 16, 2023
- LAM RESEARCH CORPORATION
- Dengliang Yang
- B08 - CLEANING
Information Patent Application
PLASMA-EXCLUSION-ZONE RINGS FOR PROCESSING NOTCHED WAFERS
- Publication number 20230352278
- Publication date Nov 2, 2023
- LAM RESEARCH CORPORATION
- Xuefeng HUA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING SYSTEM INCLUDING DUAL ION FILTER FOR DOWNSTREA...
- Publication number 20220076924
- Publication date Mar 10, 2022
- LAM RESEARCH CORPORATION
- Andrew Stratton BRAVO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR METASTABLE ACTIVATED RADICAL SELECTIVE STRI...
- Publication number 20180174870
- Publication date Jun 21, 2018
- LAM RESEARCH CORPORATION
- Dengliang Yang
- H01 - BASIC ELECTRIC ELEMENTS

Gnanamani Amburose

Person

Patents Grantslast 30 patents

Systems and methods for metastable activated radical selective stri...

Systems and methods for metastable activated radical selective stri...

Systems and methods for metastable activated radical selective stri...

Substrate processing system including dual ion filter for downstrea...

Systems and methods for metastable activated radical selective stri...

Patents Applicationslast 30 patents

ETCH UNIFORMITY IMPROVEMENT IN RADICAL ETCH USING CONFINEMENT RING

SUBSTRATE PROCESSING SYSTEM INCLUDING DUAL ION FILTER FOR DOWNSTREA...

SYSTEMS AND METHODS FOR METASTABLE ACTIVATED RADICAL SELECTIVE STRI...

SYSTEMS AND METHODS FOR METASTABLE ACTIVATED RADICAL SELECTIVE STRI...

SYSTEMS AND METHODS FOR METASTABLE ACTIVATED RADICAL SELECTIVE STRI...

SYSTEMS AND METHODS FOR METASTABLE ACTIVATED RADICAL SELECTIVE STRI...

PLASMA-EXCLUSION-ZONE RINGS FOR PROCESSING NOTCHED WAFERS

SUBSTRATE PROCESSING SYSTEM INCLUDING DUAL ION FILTER FOR DOWNSTREA...

SYSTEMS AND METHODS FOR METASTABLE ACTIVATED RADICAL SELECTIVE STRI...